Beilstein J. Nanotechnol.2011,2, 318–326, doi:10.3762/bjnano.2.37
thickness had to be adjusted in a certain thickness-window in order to achieve the precise 2D particle arrays.
Keywords: Au particles; dewetting; nanoimprint lithography; nanoparticle array; Introduction
An increasing amount of scientific attention is being paid to the ordered arrangement of metallic
. induced by annealing, has been studied, on both the flat substrate and two types of pre-patterned substrates (one with an array of pyramidal pits and one with an array of circular holes, made using nanoimprint lithography), and large areas of 2D ordered nanoparticle arrays were fabricated. Instead of the
technique, which was developed by Philips Research and SUSS MicroTec, combines the advantages of both UV nanoimprint lithography techniques with rigid stamp for the best resolution and with soft stamp for the large-area (6 inch area) patterning. Thermal oxide several nanometers thick was grown on the pre
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Figure 1:
SEM images at 45° tilt of (a) a square array of pyramidal pits (substrate A) and (b) an array of ci...