Reversible mechano-electrochemical writing of metallic nanostructures with the tip of an atomic force microscope

• Christian Obermair,
• Marina Kress,
• Andreas Wagner and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 824–830, doi:10.3762/bjnano.3.92

• successfully demonstrated on the nanometer scale. Keywords: atomic force microscopy; electrochemical deposition; electrochemistry; nanoelectronics; nanofabrication; nanolithography; nanotechnology; MEMS and NEMS; reversible processes; scanning probe microscopy and lithography; Introduction The

• related instruments can be used as tools for surface modification and nanolithography [9][10][11][12][41][42][43][44][45][46][47][48], even down to the atomic scale [41][42][43][44][45]. The great advantage of these instruments for nanoelectrochemistry is the fact that they also allow the in situ and real

• nanolithography, the results also help in understanding microscopic mechanisms of mechanically activated or mechanically assisted electrochemical processes on metallic surfaces, e.g., during electropolishing or in combined mechanical wear and corrosion processes. Experimental The experimental setup was described

Pinch-off mechanism in double-lateral-gate junctionless transistors fabricated by scanning probe microscope based lithography

• Farhad Larki,
• Arash Dehzangi,
• Alam Abedini,
• Ahmad Makarimi Abdullah,
• Elias Saion,
• Sabar D. Hutagalung,
• Mohd N. Hamidon and
• Jumiah Hassan

Beilstein J. Nanotechnol. 2012, 3, 817–823, doi:10.3762/bjnano.3.91

• field emanating from the gates creates an electric field perpendicular to the current, toward the bottom of the channel, which provides the electrostatic squeezing of the current. Keywords: AFM nanolithography; junctionless transistors; pinch-off; scanning probe microscope; simulation; Introduction

• Snow et al. [11]. Subsequent results by this technique are presented in the references [12][13]. In fact, fabrication of nanostructures by SPL and particularly by using atomic force microscope (AFM) nanolithography has been developed with prominent results, and similar structures have been fabricated

• influential factors on SPL by AFM nanolithography, to obtain the optimized parameters for fabrication of the DGJLT. We also used 3-D TCAD simulations to investigate the principles of the DGJLT in the off state. We investigate the electron/hole density distribution and electric-field components along the

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• process of nanoparticles often requires other reagents, e.g., for micelle nanolithography or chemisorption at surface-attached organic monolayers [24][25]. These organic additives (stabilizer/monolayer) might disturb the growth process of the silicon NWs and lead to contaminations, thus they need to be

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

• Jonathan Berson,
• Assaf Zeira,
• Rivka Maoz and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2012, 3, 134–143, doi:10.3762/bjnano.3.14

• (serial process) is demonstrated to allow site-selective metallization of monolayer template patterns of any desired shape and size created by constructive nanolithography. The precise nanoscale control of metal delivery to predefined surface sites, achieved as a result of the selective affinity of the

• –solution interface by ion migration to the electrode rather than by electron transfer to hydrated ions in solution. Keywords: AFM (SFM); bipolar electrochemistry; electrochemical metal deposition; monolayer patterning; nanolithography; self-assembled organosilane monolayers; Introduction The quest for a

• monolayer (denoted as OTSeo@OTS/Si) were produced using either conductive SFM (scanning force microscope) probes that can serially inscribe OTSeo features on lateral length scales from nanometers to tens of micrometers (constructive nanolithography, CNL) [14][15][18][27] or conductive stamps, suitable for

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

• ChaMarra K. Saner,
• Kathie L. Lusker,
• Zorabel M. LeJeune,
• Wilson K. Serem and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12

• least one hour, in order to form surface masks for nanolithography. Particle lithography combined with vapor deposition. The masked substrates were placed into sealed glass vessels for vapor deposition of organosilane. The samples were placed on a raised platform in a jar containing 300 µL of neat

Direct-write polymer nanolithography in ultra-high vacuum

• Woo-Kyung Lee,
• Minchul Yang,
• Arnaldo R. Laracuente,
• William P. King,
• Lloyd J. Whitman and
• Paul E. Sheehan

Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6

• create softer, heterogeneous structures – such as polymers – that would be contaminated or destroyed by the multiple requisite coating and removal steps associated with conventional “lift-off” lithography. To date, additive lithographies such as inkjet [2], dip-pen nanolithography (DPN) [3] and micro

• using solvents [9]. Unfortunately, inks and solvents that have sufficient intrinsic fluidity for DPN evaporate quickly in vacuum. This paper reports that thermal dip-pen nanolithography (tDPN) [10] can deposit polymer nanostructures from a heated AFM tip in a high vacuum environment (Figure 1b). In tDPN

• impact on the observed molecular film thickness. Conclusion In conclusion, we have developed a method for direct, additive deposition of polymer in UHV using thermal dip-pen nanolithography. The molecular structure of the written PDDT monolayer nanostructure films depends on the chemistry of the silicon

The atomic force microscope as a mechano–electrochemical pen

• Christian Obermair,
• Andreas Wagner and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2011, 2, 659–664, doi:10.3762/bjnano.2.70

• microscopy; deposition; electrochemistry; nanoelectronics; nanofabrication; nanolithography; nanotechnology; NEMS and MEMS; scanning probe lithography; Introduction The controlled, patterned, electrochemical deposition of metals at predefined positions on the nanometer scale is of great interest for

• with force constants between 0.03 N/m and 0.1 N/m, were used. Within each experiment, the same AFM cantilever tip was used both for nanolithography and for subsequent AFM imaging. The position of the tip was controlled by a lithography mode of our software, which at the same time allows control of the

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

• Lindarti Purwaningsih,
• Tobias Schoen,
• Tobias Wolfram,
• Claudia Pacholski and
• Joachim P. Spatz

Beilstein J. Nanotechnol. 2011, 2, 545–551, doi:10.3762/bjnano.2.58

• nanocones with gold tips. By using a combination of block copolymer nanolithography, electroless deposition, and reactive ion etching several parameters such as structure height and structure distance could easily be adjusted to the desired values. The gold tips allow for easy functionalization of the

• finding for research dealing with the reactions of neuron-like tissue in the immediate moments after direct contact with an implanted surface. Keywords: block copolymer nanolithography; cell adhesion; nanostructures; surface chemistry; surface topography; Introduction Nanostructured materials for

• on nanocones is approximately 40% higher compared to flat gold nanoparticles. Method used to fabricate silica nanocone arrays with gold functionalized tips. A quasi-hexagonally ordered gold nanoparticle array was deposited on a silica substrate by block copolymer nanolithography (a). Electroless

Oriented growth of porphyrin-based molecular wires on ionic crystals analysed by nc-AFM

• Thilo Glatzel,
• Lars Zimmerli,
• Shigeki Kawai,
• Ernst Meyer,
• Leslie-Anne Fendt and
• Francois Diederich

Beilstein J. Nanotechnol. 2011, 2, 34–39, doi:10.3762/bjnano.2.4

• to several hundred nanometers have been observed at room temperature (rt). Even the contacting of self-ordering molecular wires by nanolithography was shown recently [29]. Controlled growth procedures of molecules on insulators are often hindered by the weak, unspecific interaction between the

A collisional model for AFM manipulation of rigid nanoparticles

• Enrico Gnecco

Beilstein J. Nanotechnol. 2010, 1, 158–162, doi:10.3762/bjnano.1.19

• direction of motion of arbitrarily shaped nanoparticles is important for the guided formation of nanostructures. An interesting analogy is found with AFM nanolithography. In a recent paper we have shown that the patterning of amorphous polymers can be ‘tuned’ by varying the scan path of an AFM tip which