Mapping mechanical properties of organic thin films by force-modulation microscopy in aqueous media

• Jianming Zhang,
• Zehra Parlak,
• Carleen M. Bowers,
• Terrence Oas and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 464–474, doi:10.3762/bjnano.3.53

• , HO(CH2CH2O)3C11H22SH) obtained at 20 kHz. The patterns were prepared by photolithography. Briefly, the sample was prepared by immersing the developed photoresist pattern in a 10 µM thiol solution for 60 s, followed by stripping with ethanol and washing with Milli-Q grade water (see Experimental

• and rinsed in deionized (DI) water followed by nitrogen drying. Patterned EG3-thiol monolayers A 3 µm thick layer of negative tone resist (NFR-016D2) was spin-coated onto a freshly deposited and cleaned gold surface at 3000 rpm (Figure 6). A photolithography mask was then used to create 8 × 8 µm2

• control: gold surface after photolithography and resist stripping shows no surface residues. Schematic of the FMM setup. The AFM probe is kept at a constant static contact force when scanning the sample in solution. The signal generator actuates the cantilever probe with a single frequency signal, and the

Colloidal lithography for fabricating patterned polymer-brush microstructures

• Tao Chen,
• Debby P. Chang,
• Rainer Jordan and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 397–403, doi:10.3762/bjnano.3.46

• separation of biological molecules [14][15][16]. They can be grown by surface-initiated polymerization from surface-confined initiator templates, as fabricated by various lithographic approaches. Although a range of strategies for polymer brush patterning, including photolithography [17], electron-beam

Analysis of fluid flow around a beating artificial cilium

• Mojca Vilfan,
• Gašper Kokot,
• Andrej Vilfan,
• Natan Osterman,
• Blaž Kavčič,
• Igor Poberaj and
• Dušan Babič

Beilstein J. Nanotechnol. 2012, 3, 163–171, doi:10.3762/bjnano.3.16

• manufactured by using a combination of photolithography and etching: First a 200 nm thick nickel layer was deposited on a microscope glass slide by a standard evaporation technique. A layer of negative photoresist (SU-8 2025, Microchem, adhesion promoter TI Prime, Microchemicals GmbH) was spin-coated onto the

Substrate-mediated effects in photothermal patterning of alkanethiol self-assembled monolayers with microfocused continuous-wave lasers

• Anja Schröter,
• Mark Kalus and
• Nils Hartmann

Beilstein J. Nanotechnol. 2012, 3, 65–74, doi:10.3762/bjnano.3.8

• , addressed here, considers the application of SAMs as ultrathin resists. Patterning techniques, such as scanning-probe techniques, e-beam lithography, micro-contact printing and photolithography have been employed along this path [6][7][8][9]. Furthermore, laser processing of SAMs has attracted significant

Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications

• Yaron Paz

Beilstein J. Nanotechnol. 2011, 2, 845–861, doi:10.3762/bjnano.2.94

• patterning of SAMs on a substrate (either by exposure to 185 nm light or by conventional photolithography), followed by nucleation and growth of TiO2 on areas that have been depleted of the SAMs. As an example, one may mention the patterning of OTS into methyl-terminated regions and silanol-terminated

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

• Lindarti Purwaningsih,
• Tobias Schoen,
• Tobias Wolfram,
• Claudia Pacholski and
• Joachim P. Spatz

Beilstein J. Nanotechnol. 2011, 2, 545–551, doi:10.3762/bjnano.2.58

• photolithography, wet etching, or reactive ion etching, as well as simple chemical approaches, have been employed for the fabrication of nanostructured materials neglecting the complexity of the biological aspects. After tremendous work on cellular response to surface features in the micrometer range, such as

Tip-enhanced Raman spectroscopic imaging of patterned thiol monolayers

• Johannes Stadler,
• Thomas Schmid,
• Lothar Opilik,
• Phillip Kuhn,
• Petra S. Dittrich and
• Renato Zenobi

Beilstein J. Nanotechnol. 2011, 2, 509–515, doi:10.3762/bjnano.2.55

• printing stamps was fabricated by standard photolithography [14][38][39]. Briefly, a positive resist (AZ1518) was spin-coated to a height of 2.1 ± 0.1 μm onto a silicon wafer, exposed through a sub-micrometer resolution chrome mask and developed. After overnight silanization, poly(dimethylsiloxane) (PDMS

Biomimetics inspired surfaces for drag reduction and oleophobicity/philicity

• Bharat Bhushan

Beilstein J. Nanotechnol. 2011, 2, 66–84, doi:10.3762/bjnano.2.9

• fabricated using a two step molding process (soft lithography). A microstructured Si surface with pillars of 14 μm diameter and 30 μm height with 23 μm pitch fabricated by photolithography was used as a master template. A negative replica of the template was generated by applying a polyvinylsiloxane dental

• micropatterned surfaces, a flat Si surface and micropatterned Si surfaces with pillars of 14 μm diameter and 30 μm height with different pitch values (21, 23, 26, 35, 70, 105, 126, 168 and 210 μm), fabricated by photolithography, were used [20]. To study surfaces with some oleophobicity, a surface coating which