A reproducible number-based sizing method for pigment-grade titanium dioxide

• Ralf Theissmann,
• Manfred Kluwig and
• Thomas Koch

Beilstein J. Nanotechnol. 2014, 5, 1815–1822, doi:10.3762/bjnano.5.192

• are removed after the mixing process. The mixture is then hot-mounted by using a Struers Citopress under standard conditions of 180 °C and 3 bar pressure. A five-step polishing process, with active oxide polishing as the final step, leads to a smooth, scratch-free section through the embedded pigments

A nanometric cushion for enhancing scratch and wear resistance of hard films

• Katya Gotlib-Vainshtein,
• Olga Girshevitz,
• Chaim N. Sukenik,
• David Barlam and
• Sidney R. Cohen

Beilstein J. Nanotechnol. 2014, 5, 1005–1015, doi:10.3762/bjnano.5.114

• Department of Chemical Research Support, Weizmann Institute of Science, Rehovot 76100, Israel 10.3762/bjnano.5.114 Abstract Scratch resistance and friction are core properties which define the tribological characteristics of materials. Attempts to optimize these quantities at solid surfaces are the subject

• control the scratch resistance of oxide surfaces. Titania films of several nm thickness are coated onto substrates of silicon, kapton, polycarbonate, and polydimethylsiloxane (PDMS). The scratch resistance measured by scanning force microscopy is found to be substrate dependent, diminishing in the order

• PDMS, kapton/polycarbonate, Si/SiO2. Furthermore, when PDMS is applied as an intermediate layer between a harder substrate and titania, marked improvement in the scratch resistance is achieved. This is shown by quantitative wear tests for silicon or kapton, by coating these substrates with PDMS which

Scale effects of nanomechanical properties and deformation behavior of Au nanoparticle and thin film using depth sensing nanoindentation

• Dave Maharaj and
• Bharat Bhushan

Beilstein J. Nanotechnol. 2014, 5, 822–836, doi:10.3762/bjnano.5.94

• understanding of materials behavior during contact. Mechanical properties of interest comprise hardness, Young’s modulus of elasticity, bulk modulus, elastic–plastic deformation, scratch resistance, residual stresses, time-dependent creep and relaxation properties, fracture toughness, fatigue and yield strength

Exploring the retention properties of CaF₂ nanoparticles as possible additives for dental care application with tapping-mode atomic force microscope in liquid

• Matthias Wasem,
• Joachim Köser,
• Sylvia Hess,
• Enrico Gnecco and
• Ernst Meyer

Beilstein J. Nanotechnol. 2014, 5, 36–43, doi:10.3762/bjnano.5.4

• distribution of the calculated power dissipated for nanoparticles adsorbed on polished tooth enamel substrates. The relatively wide distribution of the calculated dissipated energies for all three particles may arise from the inhomogeneous scratch profiles for each of the polished tooth enamel substrates used

Effect of normal load and roughness on the nanoscale friction coefficient in the elastic and plastic contact regime

• Aditya Kumar,
• Thorsten Staedler and
• Xin Jiang

Beilstein J. Nanotechnol. 2013, 4, 66–71, doi:10.3762/bjnano.4.7

• indenter and decreases with roughness. Distinct differences between the present experimental results and the existing theoretical models/predictions are discussed. Keywords: nanoindentation; nanotribology; scratch testing; surface roughness; Introduction Understanding the contact phenomena underlying

• opens up the potential to study contact phenomena on the single-asperity level [14]. Here scanning nanoindentation in particular allows for quantitative assessment of the forces involved. In this paper, various scratch tests with different linearly increasing normal loads for surfaces featuring

• nanoindentation-based scratch test with linearly increasing load. Experimental Samples: As mentioned above, fused silica and DLC were chosen as sample materials. The fused silica was provided as a standard sample by Hysitron Inc. The DLC samples, 1µm thick films on Si(100) wafer, were synthesized by chemical

Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM

• Cagri Üzüm,
• Johannes Hellwig,
• Narayanan Madaboosi,
• Dmitry Volodkin and
• Regine von Klitzing

Beilstein J. Nanotechnol. 2012, 3, 778–788, doi:10.3762/bjnano.3.87

• number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods: scratch-and-scan and newly developed full-indentation. The advantages and disadvantages of both methods are highlighted, and error minimization techniques in elasticity measurements are addressed

• Bilayer number n versus film thickness h The thickness h of (PLL/HA)n films with n = 12, 24, 36, 48, 60, 72, 84, 96 was measured both to determine the growth regime and to be able to study the mechanical properties. Two methods were used to determine the thickness. The first one is the scratch-and-scan

• ) as shown in Figure 1c. The scratch-and-scan method has some advantages such as the possibility to observe any possible damage done to the film during indentation, by scanning a large area that includes the originally studied position on the film. Another advantage is that this method gives the

Single-pass Kelvin force microscopy and dC/dZ measurements in the intermittent contact: applications to polymer materials

• Sergei Magonov and
• John Alexander

Beilstein J. Nanotechnol. 2011, 2, 15–27, doi:10.3762/bjnano.2.2

• 50–60 mV higher surface potential than the PS matrix. Their potential is also 130–140 mV higher than that of the ITO substrate as seen in surface potential image taken at the scratch in the film (not shown here). Remarkably, in a few surface regions the neighboring PVAC domains are connected by

• corrugations in the 0–10 nm range in the topography image and the potential variations in the 0–1 V range in the surface potential image. Topography and surface potential images, which were recorded at the scratch location in PS films of different thicknesses on a Si substrate, are presented in A and B

• . Similar images at the scratch location in PMMA films on Si are shown in C–E. The cross-section profiles, which were taken in the images, in the horizontal direction are shown under the images. The images in A–D were recorded with the sample in air and the image in E was recorded with the PMMA film in