Beilstein J. Nanotechnol.2017,8, 2376–2388, doi:10.3762/bjnano.8.237
/bjnano.8.237 Abstract We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds
attachment; dissociative ionization; electron beam induced deposition; low-energy electrons; silacyclohexane; Introduction
Focused electron beam induced deposition (FEBID) [1][2] is a 3-D direct writing method suitable for the fabrication of nanostructures, even on non-planar surfaces. This approach is in
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Silacyclohexane (SCH) and dichlorosilacyclohexane (DSCH), shown in Figure 1, are cyclohexane derivatives where one of the carbon atoms is replaced by a silicon atom, and in DCSCH two chlorine atoms are attached to that silicon atom.
In a fairly recent gas phase study [35], where these molecules were exposed to
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Figure 1:
Molecular structure of (a) 1,1-dichloro-1-silacyclohexane (cyclo-C5H10SiCl2) and (b) silacyclohexan...