Beilstein J. Nanotechnol.2026,17, 586–597, doi:10.3762/bjnano.17.40
(MoS2) under controlled loads using a calibrated atomic force microscope (AFM), with a focus on quantifying the strengthening effect and sub-nanoscalestick–slipmotion. Our results reveal that the nanoscale strengthening effect intensifies with increasing applied load but weakens as the number of MoS2
layers increases, attributed to the reduced out-of-plane flexibility in thicker films. Critically, we identify the slip distance during the slip phase as a reliable metric for sub-nanoscalestick–slipmotion. The slip distance increases with the frequency of sub-nanoscale stick–slip events and exhibits a
and suppresses sub-nanoscalestick–slipmotion. Under moderate-to-high loads, the puckering effect becomes dominant, enhancing sub-nanoscale stick–slip events and increasing slip distance. At ultrahigh loads, the nanoscale strengthening effect transitions to static friction, which quenches sub
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Figure 1:
(a) AFM topographic image of atomically thin MoS2 along with the cross-sectional height profiles in...