Ambient pressure XPS at MAX IV

• Mattia Scardamaglia,
• Ulrike Küst,
• Alexander Klyushin,
• Rosemary Jones,
• Jan Knudsen,
• Robert Temperton,
• Andrey Shavorskiy and
• Esko Kokkonen

Beilstein J. Nanotechnol. 2025, 16, 1677–1694, doi:10.3762/bjnano.16.118

• remediation, and other light-driven processes. Atomic layer deposition Atomic layer deposition (ALD) is a critical thin-film technology widely used in semiconductors, nanoelectronics, energy storage, catalysis, and advanced coatings. It enables atomically precise control over film thickness and composition

Influence of the epitaxial composition on N-face GaN KOH etch kinetics determined by ICP-OES

• Markus Tautz,
• Maren T. Kuchenbrod,
• Joachim Hertkorn,
• Robert Weinberger,
• Martin Welzel,
• Arno Pfitzner and
• David Díaz Díaz

Beilstein J. Nanotechnol. 2020, 11, 41–50, doi:10.3762/bjnano.11.4

• epitaxy stack. Thin-film technology is a common approach in industry to improve device performance. Thereby, a substrate with higher thermal conductivity, e.g., silicon or nickel, is bonded to the top p-contact of the LED structure [8]. The sapphire substrate is removed by laser lift off (LLO). This

Impact of air exposure and annealing on the chemical and electronic properties of the surface of SnO₂ nanolayers deposited by rheotaxial growth and vacuum oxidation

• Monika Kwoka and
• Maciej Krzywiecki

Beilstein J. Nanotechnol. 2017, 8, 514–521, doi:10.3762/bjnano.8.55

• research is focused on further improvement of the performance of sensors based on nanostructured metal oxides (including one-dimensional) [1][9][10][11]. Nevertheless, one of the most popular technologies for the fabrication of SnO2-based sensors is the thin-film technology. This is because of basic

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• ; nanostructuring; organic thin films; superlattices; thin-film technology; Introduction Many high-end technologies rely on our capability to fabricate thin films and coatings with on-demand tailored compositions and architectures in a highly controlled way. The atomic layer deposition (ALD) technique is capable