Cite the Following Article
Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices
Eduardo Nery Duarte de Araujo, Thiago Alonso Stephan Lacerda de Sousa, Luciano de Moura Guimarães and Flavio Plentz
Beilstein J. Nanotechnol. 2019, 10, 349–355.
https://doi.org/10.3762/bjnano.10.34
How to Cite
de Araujo, E. N. D.; de Sousa, T. A. S. L.; de Moura Guimarães, L.; Plentz, F. Beilstein J. Nanotechnol. 2019, 10, 349–355. doi:10.3762/bjnano.10.34
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