Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

Chun-Da Liao, Andrea Capasso, Tiago Queirós, Telma Domingues, Fatima Cerqueira, Nicoleta Nicoara, Jérôme Borme, Paulo Freitas and Pedro Alpuim
Beilstein J. Nanotechnol. 2022, 13, 796–806. https://doi.org/10.3762/bjnano.13.70

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Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production
Chun-Da Liao, Andrea Capasso, Tiago Queirós, Telma Domingues, Fatima Cerqueira, Nicoleta Nicoara, Jérôme Borme, Paulo Freitas and Pedro Alpuim
Beilstein J. Nanotechnol. 2022, 13, 796–806. https://doi.org/10.3762/bjnano.13.70

How to Cite

Liao, C.-D.; Capasso, A.; Queirós, T.; Domingues, T.; Cerqueira, F.; Nicoara, N.; Borme, J.; Freitas, P.; Alpuim, P. Beilstein J. Nanotechnol. 2022, 13, 796–806. doi:10.3762/bjnano.13.70

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