Cite the Following Article
Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates
Aleksandra Szkudlarek, Jan M. Michalik, Inés Serrano-Esparza, Zdeněk Nováček, Veronika Novotná, Piotr Ozga, Czesław Kapusta and José María De Teresa
Beilstein J. Nanotechnol. 2024, 15, 190–198.
https://doi.org/10.3762/bjnano.15.18
How to Cite
Szkudlarek, A.; Michalik, J. M.; Serrano-Esparza, I.; Nováček, Z.; Novotná, V.; Ozga, P.; Kapusta, C.; De Teresa, J. M. Beilstein J. Nanotechnol. 2024, 15, 190–198. doi:10.3762/bjnano.15.18
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