Focused ion and electron beams for synthesis and characterization of nanomaterials
Dr. Aleksandra Szkudlarek, AGH University of Science and Technology, Poland
Dr. Ivo Utke, Swiss Laboratories for Materials Science and Technology (EMPA), Switzerland
Dr. Katja Höflich, Ferdinand-Braun-Institut gGmbH, Germany
Dr. Gregor Hlawacek, Helmholtz-Zentrum Dresden-Rossendorf, Germany
Dr. Nico Klingner, Helmholtz-Zentrum Dresden-Rossendorf, Germany
This thematic issue is dedicated to the synthesis and characterization of nanomaterials using focused ion and electron beams. The aim is to provide an overview of the recent advancements made over the last years by the communities.
In particular, the issue is focused on the following aspects:
- 1D, 2D and 3D additive manufacturing (nanoprinting) of functional nanostructures for superconducting, magnetic and plasmonic applications.
- Spatially resolved removal or modification of materials using gas-assisted electron/ion beam lithography.
- Focused ion beam (FIB) milling and development of new ion beam sources and gas precursors.
- Characterization methods using focused charged particle beams with techniques such as cryo-electron microscopy, helium ion microscopy, and secondary ion mass spectroscopy.
- Development of novel instrumentation for current and future research on applications of multiple ion species plasma FIB, effective structural modification of nanomaterials using laser FIB, and FIB–SEM tomography for advanced microstructural analysis.
- Theoretical aspects of electron and ion interactions and surface kinetics processes.
Submission deadline: April 30, 2024
*Please contact the guest editors directly if you still want to submit your article*
Fragmentation of metal(II) bis(acetylacetonate) complexes induced by slow electrons
- Janina Kopyra and
- Hassan Abdoul-Carime
Beilstein J. Nanotechnol. 2023, 14, 980–987, doi:10.3762/bjnano.14.81
A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH3)2Cl]2
- Elif Bilgilisoy,
- Ali Kamali,
- Thomas Xaver Gentner,
- Gerd Ballmann,
- Sjoerd Harder,
- Hans-Peter Steinrück,
- Hubertus Marbach and
- Oddur Ingólfsson
Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98
Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates
- Aleksandra Szkudlarek,
- Jan M. Michalik,
- Inés Serrano-Esparza,
- Zdeněk Nováček,
- Veronika Novotná,
- Piotr Ozga,
- Czesław Kapusta and
- José María De Teresa
Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18
Ion beam processing of DNA origami nanostructures
- Leo Sala,
- Agnes Zerolová,
- Violaine Vizcaino,
- Alain Mery,
- Alicja Domaracka,
- Hermann Rothard,
- Philippe Boduch,
- Dominik Pinkas and
- Jaroslav Kocišek
Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20
Sidewall angle tuning in focused electron beam-induced processing
- Sangeetha Hari,
- Willem F. van Dorp,
- Johannes J. L. Mulders,
- Piet H. F. Trompenaars,
- Pieter Kruit and
- Cornelis W. Hagen
Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40
Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – effect of MA ligand and process conditions
- Hannah Boeckers,
- Atul Chaudhary,
- Petra Martinović,
- Amy V. Walker,
- Lisa McElwee-White and
- Petra Swiderek
Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45
Level set simulation of focused ion beam sputtering of a multilayer substrate
- Alexander V. Rumyantsev,
- Nikolai I. Borgardt,
- Roman L. Volkov and
- Yuri A. Chaplygin
Beilstein J. Nanotechnol. 2024, 15, 733–742, doi:10.3762/bjnano.15.61
![[Graphic 55]](/bjnano/content/inline/2190-4286-15-61-i68.svg?max-width=637&scale=1.18182)
Electron-induced ligand loss from iron tetracarbonyl methyl acrylate
- Hlib Lyshchuk,
- Atul Chaudhary,
- Thomas F. M. Luxford,
- Miloš Ranković,
- Jaroslav Kočišek,
- Juraj Fedor,
- Lisa McElwee-White and
- Pamir Nag
Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66
Water-assisted purification during electron beam-induced deposition of platinum and gold
- Cristiano Glessi,
- Fabian A. Polman and
- Cornelis W. Hagen
Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73
Direct electron beam writing of silver using a β-diketonate precursor: first insights
- Katja Höflich,
- Krzysztof Maćkosz,
- Chinmai S. Jureddy,
- Aleksei Tsarapkin and
- Ivo Utke
Beilstein J. Nanotechnol. 2024, 15, 1117–1124, doi:10.3762/bjnano.15.90
A low-kiloelectronvolt focused ion beam strategy for processing low-thermal-conductance materials with nanoampere currents
- Annalena Wolff,
- Nico Klingner,
- William Thompson,
- Yinghong Zhou,
- Jinying Lin and
- Yin Xiao
Beilstein J. Nanotechnol. 2024, 15, 1197–1207, doi:10.3762/bjnano.15.97
Ion-induced surface reactions and deposition from Pt(CO)2Cl2 and Pt(CO)2Br2
- Mohammed K. Abdel-Rahman,
- Patrick M. Eckhert,
- Atul Chaudhary,
- Johnathon M. Johnson,
- Jo-Chi Yu,
- Lisa McElwee-White and
- D. Howard Fairbrother
Beilstein J. Nanotechnol. 2024, 15, 1427–1439, doi:10.3762/bjnano.15.115
Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex
- Chinmai Sai Jureddy,
- Krzysztof Maćkosz,
- Aleksandra Butrymowicz-Kubiak,
- Iwona B. Szymańska,
- Patrik Hoffmann and
- Ivo Utke
Beilstein J. Nanotechnol. 2025, 16, 530–539, doi:10.3762/bjnano.16.41
