Cite the Following Article
AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode
Hendrik Müller, Hartmut Stadler, Teresa de los Arcos, Adrian Keller and Guido Grundmeier
Beilstein J. Nanotechnol. 2024, 15, 603–611.
https://doi.org/10.3762/bjnano.15.51
How to Cite
Müller, H.; Stadler, H.; de los Arcos, T.; Keller, A.; Grundmeier, G. Beilstein J. Nanotechnol. 2024, 15, 603–611. doi:10.3762/bjnano.15.51
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- Wagner, M.; Hu, Q.; Hu, S.; Phillips, C.; Wang, W.; Pittenger, B.; Fali, A.; Li, C.; Mathurin, J.; Dazzi, A.; Su, C.; De Wolf, P. Force Volume Atomic Force Microscopy-Infrared for Simultaneous Nanoscale Chemical and Mechanical Spectromicroscopy. ACS nano 2025, 19, 18791–18803. doi:10.1021/acsnano.5c04015
- Rahe, P.; Bald, I.; Hauptmann, N.; Hoffmann-Vogel, R.; Mönig, H.; Reichling, M. Advanced atomic force microscopy techniques V. Beilstein journal of nanotechnology 2025, 16, 54–56. doi:10.3762/bjnano.16.6