Advanced atomic force microscopy techniques V

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Dr. Philipp Rahe, Universität Osnabrück, Germany
Prof. Ilko Bald, University of Potsdam, Germany
Dr. Nadine Hauptmann, Radboud University, The Netherlands
Prof. Regina Hoffmann-Vogel, University of Potsdam, Germany
Dr. Harry Mönig, Wilhelms-Universität Münster, Germany
Prof. Michael Reichling, Universität Osnabrück, Germany
 
Atomic force microscopy (AFM) is well established as a major tool for atomic and nanoscale characterisation in diverse fields across physics, chemistry, material science, biology, and the sciences. Yet, research in AFM is characterised by constant improvement in sensitivity and speed, innovation in experimental techniques and simulation methods, and expansion toward new fields of application.

This thematic issue reflects the latest achievements and highlights in experimental, theoretical, and instrumental developments as well as landmark results in the characterisation and manipulation of single spins, atoms, molecules and nanosystems, functional surfaces, as well as quantum system observation and control, studies in liquids, and interaction with light. In addition we focus on synergies with other measurement techniques such as scanning tunnelling microscopy and optical spectroscopy. Recent work demonstrates that AFM exploits the full range of electromagnetic interactions spanning from spin–spin and exchange interactions to van-der-Waals, electrostatic, and collective magnetic interactions, making AFM a tool that is universal in comparison to other surface science and nanosystem analysis techniques.

Submission Deadline: April 30, 2024
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Cross-sectional Kelvin probe force microscopy on III–V epitaxial multilayer stacks: challenges and perspectives

  • Mattia da Lisca,
  • José Alvarez,
  • James P. Connolly,
  • Nicolas Vaissiere,
  • Karim Mekhazni,
  • Jean Decobert and
  • Jean-Paul Kleider

Beilstein J. Nanotechnol. 2023, 14, 725–737, doi:10.3762/bjnano.14.59

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Published 14 Jun 2023

Spatial mapping of photovoltage and light-induced displacement of on-chip coupled piezo/photodiodes by Kelvin probe force microscopy under modulated illumination

  • Zeinab Eftekhari,
  • Nasim Rezaei,
  • Hidde Stokkel,
  • Jian-Yao Zheng,
  • Andrea Cerreta,
  • Ilka Hermes,
  • Minh Nguyen,
  • Guus Rijnders and
  • Rebecca Saive

Beilstein J. Nanotechnol. 2023, 14, 1059–1067, doi:10.3762/bjnano.14.87

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Published 06 Nov 2023

Dual-heterodyne Kelvin probe force microscopy

  • Benjamin Grévin,
  • Fatima Husainy,
  • Dmitry Aldakov and
  • Cyril Aumaître

Beilstein J. Nanotechnol. 2023, 14, 1068–1084, doi:10.3762/bjnano.14.88

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Published 07 Nov 2023

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

  • François Piquemal,
  • Khaled Kaja,
  • Pascal Chrétien,
  • José Morán-Meza,
  • Frédéric Houzé,
  • Christian Ulysse and
  • Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

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Published 22 Nov 2023

Spatial variations of conductivity of self-assembled monolayers of dodecanethiol on Au/mica and Au/Si substrates

  • Julian Skolaut,
  • Jędrzej Tepper,
  • Federica Galli,
  • Wulf Wulfhekel and
  • Jan M. van Ruitenbeek

Beilstein J. Nanotechnol. 2023, 14, 1169–1177, doi:10.3762/bjnano.14.97

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Published 05 Dec 2023

unDrift: A versatile software for fast offline SPM image drift correction

  • Tobias Dickbreder,
  • Franziska Sabath,
  • Lukas Höltkemeier,
  • Ralf Bechstein and
  • Angelika Kühnle

Beilstein J. Nanotechnol. 2023, 14, 1225–1237, doi:10.3762/bjnano.14.101

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Published 28 Dec 2023

Unveiling the nature of atomic defects in graphene on a metal surface

  • Karl Rothe,
  • Nicolas Néel and
  • Jörg Kröger

Beilstein J. Nanotechnol. 2024, 15, 416–425, doi:10.3762/bjnano.15.37

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Published 15 Apr 2024

Stiffness calibration of qPlus sensors at low temperature through thermal noise measurements

  • Laurent Nony,
  • Sylvain Clair,
  • Daniel Uehli,
  • Aitziber Herrero,
  • Jean-Marc Themlin,
  • Andrea Campos,
  • Franck Para,
  • Alessandro Pioda and
  • Christian Loppacher

Beilstein J. Nanotechnol. 2024, 15, 580–602, doi:10.3762/bjnano.15.50

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Published 23 May 2024

AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode

  • Hendrik Müller,
  • Hartmut Stadler,
  • Teresa de los Arcos,
  • Adrian Keller and
  • Guido Grundmeier

Beilstein J. Nanotechnol. 2024, 15, 603–611, doi:10.3762/bjnano.15.51

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Published 24 May 2024
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