Cite the Following Article
Level set simulation of focused ion beam sputtering of a multilayer substrate
Alexander V. Rumyantsev, Nikolai I. Borgardt, Roman L. Volkov and Yuri A. Chaplygin
Beilstein J. Nanotechnol. 2024, 15, 733–742.
https://doi.org/10.3762/bjnano.15.61
How to Cite
Rumyantsev, A. V.; Borgardt, N. I.; Volkov, R. L.; Chaplygin, Y. A. Beilstein J. Nanotechnol. 2024, 15, 733–742. doi:10.3762/bjnano.15.61
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Scholarly Works
- Rumyantsev, A. V.; Borgardt, N. I.; Volkov, R. L. Reducing ion implantation in focused ion beam nanofabrication. Nanoscale 2025, 17, 21141–21156. doi:10.1039/d5nr01571e
- Szkudlarek, A. Focused ion and electron beams for synthesis and characterization of nanomaterials. Beilstein journal of nanotechnology 2025, 16, 613–616. doi:10.3762/bjnano.16.47
