Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

Adrian Iovan, Marco Fischer, Roberto Lo Conte and Vladislav Korenivski
Beilstein J. Nanotechnol. 2012, 3, 884–892. https://doi.org/10.3762/bjnano.3.98

Cite the Following Article

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices
Adrian Iovan, Marco Fischer, Roberto Lo Conte and Vladislav Korenivski
Beilstein J. Nanotechnol. 2012, 3, 884–892. https://doi.org/10.3762/bjnano.3.98

How to Cite

Iovan, A.; Fischer, M.; Lo Conte, R.; Korenivski, V. Beilstein J. Nanotechnol. 2012, 3, 884–892. doi:10.3762/bjnano.3.98

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