Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Jörg Haeberle, Karsten Henkel, Hassan Gargouri, Franziska Naumann, Bernd Gruska, Michael Arens, Massimo Tallarida and Dieter Schmeißer
Beilstein J. Nanotechnol. 2013, 4, 732–742. https://doi.org/10.3762/bjnano.4.83

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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Jörg Haeberle, Karsten Henkel, Hassan Gargouri, Franziska Naumann, Bernd Gruska, Michael Arens, Massimo Tallarida and Dieter Schmeißer
Beilstein J. Nanotechnol. 2013, 4, 732–742. https://doi.org/10.3762/bjnano.4.83

How to Cite

Haeberle, J.; Henkel, K.; Gargouri, H.; Naumann, F.; Gruska, B.; Arens, M.; Tallarida, M.; Schmeißer, D. Beilstein J. Nanotechnol. 2013, 4, 732–742. doi:10.3762/bjnano.4.83

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