Energy conversion applications of atomic layer deposition

  1. editorImage
  1. Editor: Prof. Julien Bachmann
    Friedrich Alexander Universität Erlangen-Nürnberg

Any method capable of depositing thin functional layers onto structured substrates, and especially into nanoporous frameworks, is conferred with a direct relevance towards energy conversion applications. The conformal coating of non-planar samples is a property that uniquely defines atomic layer deposition (ALD), which is why ALD is inherently suited to the preparation of energy conversion devices. ALD achieves a thin film growth by using well-defined surface chemistry. Two or more complementary, quantitative surface reactions performed subsequently and repeated in an alternating manner result in the deposition of a solid in a layer-by-layer fashion. This Thematic Series will certainly provide the reader with novel ideas for exploiting ALD in the energy realm, and spur further original work in this rapidly developing research area. After its industrial application in electroluminescent displays, semiconductor logics, magnetic and semiconductor memory, ALD has the potential to also become a critical tool in the area of energy conversion.

  • Editorial
  • Published 05 Mar 2014

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Beilstein J. Nanotechnol. 2014, 5, 245–248, doi:10.3762/bjnano.5.26

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  3. Mikhael Bechelany,
  4. Zanda Alute,
  5. Donats Erts,
  6. Anastasiya Zalesskaya,
  7. Kristaps Kovalevskis,
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  10. Philippe Miele
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  • Published 28 Oct 2013

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Beilstein J. Nanotechnol. 2013, 4, 690–698, doi:10.3762/bjnano.4.78

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  2. Pablo R. Ortega,
  3. Cristóbal Voz,
  4. Isidro Martín,
  5. Mónica Colina,
  6. Anna B. Morales,
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  • Published 06 Nov 2013

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Beilstein J. Nanotechnol. 2013, 4, 726–731, doi:10.3762/bjnano.4.82

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  2. Karsten Henkel,
  3. Hassan Gargouri,
  4. Franziska Naumann,
  5. Bernd Gruska,
  6. Michael Arens,
  7. Massimo Tallarida and
  8. Dieter Schmeißer
  • Full Research Paper
  • Published 08 Nov 2013

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Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

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  2. Nathanaëlle Schneider,
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  • Full Research Paper
  • Published 13 Nov 2013

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Beilstein J. Nanotechnol. 2013, 4, 750–757, doi:10.3762/bjnano.4.85

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  2. Chittaranjan Das and
  3. Dieter Schmeisser
  • Full Research Paper
  • Published 22 Jan 2014

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Beilstein J. Nanotechnol. 2014, 5, 77–82, doi:10.3762/bjnano.5.7

3D-nanoarchitectured Pd/Ni catalysts prepared by atomic layer deposition for the electrooxidation of formic acid

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  6. Margrit Hanbücken,
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  • Published 12 Feb 2014

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  8. Piotr Bieganski,
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  10. Marek Godlewski
  • Full Research Paper
  • Published 14 Feb 2014

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Beilstein J. Nanotechnol. 2014, 5, 173–179, doi:10.3762/bjnano.5.17

Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes

  1. Nuri Yazdani,
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  5. Hyung Gyu Park and
  6. Ivo Utke
  • Full Research Paper
  • Published 05 Mar 2014

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Beilstein J. Nanotechnol. 2014, 5, 234–244, doi:10.3762/bjnano.5.25

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