Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch2

Cheng Huang, Alexander Förste, Stefan Walheim and Thomas Schimmel
Beilstein J. Nanotechnol. 2015, 6, 1205–1211. https://doi.org/10.3762/bjnano.6.123

Cite the Following Article

Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch2
Cheng Huang, Alexander Förste, Stefan Walheim and Thomas Schimmel
Beilstein J. Nanotechnol. 2015, 6, 1205–1211. https://doi.org/10.3762/bjnano.6.123

How to Cite

Huang, C.; Förste, A.; Walheim, S.; Schimmel, T. Beilstein J. Nanotechnol. 2015, 6, 1205–1211. doi:10.3762/bjnano.6.123

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