Morphology of SiO2 films as a key factor in alignment of liquid crystals with negative dielectric anisotropy

Volodymyr Tkachenko, Antigone Marino, Eva Otón, Noureddine Bennis and Josè Manuel Otón
Beilstein J. Nanotechnol. 2016, 7, 1743–1748. https://doi.org/10.3762/bjnano.7.167

Cite the Following Article

Morphology of SiO2 films as a key factor in alignment of liquid crystals with negative dielectric anisotropy
Volodymyr Tkachenko, Antigone Marino, Eva Otón, Noureddine Bennis and Josè Manuel Otón
Beilstein J. Nanotechnol. 2016, 7, 1743–1748. https://doi.org/10.3762/bjnano.7.167

How to Cite

Tkachenko, V.; Marino, A.; Otón, E.; Bennis, N.; Otón, J. M. Beilstein J. Nanotechnol. 2016, 7, 1743–1748. doi:10.3762/bjnano.7.167

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