Cite the Following Article
Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process
Ragesh Kumar T P, Sangeetha Hari, Krishna K Damodaran, Oddur Ingólfsson and Cornelis W. Hagen
Beilstein J. Nanotechnol. 2017, 8, 2376–2388.
https://doi.org/10.3762/bjnano.8.237
How to Cite
P, R. K. T.; Hari, S.; Damodaran, K. K.; Ingólfsson, O.; Hagen, C. W. Beilstein J. Nanotechnol. 2017, 8, 2376–2388. doi:10.3762/bjnano.8.237
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