Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

  1. Dédalo Sanz-Hernández and
  2. Amalio Fernández-Pacheco

Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom

  1. Corresponding author email

This article is part of the Thematic Series "Chemistry for electron-induced nanofabrication".

Guest Editor: P. Swiderek
Beilstein J. Nanotechnol. 2017, 8, 2591. doi:10.3762/bjnano.8.259
Received 17 Nov 2017, Accepted 24 Nov 2017, Published 05 Dec 2017

Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir model

The originally published Equation 1 contains a mistake. The theta factor in the second right term is missing. The correct Equation 1 is

[2190-4286-8-259-i1]
(1)

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© 2017 Sanz-Hernández and Fernández-Pacheco; licensee Beilstein-Institut.
This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (http://www.beilstein-journals.org/bjnano)

 
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