Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

  1. Dédalo Sanz-Hernández and
  2. Amalio Fernández-Pacheco

Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom

  1. Corresponding author email

This article is part of the Thematic Series "Chemistry for electron-induced nanofabrication".

Guest Editor: P. Swiderek
Beilstein J. Nanotechnol. 2017, 8, 2591.
Received 17 Nov 2017, Accepted 24 Nov 2017, Published 05 Dec 2017

Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir model

The originally published Equation 1 contains a mistake. The theta factor in the second right term is missing. The correct Equation 1 is


© 2017 Sanz-Hernández and Fernández-Pacheco; licensee Beilstein-Institut.
This is an Open Access article under the terms of the Creative Commons Attribution License (, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (

Back to Article List

Other Beilstein-Institut Open Science Activities

Keep Informed

RSS Feed

Subscribe to our Latest Articles RSS Feed.


Follow the Beilstein-Institut


Twitter: @BeilsteinInst