1 article(s) from Acosta Alba, Pablo

A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1−xGex and Si layers

  1. Richard Daubriac,
  2. Emmanuel Scheid,
  3. Hiba Rizk,
  4. Richard Monflier,
  5. Sylvain Joblot,
  6. Rémi Beneyton,
  7. Pablo Acosta Alba,
  8. Sébastien Kerdilès and
  9. Filadelfo Cristiano
  • Full Research Paper
  • Published 05 Jul 2018

  • PDF

  • Supp. Info

Beilstein J. Nanotechnol. 2018, 9, 1926–1939, doi:10.3762/bjnano.9.184

Keep Informed

RSS Feed

Subscribe to our Latest Articles RSS Feed.


Follow the Beilstein-Institut


Twitter: @BeilsteinInst