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1 article(s) from Dutta, Alapan

Controllable physicochemical properties of WO_x thin films grown under glancing angle

Rupam Mandal,
Aparajita Mandal,
Alapan Dutta,
Rengasamy Sivakumar,
Sanjeev Kumar Srivastava and
Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

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Figure 1: AFM height images of (a–d) as-deposited and (e–h) vacuum-annealed WO_x films grown at a fixed glanci...

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Figure 2: (a) Transmittance plots of the as-deposited NS-WO_x films and (b) bandgap variation with film thickn...

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Figure 3: (a, c) XPS core-level spectra for W 4f and O 1s, respectively, of a 6 nm as-deposited WO_x film. (b,...

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Figure 4: (a, b) and (c, d) V_CPD maps of, respectively, as-deposited and vacuum annealed WO_x films having thi...

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Figure 5: XRD spectra of WO_x films deposited at 87° before and after annealing. The inset shows the XRD spect...

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Figure 6: I–V characteristics of (a) as-deposited and (b) annealed WO_x/p-Si heterostructures for different WO_x...

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Published 02 Apr 2024

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Controllable physicochemical properties of WOx thin films grown under glancing angle

Controllable physicochemical properties of WO_x thin films grown under glancing angle