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1 article(s) from Hofmann, Stephan

Time of flight secondary ion mass spectrometry imaging of contaminant species in chemical vapour deposited graphene on copper

Barry Brennan,
Vlad-Petru Veigang-Radulescu,
Philipp Braeuninger-Weimer,
Stephan Hofmann and
Andrew J. Pollard

Beilstein J. Nanotechnol. 2026, 17, 200–213, doi:10.3762/bjnano.17.13

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Figure 1: Representative ToF-SIMS surface images (500 µm × 500 µm) of C₂⁻ (red), C₄⁻ (green), and C₆⁻ (blue) ...

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Figure 2: ToF-SIMS surface images (500 µm × 500 µm) of substrate-related Cu⁻ (red), CuH₂O₂⁻ (green) and Cu₂H₃O...

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Figure 3: ToF-SIMS depth profile images of graphene grown on copper foils utilising different graphene growth...

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Figure 4: ToF-SIMS images (4 mm x 4 mm) from the surface of the BO sample, showing in (a) the C₂⁻ graphene-re...

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Figure 5: ToF-SIMS surface images (500 µm × 500 µm) of the F⁻ (red), Cl⁻ (green), and CuFCl⁻ (blue) ion signa...

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Figure 6: ToF-SIMS depth profiles from (a) back side oxidation + Ar annealed (BO), (b) Ar:H₂ annealed (Ar:H₂)...

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Figure 7: ToF-SIMS surface images (500 µm × 500 µm) from the BO sample showing (a) C_n⁻ species related to gra...

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Figure 8: XPS spectra from the Ar annealed, and back side oxidation + Ar annealed samples prior to graphene g...

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Figure 9: 3D ToF-SIMS images (150 µm × 150 µm) of a 200 nm PVD high-purity copper layer deposited on top of a...

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Published 21 Jan 2026

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