2 article(s) from Hoummada, Khalid

Nanoporous Ge thin film production combining Ge sputtering and dopant implantation

  1. Jacques Perrin Toinin,
  2. Alain Portavoce,
  3. Khalid Hoummada,
  4. Michaƫl Texier,
  5. Maxime Bertoglio,
  6. Sandrine Bernardini,
  7. Marco Abbarchi and
  8. Lee Chow
  • Full Research Paper
  • Published 30 Jan 2015

  • PDF
Graphical Abstract

Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32

Si/Ge intermixing during Ge Stranski–Krastanov growth

  1. Alain Portavoce,
  2. Khalid Hoummada,
  3. Antoine Ronda,
  4. Dominique Mangelinck and
  5. Isabelle Berbezier
  • Full Research Paper
  • Published 09 Dec 2014

  • PDF
Graphical Abstract

Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246

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