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Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32
Figure 1: SRIM calculations of the implant distribution of Te (red) and Se (blue) atoms in Ge. The distributi...
Figure 2: SEM plan-view images of the as-implanted Se sample: (1) low resolution view showing the different t...
Figure 3: Thermal annealing effects on the co-implanted Se/Te sample: (1) as-implanted, (2) TB = 4.1 µm; (3) ...
Figure 4: (1) and (2) TEM cross-sectional view of the Se-implanted sample after annealing with TB = 3.1 µm. (...
Figure 5: SEM plan-view image obtained after annealing a 340 nm thick Ge layer sputtered on the native Si oxi...
Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246
Figure 1: SEM images acquired during APT sample preparation in a dual-beam FIB process. The image sequence (a...
Figure 2: Sketch of the sample structure and AFM measurements performed on the sample surface after MBE growt...
Figure 3: APT volume (100 × 100 × 90 nm3) obtained from the sample. Green, gray, red and blue dots correspond...
Figure 4: Top-down, 1D Ge concentration profiles measured between the islands in two different samples. The p...
Figure 5: Cross-sectional TEM image of a typical dome island (a), and side-views of two different APT volumes...
Figure 6: APT volume showing 2% of the Ni atoms, 5% of the Ge atoms, and 100% of the O atoms (the Si atoms ar...
Figure 7: Top-down 1D Ge concentration profiles measured in two different APT volumes, one in the direction p...
Figure 8: APT analysis: (a) 3D volume (120 × 120 × 100 nm3), (b) 2D map of the Ge concentration distribution ...
Figure 9: (a) APT volume (90 × 90 × 130 nm3) and (b) Si and Ge 1D concentration profiles measured in (a). Figure 9c in...
Figure 10: (a) APT volume (70 × 70 × 85 nm3) and (b) Si and Ge 1D concentration profiles measured in this volu...
Figure 11: APT measurements obtained for four APT volumes (green and red surfaces) which form almost half of a...