1 article(s) from Joblot, Sylvain

A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1−xGex and Si layers

  1. Richard Daubriac,
  2. Emmanuel Scheid,
  3. Hiba Rizk,
  4. Richard Monflier,
  5. Sylvain Joblot,
  6. Rémi Beneyton,
  7. Pablo Acosta Alba,
  8. Sébastien Kerdilès and
  9. Filadelfo Cristiano
  • Full Research Paper
  • Published 05 Jul 2018

  • PDF

  • Supp. Info
Graphical Abstract

Beilstein J. Nanotechnol. 2018, 9, 1926–1939, doi:10.3762/bjnano.9.184

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