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Beilstein J. Nanotechnol. 2026, 17, 818–827, doi:10.3762/bjnano.17.58
Figure 1: Demonstration of the ultrasonic cleaning process for substrate reuse. (a) Schematic diagram illustr...
Figure 2: Substrates with different pre-patterned electrodes before and after cleaning. (a, b) Macroscopic im...
Figure 3: Repeated characterization of MoS2- and WSe2-based FETs on the same pre-patterned SiO2/Si chip befor...
Figure 4: Raman analysis of the electrode surface in the pristine state, after roll-to-roll mechanically exfo...
Figure 5: Reproducible fabrication, cleaning, and characterization of monolayer MoS2 FETs on the same pre-pat...