The nanofluidic confinement apparatus: studying confinement-dependent nanoparticle behavior and diffusion

• Stefan Fringes,
• Felix Holzner and
• Armin W. Knoll

Beilstein J. Nanotechnol. 2018, 9, 301–310, doi:10.3762/bjnano.9.30

• of the confining surfaces can be determined. By tilting the sample, the phase difference was minimized using the cross-correlation of the corner to the center signals. The optical path difference between glass and substrate varies because of the inherent surface roughness of the contributing

• measured surface roughness values. During the measurements described in the subsequent sections, thermal drift and pressure changes may lead to a deflection of the relatively compliant cover glass. These deflections are compensated by implementing a closed-loop system, that registers changes in the

• = 0.61d (black) and in the middle of the slit h = 0.5d (gray). The asymmetric height leads to merely 1.5% lower diffusion coefficients and cannot explain the 20–50% lower diffusivity measured. We also exclude that the localization due to surface roughness is the predominant factor for this reduction

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• difficult to fabricate due to their high intrinsic stress, large surface roughness and grain size, inherent porosity, and low strength. To date, there are rather few reports on metallic NEM switches [17][18][114][115]. Molybdenum is attractive as a NEM switch material due to its high melting temperature

Liquid-crystalline nanoarchitectures for tissue engineering

• Baeckkyoung Sung and
• Min-Ho Kim

Beilstein J. Nanotechnol. 2018, 9, 205–215, doi:10.3762/bjnano.9.22

• modulus, porosity, surface roughness, and local anisotropy [102]. LC hydrogels and implants in nematic and smectic-A phases LC-ordered anisotropic gels have great potential to be directly applied to regenerative medicine therapeutics, due to their intrinsic tissue compatibility. Thermally or

Dopant-stimulated growth of GaN nanotube-like nanostructures on Si(111) by molecular beam epitaxy

• Alexey D. Bolshakov,
• Alexey M. Mozharov,
• Georgiy A. Sapunov,
• Igor V. Shtrom,
• Nickolay V. Sibirev,
• Vladimir V. Fedorov,
• Evgeniy V. Ubyivovk,
• Maria Tchernycheva,
• George E. Cirlin and
• Ivan S. Mukhin

Beilstein J. Nanotechnol. 2018, 9, 146–154, doi:10.3762/bjnano.9.17

• the field of photovoltaics. In case of silicon-based solar cells (SCs), reflection can be reduced from 30% (pure Si) down to 3% without deposition of multilayer antireflection coatings or involvement of complicated postgrowth techniques generally used for modification of the SC surface roughness [9

Growth model and structure evolution of Ag layers deposited on Ge films

• Arkadiusz Ciesielski,
• Lukasz Skowronski,
• Ewa Górecka,
• Jakub Kierdaszuk and
• Tomasz Szoplik

Beilstein J. Nanotechnol. 2018, 9, 66–76, doi:10.3762/bjnano.9.9

• [13][14]. The SPP wave propagation length depends on the permittivity of the metal film, but also on its surface roughness, which is responsible for scattering losses. Thin silver layers deposited on glass substrates usually exhibit an island growth [15]. One way of fabricating smooth and thermally

• (AFM) scans show that the grain size indeed decreases when the Ag layer is deposited on a Ge wetting film (Figure 2b) with respect to the non wetted film (Figure 2a), which is in consistency with the previous findings [4][19][20][22][24]. Table 1 shows the AFM- and XRR-derived surface roughness root

• measurements performed 3 days after deposition, which indicates that with time, the surface roughness of the silver films has increased. This is likely because of the slight movement of the silver grains due to the migration of the Ge atoms to the subsurface grain boundaries. The XRR data for the samples

Exploring wear at the nanoscale with circular mode atomic force microscopy

• Olivier Noel,
• Aleksandar Vencl and
• Pierre-Emmanuel Mazeran

Beilstein J. Nanotechnol. 2017, 8, 2662–2668, doi:10.3762/bjnano.8.266

• less than 100 nm) [26]. The surface roughness, Ra, of the samples, determined from AFM topographic images of 5 × 5 µm, is 2.9 ± 0.6 nm. Wear experiments were performed with the CM-AFM mode implemented on a DI-3100 Nanoscope V controller Bruker AFM, in air, at ambient temperature and at a relative

Interface conditions of roughness-induced superoleophilic and superoleophobic surfaces immersed in hexadecane and ethylene glycol

• Yifan Li,
• Yunlu Pan and
• Xuezeng Zhao

Beilstein J. Nanotechnol. 2017, 8, 2504–2514, doi:10.3762/bjnano.8.250

• affect the effective value of slip length in measurements. Moreover, there are no studies on the effect of roughness on slip at interfaces between oil and superoleophilic/superoleophobic surfaces. A theoretical description of the real surface roughness is yet to be found. Results show that the effective

• slip length is negative and decreases with an increasing root mean squared (RMS) roughness of surfaces, as the increasing roughness enhances the area with discontinuous slip at the solid–liquid interface. The underlying mechanisms are analyzed. The amplitude parameters of surface roughness could

• degrees of roughness, and demonstrated that surface roughness at different length scales seems to influence the additional slippage. Kunert and Harting [20] investigated the problem of roughness-induced slip by means of lattice Boltzmann (LB) simulations and measured the slip length on a randomly generated

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• -line leveling, surface roughness, profile extraction and 3D rendering was carried out with Pico Image Basic 5.0.2 software. Deposition, characterization and treatment of FEBID structures in the FIB Nova 200 system In these experiments, FEBID was performed on a FIB Nova 200 dual beam microscope (FEI

• %) with no deposit damage or void formation. In a Cu example, Miyazoe et al. [27] investigated H2–Ar microplasma effects on FEBID deposits created from Cu(hfac)2. Postgrowth purification resulted in an increase in Cu content from ≈12% to 27%, coupled with a volume decrease and an increase in surface

• roughness. Wnuk et al. [28] subjected deposits created from Me2Au(acac) to AH and/or atomic oxygen (AO). AH removed all of the O atoms and the majority of C atoms from the deposit while AO removed all of the C atoms far more efficiently than AH, but with some accompanying Au oxidation. However, exposure to

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• film (Figure 5). We note that the polymer residue was not observed on the surface of the DNA nanotube master template with the ca. 5 nm thick Al2O3 film even after the 5th replication. The surface roughness of Al2O3 film grown using ALD slowly increases as the number of cycles goes up [49]. Therefore

Surfactant-induced enhancement of droplet adhesion in superhydrophobic soybean (Glycine max L.) leaves

• Oliver Hagedorn,
• Ingo Fleute-Schlachter,
• Hans Georg Mainx,
• Viktoria Zeisler-Diehl and
• Kerstin Koch

Beilstein J. Nanotechnol. 2017, 8, 2345–2356, doi:10.3762/bjnano.8.234

• of wax platelets composed of n-hexatriacontane [43]. Smaller sizes of wax crystals reduce the surface roughness and the contact angle and also increase the adherence of the droplets to the surfaces, as indicated by the hysteresis or given tilt angles [42][43]. Surfactants with a high HLB value (XP ED

Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth

• Landon J. Brower,
• Lauren K. Gentry,
• Amanda L. Napier and
• Mary E. Anderson

Beilstein J. Nanotechnol. 2017, 8, 2307–2314, doi:10.3762/bjnano.8.230

• characterize samples, investigating surface morphology, surface roughness, and film thickness. Results and Discussion For this study of codeposition and seeded surMOF film growth, the MOF was anchored to the substrate by a SAM of 16-mercaptohexadecanoic acid (MHDA), which was formed on a thermally deposited

• Nanoscope Analysis software (Bruker, Santa Barbara, CA, USA). This program was used to appropriately flatten and scale the image. The geometric average surface roughness, Rq, was calculated for each image. The reported roughness values and standard deviations herein (Table 1) reflect the average Rq from a

The interplay between spin densities and magnetic superexchange interactions: case studies of mono- and trinuclear bis(oxamato)-type complexes

• Azar Aliabadi,
• Bernd Büchner,
• Vladislav Kataev and
• Tobias Rüffer

Beilstein J. Nanotechnol. 2017, 8, 2245–2256, doi:10.3762/bjnano.8.224

• of spintronic devices in detail, we focused on the synthesis of type-III complexes as models of SMMs with the aim to deposit them as thin films on surfaces. Already in 2006, we reported on the deposition of thin films of a type-III complex by spin coating [27], although the surface roughness of the

Angstrom-scale flatness using selective nanoscale etching

• Takashi Yatsui,
• Hiroshi Saito and
• Katsuyuki Nobusada

Beilstein J. Nanotechnol. 2017, 8, 2181–2185, doi:10.3762/bjnano.8.217

• obtained 0 min, 5 min, and 35 min after wet etching. In the AFM images, the surface roughness (Ra) was found to be 0.161, 0.134, and 0.100 nm, respectively (solid circles in Figure 3d). In addition, we checked the Ra where light was not irradiated with the Ca(ClO)2 solution and found that its value was

• unchanged (0.139 nm for before and 0.138 nm for after etching; solid squares in Figure 3d). These results indicate that near-field wet etching decreased the surface roughness. We also plotted the root mean square (RMS) roughness values in Figure 3d. Although the value is not the same, they have a similar

• , further control of the selective etching at smaller scales should be achievable by controlling mean free path (i.e. the partial pressure of the gas). Schematic of the near-field etching process. Experimental setup for the near-field wet etching technique. Time dependence of surface roughness using a

A comparative study of the nanoscale and macroscale tribological attributes of alumina and stainless steel surfaces immersed in aqueous suspensions of positively or negatively charged nanodiamonds

• Colin K. Curtis,
• Antonin Marek,
• Alex I. Smirnov and
• Jacqueline Krim

Beilstein J. Nanotechnol. 2017, 8, 2045–2059, doi:10.3762/bjnano.8.205

• consistent with strong attachment of NDs and/or chemical changes to the surfaces. AFM images of the surfaces indicated slight increases in the surface roughness upon an exposure to both +ND and −ND suspensions. A suggested mechanism for these observations is that carboxylated −NDs from aqueous suspensions

• saturates towards a value of σs and no longer exhibits fractal scaling. The surface roughness parameters (D, ξ and σs) reported herein were obtained from the log(σ) vs log(scan size) plot method as described by Krim and co-workers [32]. Previously, a detailed comparison of the results obtained by this

• experimental shifts are attributable to the surface roughness of the electrodes. Changes in f and R for the samples exposed to ND suspensions were found to be dependent on the ND surface charge. Both the alumina and SS304 samples exhibit a slow, yet a small increase in f upon an exposure to +ND suspension

Growth and characterization of textured well-faceted ZnO on planar Si(100), planar Si(111), and textured Si(100) substrates for solar cell applications

• Chin-Yi Tsai,
• Jyong-Di Lai,
• Shih-Wei Feng,
• Chien-Jung Huang,
• Chien-Hsun Chen,
• Fann-Wei Yang,
• Hsiang-Chen Wang and
• Li-Wei Tu

Beilstein J. Nanotechnol. 2017, 8, 1939–1945, doi:10.3762/bjnano.8.194

• -sized texture of the Si substrate has a limited contribution. Discussion The main grain orientation, surface morphology, AFM surface roughness (Rq) from AFM, average grain size (D), strain (ε), and CL intensity of samples ZnOp(100), ZnOp(111), and ZnOt(100) are shown in Table 1. The results clearly

• wafer surface. The surface roughness of these pyramidal structures was measured as 0.226 µm using AFM. Therefore, the average size of the pyramidal structures was taken to be approximately this value. The pyramidal structures will expose their (111) facets to the wafer surface. However, their physical

• : 48.488 nm), (b) ZnOp(111) (Rq: 48.284 nm), and (c) ZnOt(100). Surface roughness of each sample, Rq, is given in parentheses when available. (a) The lattice mismatch between a ZnO(110) unit cell of 5.63 Å (× lattice constant a) by 5.20 Å (lattice constant c) and a Si(100) cubic unit cell of 5.43 Å by 5.43

Stick–slip boundary friction mode as a second-order phase transition with an inhomogeneous distribution of elastic stress in the contact area

• Iakov A. Lyashenko,
• Vadym N. Borysiuk and
• Valentin L. Popov

Beilstein J. Nanotechnol. 2017, 8, 1889–1896, doi:10.3762/bjnano.8.189

• mode occurs in tribological systems when the thickness of the lubricant layer separating two contacting surfaces is significantly smaller than the typical size of the surface roughness. At such a system configuration, the lateral motion of the friction surface is followed by a contact interaction

(Metallo)porphyrins for potential materials science applications

• Lars Smykalla,
• Carola Mende,
• Michael Fronk,
• Pablo F. Siles,
• Michael Hietschold,
• Georgeta Salvan,
• Dietrich R. T. Zahn,
• Oliver G. Schmidt,
• Tobias Rüffer and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 1786–1800, doi:10.3762/bjnano.8.180

• electronic transitions. Furthermore, VASE can give an insight into structure and morphology of the films in terms of film thickness, surface roughness, as well as average orientation of the (metallo)porphyrin molecules in the films. Interplay of hydrogen bonding and molecule–substrate interaction in self

Nanotribological behavior of deep cryogenically treated martensitic stainless steel

• Germán Prieto,
• Konstantinos D. Bakoglidis,
• Walter R. Tuckart and
• Esteban Broitman

Beilstein J. Nanotechnol. 2017, 8, 1760–1768, doi:10.3762/bjnano.8.177

• friction coefficient, and a load of 3 µN in a stroke of 10 µm for 12 scanning cycles was used to evaluate the surface roughness. The obtained topographic information at the low load is used to calculate the wear rate and roughness evolution, while the force transducers measure the friction force variations

Collembola cuticles and the three-phase line tension

• Håkon Gundersen,
• Hans Petter Leinaas and
• Christian Thaulow

Beilstein J. Nanotechnol. 2017, 8, 1714–1722, doi:10.3762/bjnano.8.172

• resting on a solid surface, the three phase line is simply the contact line between the drop and the surface. In the case of a drop resting on the top of surface roughness features (i.e., a Cassie–Baxter model state), the three phase line is the sum of the contact lines of each wetted roughness top. By

• lengths and correspondingly large total line energies. Partial wetting is a state where a liquid rests on top of surface roughness features such that the roughness tops are wetted, while the substrate between tops is not wetted. Partial wetting is often referred to as a composite wetting state or a Cassie

• inherent contact angle of the smooth solid. Zheng et al. included a the three-phase line tension in the Cassie–Baxter equation, see Equation 3 [16], where S is the “roughness factor” S = As/L, the ratio between the cross-sectional area (As) and perimeter (L) of a surface roughness top. lcr is an

Surface functionalization of 3D-printed plastics via initiated chemical vapor deposition

• Christine Cheng and
• Malancha Gupta

Beilstein J. Nanotechnol. 2017, 8, 1629–1636, doi:10.3762/bjnano.8.162

• PLA and flat PPFDA due to surface roughness [34]. Penetration of polymer through the lattice was also confirmed by deposition on the silicon wafer piece underneath the lattice. We used Fourier transform infrared spectroscopy (FTIR) (Figure 2b) to compare the spectra of the PPFDA film deposited on the

Parylene C as a versatile dielectric material for organic field-effect transistors

• Tomasz Marszalek,
• Maciej Gazicki-Lipman and
• Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

• polymer is low. It is known that Parylene C films deposited at high pressure and high deposition rate are rough and have non-uniform and poor dielectric properties. A small increase of the deposition rate from 0.015 to 0.08 g/min results in a growth of the root-mean-square surface roughness from 5.78 to

• 9.53 nm [29]. The same effect of an increasing roughness with increasing deposition rate was observed when various film thicknesses were compared (Figure 2) [30]. Therefore, when increasing the sublimation rate, one should be aware of the resulting increase of the film surface roughness. Xylylene

• has on the performance of the single-crystal transistor. Of two crystalline forms of dithiophene-tetrathiafulvalene, the monoclinic alpha polymorph substantially outperformed the hexagonal beta polymorph [45]. The influence of the surface roughness of a dielectric film on the molecular arrangement of

The effect of the electrical double layer on hydrodynamic lubrication: a non-monotonic trend with increasing zeta potential

• Dalei Jing,
• Yunlu Pan and
• Xiaoming Wang

Beilstein J. Nanotechnol. 2017, 8, 1515–1522, doi:10.3762/bjnano.8.152

• interface). Li [9] theoretically studied the combined roles of EDL and surface roughness on the hydrodynamic lubrication. Huang and his colleagues [8][10][13] systematically studied the effects of EDL on the hydrodynamic lubrication or elasto-hydrodynamic lubrication, where the effect of zeta potential was

Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• secondary electron scanning electron microscopy (SEM) image. This observation is confirmed by atomic force microscopy (AFM) images and a low AFM-derived root-mean-squared (RMS) surface roughness of ≈0.8 nm. No voids are detected in the films, indicating a compact morphology. At 400 °C deposition temperature

• the film surface appears structured in nanometer-sized grains, as visible both in the SEM and AFM images. Correspondingly, the granular surface exhibits a much higher RMS surface roughness of ≈3.4 nm. The formation of smooth MoS2 films during RT PVD compared to a nano-grained rougher surface for 400

• ]. X-ray reflectivity (XRR) measurements provide further insights into the properties of our MoS2 films. Figure 2 and Table 1 give XRR-patterns and resulting data on film thickness, surface roughness and mass density of the two films (≈10 nm) deposited at RT and 400 °C, respectively. The thickness

The integration of graphene into microelectronic devices

• Guenther Ruhl,
• Sebastian Wittmann,
• Matthias Koenig and
• Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

• compressive strain of approximately −0.1% [49]. On epitaxial germanium(001) with a higher surface roughness there is a higher compressive strain in the range between −0.37% and −0.25% [33]. Thus, it is crucial to provide substrates as smooth as possible for graphene integration. 4 Encapsulation In order to

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

• Sun-Kyu Lee,
• Sori Hwang,
• Yoon-Kee Kim and
• Yong-Jun Oh

Beilstein J. Nanotechnol. 2017, 8, 1049–1055, doi:10.3762/bjnano.8.106

• surface roughness relative to the film thickness or is not continuous, the film will break up into multiple fine particles clustered around the pits and mesas. This is the case of Figure 6a,b for the 8 nm thick Ag film on the imprinted sol–gel silica. The size uniformity of the assembled metal particles