Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

• ), Station 17, CH-1015 Lausanne, Switzerland 10.3762/bjnano.3.70 Abstract Background: Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on

• ) is receiving strongly increasing attention as a direct-writing technique for nanostructures due to its great versatility. In FEBID a previously adsorbed molecular precursor is dissociated in the focus of an electron beam provided by a scanning or transmission electron microscope (SEM/TEM). By and