Role of titanium and organic precursors in molecular layer deposition of “titanicone” hybrid materials

• Arbresha Muriqi and
• Michael Nolan

Beilstein J. Nanotechnol. 2022, 13, 1240–1255, doi:10.3762/bjnano.13.103

• surfaces. This is attributed to the stronger Ti–Cl bonds in TiCl4 compared to Ti–N bonds in Ti(DMA)4. Ti(DMA)4 also shows high reactivity to the organics compared to TiCl4. Double reactions of EG and GL with the TiCl3 species from TiCl4 and TiDMA species from Ti(DMA)4 are also explored to better understand

• growth could be achieved. Keywords: density functional theory (DFT) studies; double reactions; surface chemistry; titanicone; Introduction Molecular layer deposition (MLD), a thin film deposition technique, has attracted significant attention in recent years as a suitable approach for the deposition of

• °C which decreases to 1.5 Å/cycle at 135 °C. It was assumed that this drop could be related to the desorption of unreacted TiCl4 species at 135 °C. In addition, it was proposed that the reduction in growth rate could also be caused by the desorption of Ti(–O(CH2)2O–)2 species or double reactions of

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• films were not perpendicular to the substrate surface but significantly tilted, suggesting that double reactions take place during the growth. The only aromatic polyamide grown by MLD so far was fabricated by using terephthaloyl dichloride and 1,4-diaminobenzene as precursors. In industry, these two

• spectroscopy, demonstrating the formation of urea linkages, although some imperfections in the growth, possibly due to double reactions of ED, were also observed. In a later study by Loscutoff et al. [70] the same precursors were used to fabricate thin films on Si(100), treated with 3

• . Heterobifunctionality is believed to reduce the number of double reactions. During the deposition an epoxy ring-opening reaction takes place: The reaction is strongly dependent on the use of strong Lewis acids such as TMA. The first detailed studies of the growth of TMA+GLY thin films were published by Gong et al. [38