Current–voltage characteristics of single-molecule diarylethene junctions measured with adjustable gold electrodes in solution

• Bernd M. Briechle,
• Youngsang Kim,
• Philipp Ehrenreich,
• Artur Erbe,
• Dmytro Sysoiev,
• Thomas Huhn,
• Ulrich Groth and
• Elke Scheer

Beilstein J. Nanotechnol. 2012, 3, 798–808, doi:10.3762/bjnano.3.89

• was annealed for 6 h at 430 °C in vacuum (10−5 mbar). The polyimide layer serves as an electrical insulator and a sacrificial layer in the subsequent etching process. Prior to performing the electron beam lithography process, a double layer of electron-beam resists, MMA-MAA/PMMA, was deposited by spin

Controlled positioning of nanoparticles on a micrometer scale

• Fabian Enderle,
• Oliver Dubbers,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2012, 3, 773–777, doi:10.3762/bjnano.3.86

• arranged in arrays of a certain geometry. For this purpose, a method is introduced combining the bottom-up self-organization of precursor-loaded micelles providing Au nanoparticles (NPs), with top-down electron-beam lithography. As an example, 13 nm Au NPs are arranged in a square array with interparticle

• distances >1 µm on top of Si substrates. By using these NPs as masks for a subsequent reactive ion etching, the square pattern is transferred into Si as a corresponding array of nanopillars. Keywords: electron beam lithography; nanoparticles; positioning; self-assembling; unconventional lithography

• starting point. Thus, the genuine symmetry of their original arrangement again will be hexagonal. However, as will be demonstrated below, combining the micellar method with conventional electron-beam lithography not only extends interparticle distances from typically 100 nm into the micrometer range, but

Revealing thermal effects in the electronic transport through irradiated atomic metal point contacts

• Bastian Kopp,
• Zhiwei Yi,
• Daniel Benner,
• Fang-Qing Xie,
• Christian Obermair,
• Thomas Schimmel,
• Johannes Boneberg,
• Paul Leiderer and
• Elke Scheer

Beilstein J. Nanotechnol. 2012, 3, 703–711, doi:10.3762/bjnano.3.80

• contact has been fabricated electrochemically. For these experiments we used an electrode design similar to the one typical for MCBJs (Figure 6a). The electrodes were prepared by electron-beam lithography, but in contrast to usual MCBJs we used glass substrates and a 500 nm wide gap between the two

• electrolyte. An Ar/Kr laser with output power of 5 mW and 532 nm wavelength was used as the light source. Laser pulses of 0.1 s length and 0.2 s dark time were produced by a mechanical chopper wheel, and the laser was focused to a spot with diameter of 100 μm by an optical lens. Electron-beam lithography

• Prior to the electron-beam lithography process, a thin polyimide layer and a double layer of electron-beam resists, MMA-MAA/PMMA, were deposited by spincoating on the wafer and soft-baked in an oven at 170 °C. The polyimide layer served for both planarization of the commercial glass substrate and for

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• [8]. Patterning of self-assembled monolayers on the nanometer scale is easily performed by sequential lithographic techniques that are well-established in the literature. Electron beam lithography allows the desorption or destruction of molecules of a SAM layer, line by line [9][10]. Advanced

• -force-microscopy-based lithographic techniques allow the structuring and patterning of surfaces with a lateral resolution down to the nanometer scale [24][25][26][27][28][29][30]. The advantage of techniques such as electron beam lithography or SFM-based lithography is their high lateral resolution and

The oriented and patterned growth of fluorescent metal–organic frameworks onto functionalized surfaces

• Jinliang Zhuang,
• Jasmin Friedel and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 570–578, doi:10.3762/bjnano.3.66

• lithography, the lateral distribution of the functional groups could be determined in such a way that the highly localized deposition of the SURMOF films became possible. Keywords: electron-beam lithography; irradiation-promoted exchange reaction; microcontact printing; radiation-induced nanostructure; self

• attained at 60 °C. This temperature effect is now under investigation and is not part of the current work. Fabrication of patterned [Zn2(adc)2dabco] films by microcontact printing and electron-beam lithography techniques SAMs cannot only control the crystallographic orientation of SURMOFs, as has been

• electron-beam lithography (EB lithography). The primary advantage of EB lithography is that the fabricated features can be in the nanometer regime. Figure 6 (upper right) illustrates the process: Starting from a HDT SAM as the primary matrix, disordering and fragmentation occur within the electron-beam

Synthesis and electrical characterization of intrinsic and in situ doped Si nanowires using a novel precursor

• Wolfgang Molnar,
• Alois Lugstein,
• Tomasz Wojcik,
• Peter Pongratz,
• Norbert Auner,
• Christian Bauch and
• Emmerich Bertagnolli

Beilstein J. Nanotechnol. 2012, 3, 564–569, doi:10.3762/bjnano.3.65

• electron beam lithography, Ni sputter deposition and lift-off techniques. Results and Discussion Single-crystalline and epitaxial Si-NWs were grown by using OCTS as a precursor and Au colloids at a growth temperature of 700 °C, with a pre-annealing of the samples at 800 °C for 30 min. The thus synthesized

Radiation-induced nanostructures: Formation processes and applications

• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

• , or in the form of focused electron beams following a maskless approach for pattern definition in a radiation-sensitive resist, also commonly known as electron beam lithography. Examples of this are found in this Thematic Series covering the topics of selected-area silicon nanowire growth by the vapor

Colloidal lithography for fabricating patterned polymer-brush microstructures

• Tao Chen,
• Debby P. Chang,
• Rainer Jordan and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 397–403, doi:10.3762/bjnano.3.46

• separation of biological molecules [14][15][16]. They can be grown by surface-initiated polymerization from surface-confined initiator templates, as fabricated by various lithographic approaches. Although a range of strategies for polymer brush patterning, including photolithography [17], electron-beam

• lithography [18], electron-beam chemical lithography [19], microcontact printing (µCP) [20], scanning-probe lithography [21] and capillary-force lithography [22], have been exploited over the years, there is still considerable interest in the exploitation of new, simple patterning strategies that do not

Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

• Zhe She,
• Andrea DiFalco,
• Georg Hähner and
• Manfred Buck

Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11

• means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• the mask are transferred to the nanostructured metallic surface. Furthermore, electron beam lithography (EBL) [20] is a promising production technique for periodically patterned plasmonic arrays. We have recently shown that gold nanorhomb arrays produced by EBL [21] provide a homogenous signal

• allowing both fluorescence and SERS detection. Finally, once optimized, plasmonic arrays produced by electron beam lithography can also be prepared through nanoimprint techniques, an inexpensive method to manufacture large quantities. Therefore, we report here on the application of such a nanorhomb array

• plasmonic array was optimized for maximum signal enhancement by finite element method (FEM) simulations (COMSOL Multiphysics). Periodically patterned SERS arrays were fabricated by means of electron beam lithography and Argon ion beam etching. Quartz wafer was coated with 20 nm of gold by vacuum evaporation

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• linked with the optical function of the structures. Current techniques for the fabrication of plasmonic cavities include electrochemical growth combined with nanosphere lithography [25][35], electron-beam lithography [36], etching techniques [37][38][39][40] and focused ion beam milling [41][42][43]. The

• techniques based on electron beam lithography and focused ion beam milling allow us to obtain structures of arbitrary shape and two-dimensional profile, but they are size limited and time consuming. Applications outside of sensing are also envisaged. Plasmonic resonators can not only confine light but can

Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substrates

• Dong Wang,
• Ran Ji and
• Peter Schaaf

Beilstein J. Nanotechnol. 2011, 2, 318–326, doi:10.3762/bjnano.2.37

• nanostructuring. The synthesis of 3D arrays of ligand stabilized Au nanoparticles using the self-assembly method has been reported [7], and electron beam lithography has also been used to define positioned nanoparticles at low throughput [8]. Another simple method for the formation of nanoparticle arrays is based