Ultrathin water layers on mannosylated gold nanoparticles

• Maiara A. Iriarte Alonso,
• Jorge H. Melillo,
• Silvina Cerveny,
• Yujin Tong and
• Alexander M. Bittner

Beilstein J. Nanotechnol. 2025, 16, 2183–2198, doi:10.3762/bjnano.16.151

• -propanol, and absolute ethanol and then dried with a nitrogen stream. Oxygen plasma etching (Diener, DE) was carried out for 8 min with 300 W of nominal power (100%), at millibars of oxygen pressure, which creates an OH-terminated layer of hydrophilic silicon oxide. For the hydrophilic functionalization

Quantum circuits with SINIS structures

• Mikhail Tarasov,
• Mikhail Fominskii,
• Aleksandra Gunbina,
• Artem Krasilnikov,
• Maria Mansfeld,
• Dmitrii Kukushkin,
• Andrei Maruhno,
• Valeria Ievleva,
• Mikhail Strelkov,
• Daniil Zhogov,
• Konstantin Arutyunov,
• Vyacheslav Vdovin,
• Vladislav Stolyarov and
• Valerian Edelman

Beilstein J. Nanotechnol. 2025, 16, 1931–1941, doi:10.3762/bjnano.16.134

• with selective etching of superconducting and normal metal electrodes. Improvement in ultimate sensitivity is achieved by suspending the absorber above the substrate. Best responsivity of up to 30 electrons per photon at a frequency of 350 GHz, or 72000 A/W, and voltage responsivity up to 3.9 × 109 V/W

• deposition plants with thermal or e-beam evaporation. A much more available and simple deposition equipment is magnetron sputtering, but it provides only isotropic deposition, which is incompatible with anisotropic shadow evaporation. The practical solution for a magnetron sputtering is selective etching of

• different layers of superconducting aluminum and normal metal (e.g., copper). In case of chemical wet etching, this is achieved through an alkali and acid pair, for dry etching, chlorine and fluorine plasmas are used. Alternatively, in the case of magnetron sputtering and separate lithography, ion etching

Low-temperature AFM with a microwave cavity optomechanical transducer

• Ermes Scarano,
• Elisabet K. Arvidsson,
• August K. Roos,
• Erik Holmgren,
• Riccardo Borgani,
• Mats O. Tholén and
• David B. Haviland

Beilstein J. Nanotechnol. 2025, 16, 1873–1882, doi:10.3762/bjnano.16.130

• . Figure 5d–f shows the effect of the measurement bandwidth on a single scan line. Finally, we tested the lateral resolution of our microscope by imaging a less trivial structure. We fabricated a second test sample by etching a pattern from the top Ti layer of a Ti(10 nm)/Au(5 nm)/Ti(5 nm) film deposited

Ambient pressure XPS at MAX IV

• Mattia Scardamaglia,
• Ulrike Küst,
• Alexander Klyushin,
• Rosemary Jones,
• Jan Knudsen,
• Robert Temperton,
• Andrey Shavorskiy and
• Esko Kokkonen

Beilstein J. Nanotechnol. 2025, 16, 1677–1694, doi:10.3762/bjnano.16.118

• oxidation to CuO due to limited oxygen availability, as the reaction occurs beneath the surface. This is significant because it offers a method to stabilize the Cu2O phase at high temperatures, preventing its conversion to CuO. As the temperature increases further, CuO formation and graphene etching occur

Nanotechnology-based approaches for the removal of microplastics from wastewater: a comprehensive review

• Nayanathara O Sanjeev,
• Manjunath Singanodi Vallabha and
• Rebekah Rubidha Lisha Rabi

Beilstein J. Nanotechnol. 2025, 16, 1607–1632, doi:10.3762/bjnano.16.114

• explored for applications such as water treatment and purification [114]. Yang et al. [120] introduced for the first time a membrane with an enhanced water permeability. This membrane was obtained by selectively etching Co3O4 nanoparticles embedded within Ti3C2Tx nanosheets, followed by vacuum filtration

Transient electronics for sustainability: Emerging technologies and future directions

• Jae-Young Bae,
• Myung-Kyun Choi and
• Seung-Kyun Kang

Beilstein J. Nanotechnol. 2025, 16, 1545–1556, doi:10.3762/bjnano.16.109

• protective PI layer is extremely thin, it can be selectively removed by reactive ion etching, ultimately leaving only the biodegradable materials on the target surface. To simplify multistep fabrication processes, wafer-scale transfer methods have also been developed [74]. These involve fabricating

• electronic devices on a large-area substrate, such as a silicon wafer, followed by backside etching to remove the handle or box layers, thereby isolating the functional thin film for transfer onto a biodegradable substrate. This wafer-level technique offers a promising route to large-area, high-resolution

Cross-reactivities in conjugation reactions involving iron oxide nanoparticles

• Shoronia N. Cross,
• Katalin V. Korpany,
• Hanine Zakaria and
• Amy Szuchmacher Blum

Beilstein J. Nanotechnol. 2025, 16, 1504–1521, doi:10.3762/bjnano.16.106

• 3,4-DHBA quinones, and/or EDC/NHS coupling to 3,4-DHBA. The etching of surface Fe in the EDC-free control reaction also adds another layer of complexity to the use of CySH as a small molecule linker on IONPs. Use of disulfide reducing agents: dithiothreitol As an alternative route to thiol

Laser processing in liquids: insights into nanocolloid generation and thin film integration for energy, photonic, and sensing applications

• Akshana Parameswaran Sreekala,
• Pooja Raveendran Nair,
• Jithin Kundalam Kadavath,
• Bindu Krishnan,
• David Avellaneda Avellaneda,
• M. R. Anantharaman and
• Sadasivan Shaji

Beilstein J. Nanotechnol. 2025, 16, 1428–1498, doi:10.3762/bjnano.16.104

Parylene-coated platinum nanowire electrodes for biomolecular sensing applications

• Chao Liu,
• Peker Milas,
• Michael G. Spencer and
• Birol Ozturk

Beilstein J. Nanotechnol. 2025, 16, 1392–1400, doi:10.3762/bjnano.16.101

• of the tungsten rod was immersed in the NaOH solution while applying 20 V DC to the rod and a counter electrode was also present in the NaOH solution [30]. The immersion depth of the tungsten rod in the solution was adjusted until an etching current of 0.15 A is achieved. Etching continued until the

Deep-learning recognition and tracking of individual nanotubes in low-contrast microscopy videos

• Vladimir Pimonov,
• Said Tahir and
• Vincent Jourdain

Beilstein J. Nanotechnol. 2025, 16, 1316–1324, doi:10.3762/bjnano.16.96

• growth kinetics, revealing complex behaviors such as intermittent switching between growth, pause, and etching modes, even under nominally constant synthesis conditions [20]. These observations, further supported by complementary Raman spectroscopy, served as a foundation for the development of a new

• situ imaging platforms for nanomaterials, such as environmental transmission electron microscopy (ETEM) of CNTs [31][33] and environmental scanning electron microscopy (ESEM) of graphene growth and etching processes [34]. Snapshots from (a) the raw video of carbon nanotube (CNT) synthesis on a stable

• recognition system, respectively. Panels (c) and (d) depict nanotubes grown with a pause between two growth stages, and between growth and etching, respectively. Different colors indicate segments with distinct growth rates. Data points represent measured values, while solid lines show linear fits for each

Wavelength-dependent correlation of LIPSS periodicity and laser penetration depth in stainless steel

• Nitin Chaudhary,
• Chavan Akash Naik,
• Shilpa Mangalassery,
• Jai Prakash Gautam and
• Sri Ram Gopal Naraharisetty

Beilstein J. Nanotechnol. 2025, 16, 1302–1315, doi:10.3762/bjnano.16.95

• best ladder-like structures over a large area. The size of the sample that one can make is limited by the scanning range of the three axis stages. Electrolytic etching The cross-sectional area of the laser-treated stainless steel samples underwent thorough polishing across their thickness using various

• grades of emery paper (3000, 4000, and 5000). Subsequently, alumina polishing was applied for 20 min to achieve a flawless mirror finish on the surface. A solution containing 10 g of oxalic acid in 100 mL of distilled water was employed for etching the stainless steel. An external etching process was

• conducted to examine the surface morphology of the samples and precisely measure the depth to which the laser heat affected or penetrated the zone. Imaging was performed using an FEI NOVA NANO SEM 450 scanning electron microscope. External etching was executed using a DC power supply machine, applying a

Characterization of ion track-etched conical nanopores in thermal and PECVD SiO₂ using small angle X-ray scattering

• Shankar Dutt,
• Rudradeep Chakraborty,
• Christian Notthoff,
• Pablo Mota-Santiago,
• Christina Trautmann and
• Patrick Kluth

Beilstein J. Nanotechnol. 2025, 16, 899–909, doi:10.3762/bjnano.16.68

• Helmholtzzentrum für Schwerionenforschung, Planckstr. 1, 64291 Darmstadt, Germany Technische Universtät Darmstadt, 64289 Darmtadt, Germany 10.3762/bjnano.16.68 Abstract Conical nanopores in amorphous SiO2 thin films fabricated using the ion track etching technique show promising potential for filtration, sensing

• nanopores in thermal and plasma-enhanced chemical vapor-deposited (PECVD) SiO2 using synchrotron-based small-angle X-ray scattering (SAXS). The nanopores were fabricated by irradiating the samples with 89 MeV, 185 MeV, and 1.6 GeV Au ions, followed by hydrofluoric acid etching. We present a new approach for

• differences between the nanopores in thermal and PECVD SiO2. The track-to-bulk etching rate ratio is significantly different for the two materials, producing nanopores with cone angles that differ by almost a factor of two. Furthermore, thermal SiO2 exhibits an exceptionally narrow size distribution of only 2

Heat-induced transformation of nickel-coated polycrystalline diamond film studied in situ by XPS and NEXAFS

• Olga V. Sedelnikova,
• Yuliya V. Fedoseeva,
• Dmitriy V. Gorodetskiy,
• Yuri N. Palyanov,
• Elena V. Shlyakhova,
• Eugene A. Maksimovskiy,
• Anna A. Makarova,
• Lyubov G. Bulusheva and
• Aleksandr V. Okotrub

Beilstein J. Nanotechnol. 2025, 16, 887–898, doi:10.3762/bjnano.16.67

• -coated (110) face after annealing discovered the vertical orientation of sp2-hybridized carbon layers relative to the diamond surface. The observed behavior suggests that sp2 carbon layers were formed on the diamond surface due to its saturation by released carbon atoms as a result of etching by nickel

• the diamond etching [35][36] and the graphitization of the diamond surface [19]. In particular, the (111) face was found to be resistant to etching, producing a thin layer of disordered graphite that was weakly bonded to the underlying diamond surface but strongly attached to the Ni particles. In

• ). In particular, on the rectangular (110) faces, nickel particles are flatter and more evenly distributed than those on the triangular (111) face. Previous studies showed that the etching of diamond through the reaction with Ni during annealing is an anisotropic process [19][35][36]. In particular, the

Morphology and properties of pyrite nanoparticles obtained by pulsed laser ablation in liquid and thin films for photodetection

• Akshana Parameswaran Sreekala,
• Bindu Krishnan,
• Rene Fabian Cienfuegos Pelaes,
• David Avellaneda Avellaneda,
• Josué Amílcar Aguilar-Martínez and
• Sadasivan Shaji

Beilstein J. Nanotechnol. 2025, 16, 785–805, doi:10.3762/bjnano.16.60

• all the samples, the peak position corresponding to the adventitious carbon value was fixed at 284.6 eV. A Shirley-type background baseline was used, and the Gaussian–Lorentzian sum function was applied for peak fitting. The high-resolution spectra of Fe 2p and S 2p after soft surface etching using

Focused ion and electron beams for synthesis and characterization of nanomaterials

• Aleksandra Szkudlarek

Beilstein J. Nanotechnol. 2025, 16, 613–616, doi:10.3762/bjnano.16.47

• Aleksandra Szkudlarek Academic Centre for Materials and Nanotechnology, AGH University of Krakow, av. Mickiewicza 30, 30-059, Krakow, Poland 10.3762/bjnano.16.47 Keywords: deposition; etching; focused electron beams; focused ion beams; lithography; milling; nanofabrication; 3D nanostructures; It

• scientific discovery; he also actively encouraged innovation by offering a $1,000 prize to anyone who could scale down a page of text from a book by a factor of 25,000. The prize remained unclaimed for 25 years until Tom Newman succeeded in etching the opening lines of Dickens’ A Tale of Two Cities – "It was

• etching or deposition. The precision and versatility of these beams, including the use of multiple gas species, open pathways to fabricate 3D nanomaterials that are unattainable through conventional chemical methods. However, achieving reproducibility in such structures requires a deep understanding of

Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex

• Chinmai Sai Jureddy,
• Krzysztof Maćkosz,
• Aleksandra Butrymowicz-Kubiak,
• Iwona B. Szymańska,
• Patrik Hoffmann and
• Ivo Utke

Beilstein J. Nanotechnol. 2025, 16, 530–539, doi:10.3762/bjnano.16.41

• energy converts to heat. The related local temperature increase, especially for high beam currents and fine focus may have contributed to an increase in the metal content in the above cited experiments. Fluorine is well known for its etching properties and can efficiently remove carbon. The presence of

• oxygen can form volatile species such as CO2, CO, or alcohols. For [Pd(hfac)2], the breakage of the C–F bond was observed, and this is the main process responsible for fluorine removal [49]. From an applicability standpoint, fluorine is less desirable because it can cause etching of other parts of the

Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring

• Joy Mukherjee,
• Safiul Alam Mollick,
• Tanmoy Basu and
• Tapobrata Som

Beilstein J. Nanotechnol. 2025, 16, 484–494, doi:10.3762/bjnano.16.37

• treatments such as nanopatterning, sputter etching, and controlled defect formation [6][7]. Particularly, ultralow-energy ion beams are exceptionally valuable for the precise modification of 2D layers [8] and ion-induced nanopatterning of semiconductor surfaces [9]. Over the past few decades, ion-induced

ReactorAFM/STM – dynamic reactions on surfaces at elevated temperature and atmospheric pressure

• Tycho Roorda,
• Hamed Achour,
• Matthijs A. van Spronsen,
• Marta E. Cañas-Ventura,
• Sander B. Roobol,
• Willem Onderwaater,
• Mirthe Bergman,
• Peter van der Tuijn,
• Gertjan van Baarle,
• Johan W. Bakker,
• Joost W. M. Frenken and
• Irene M. N. Groot

Beilstein J. Nanotechnol. 2025, 16, 397–406, doi:10.3762/bjnano.16.30

• serves as a protection against the high-pressure gases, as well as a shield from high piezovoltages. The scanner range can go up to 3.6 μm × 3.6 μm and does not have a coarse range in the x and y directions. Tip preparation Tips are fabricated by electrochemical etching of a 25 μm Pt/Ir wire immersed in

• a CaCl2 electrolytic solution (CaCl2 5 g, H2O 30 mL, acetone 2 mL). An alternating current (AC) voltage (50 Hz, 1–10 V) is applied between the tip and a gold ring electrode with the etching solution in suspension resulting in a sharp tip, which serves as the probe. In a second step, the etched Pt/Ir

Orientation-dependent photonic bandgaps in gold-dust weevil scales and their titania bioreplicates

• Norma Salvadores Farran,
• Limin Wang,
• Primoz Pirih and
• Bodo D. Wilts

Beilstein J. Nanotechnol. 2025, 16, 1–10, doi:10.3762/bjnano.16.1

• copolymers [10][11], lithography, or laser etching [12][13], but it can be routinely found in animal integuments. Biomimetic approaches using templates from natural structures offers a possible alternative. The scales of many beetles and weevils contain diamond photonic crystals [14][15][16] that may serve

• orientations, we obtained a uniform diffuse green scatterogram, confirming the mechanism producing the dull, unsaturated overall coloration found on the gold-dust weevil and several other weevils [19][21][28]. Subsequently, using plasma etching, we removed the scale cortex and made negative titania replicas of

• cortex is thinner (≈0.5 μm) and flat (Figure 2c). From the FIB-SEM cuts, we estimated the chitin fill fraction of the chitin network to be 0.44 ± 0.06. By adjusting the power and duration of the argon plasma etching, we were able to selectively etch the lower cortex of the scales (Figure 2d), revealing

Fabrication of hafnium-based nanoparticles and nanostructures using picosecond laser ablation

• Abhishek Das,
• Mangababu Akkanaboina,
• Jagannath Rathod,
• R. Sai Prasad Goud,
• Kanaka Ravi Kumar,
• Raghu C. Reddy,
• Ratheesh Ravendran,
• Katia Vutova,
• S. V. S. Nageswara Rao and
• Venugopal Rao Soma

Beilstein J. Nanotechnol. 2024, 15, 1639–1653, doi:10.3762/bjnano.15.129

• desired morphology is essential for a given application. Generally, practical techniques for obtaining nanomaterials are sol–gel method, chemical and physical vapour deposition, hydrothermal method, ball milling, grinding, lithography, etching, and laser ablation [14][15][16][17][18]. The morphology

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• routines combined with dimensionally limited wet and dry etching processes. The most advanced MEMS allow for movement in all six degrees of freedom (DOFs), while the simplest are defined in only one DOF [32]. The latter include so-called MEMS bridges formed as double-clamped beams [33], which have been

• (Si3N4) layer was deposited via CVD. The 40 nm thick platinum paths were then patterned by lift-off photolithography. The opMEMS bridge body was defined photolithographically with a feature size of 2 µm, etched by dry oxygen plasma etching (DRIE) and then released by KOH anisotropic wet silicon etching

• bridge and facilitate wet etching underneath, openings were made in the silicon nitride layer near the bases. The designed bridge contained three conductive measurement lines and two actuation lines (Figure 2c), with the measurement paths joined at the centre of the bridge. The RoI slit was formed using

Photocatalytic methane oxidation over a TiO₂/SiNWs p–n junction catalyst at room temperature

• Qui Thanh Hoai Ta,
• Luan Minh Nguyen,
• Ngoc Hoi Nguyen,
• Phan Khanh Thinh Nguyen and
• Dai Hai Nguyen

Beilstein J. Nanotechnol. 2024, 15, 1132–1141, doi:10.3762/bjnano.15.92

• ) [43][44]. As expected, the crystal orientation of the TiO2/SiNWs catalyst obviously led to the creation of a robust p–n junction photocatalyst. The SEM analysis further confirms the morphological evolution during etching and TiO2 ALD. As revealed in Supporting Information File 1, Figure S1, the

• provided from Sigma-Aldrich. Deionized (DI) water was used for cleaning steps. Si NWs and TiO2/Si NWs preparation First, a small piece (1 × 2 cm2) was cut from a commercial p-type Si wafer and washed several times using DI water, ethanol, and acetone in a sonication bath. Etching solution containing AgNO3

• (0.1 M), HF (50 wt %) and H2O (2:1:2 vol %) was prepared and kept at 56 °C for 20 min. The clean Si substrate was rapidly immersed in the etching medium and etched by the Ag+ ions for 25 min to obtain 4 µm long SiNWs. Afterwards, remaining Ag on the Si surface was removed using HNO3 (63 wt %) for 10

Effect of wavelength and liquid on formation of Ag, Au, Ag/Au nanoparticles via picosecond laser ablation and SERS-based detection of DMMP

• Sree Satya Bharati Moram,
• Chandu Byram and
• Venugopal Rao Soma

Beilstein J. Nanotechnol. 2024, 15, 1054–1069, doi:10.3762/bjnano.15.86

• detection of DMMP (1.2 ppm V) in the vapor phase using Glass_Ag_Au NPs, 3D fractal microstructure substrates developed by corner lithography and anisotropic wet etching of silicon using the 785 nm as the Raman excitation. When UV excitation was utilized during the measurements, the Raman peak intensities

Recent progress on field-effect transistor-based biosensors: device perspective

• Billel Smaani,
• Fares Nafa,
• Mohamed Salah Benlatrech,
• Ismahan Mahdi,
• Hamza Akroum,
• Mohamed walid Azizi,
• Khaled Harrar and
• Sayan Kanungo

Beilstein J. Nanotechnol. 2024, 15, 977–994, doi:10.3762/bjnano.15.80

• -care diagnostic systems. This device was realized using a top-to-down approach with an anisotropic and cost-effective self-stop etching method [85][86]. A novel CMOS anisotropic technique was implemented for the etching process, combining classical optical and electron beam lithography with anisotropic

• wet etching via the tetramethylammonium hydroxide method. This structure offers anti-interference and strong capability, demonstrating inherent ambipolarity through CYFRA21-1 and pH sensing. The device proposed by Gao et al. [84] provides enhanced operational conditions compared to classical FET-based

• CMOS technology, combined with optical lithography and an anisotropic self-stop etching method [88][89]. The incorporated P- and N-type NWs showed complementary electrical responses upon prostate-specific antigen binding, providing a unique means of internal command for biosensing signal verification

Water-assisted purification during electron beam-induced deposition of platinum and gold

• Cristiano Glessi,
• Fabian A. Polman and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73

• microscope using commercially available components and chemicals, which paves the way for a broader application of direct etching-assisted FEBID to obtain pure metallic structures. Keywords: FEBID; gold; nanofabrication; platinum; purification; Introduction Focused electron beam-induced deposition (FEBID

• for both the deposition and etching (water) processes. The Au deposition precursor used is Au(acac)Me2, the Pt deposition precursor is MeCpPtMe3, and the etching precursor is MgSO4·7H2O. The GIS temperatures used were 24 °C for Au(acac)Me2 and MeCpPtMe3; for MgSO4·7H2O, the temperature varied between

• orientation) with a native silicon oxide layer. Samples of 1 × 1 cm2 were used, on to which an array of annular patterns was lithographically defined, by laser lithography and etching using an SF6–O2 dry-etch, to facilitate location of the deposition areas. The substrates were roughly cleaned in acetone and