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Search for "nanoarray" in Full Text gives 4 result(s) in Beilstein Journal of Nanotechnology.

Nickel nanoparticles supported on a covalent triazine framework as electrocatalyst for oxygen evolution reaction and oxygen reduction reactions

  • Secil Öztürk,
  • Yu-Xuan Xiao,
  • Dennis Dietrich,
  • Beatriz Giesen,
  • Juri Barthel,
  • Jie Ying,
  • Xiao-Yu Yang and
  • Christoph Janiak

Beilstein J. Nanotechnol. 2020, 11, 770–781, doi:10.3762/bjnano.11.62

Graphical Abstract
  • current density of 0.25 mA/cm2 at 1.70 V (vs RHE) [53][54]. The OER activity of Ni oxide and hydroxides in combination with carbon materials is ambiguous. NiO nanoparticles have an overpotential of 331 mV at 10 mA/cm2 (vs RHE) [55], which increases to 422 mV at 10 mA/cm2 (vs RHE) for a NiO nanoarray grown
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Published 11 May 2020

Properties of plasmonic arrays produced by pulsed-laser nanostructuring of thin Au films

  • Katarzyna Grochowska,
  • Katarzyna Siuzdak,
  • Peter A. Atanasov,
  • Carla Bittencourt,
  • Anna Dikovska,
  • Nikolay N. Nedyalkov and
  • Gerard Śliwiński

Beilstein J. Nanotechnol. 2014, 5, 2102–2112, doi:10.3762/bjnano.5.219

Graphical Abstract
  • (see distributions in Figure 5) [31]. The effect originates in the difference of surface coverage by the R6G dried film and by the Au nanoparticles. The latter is low and does not exceed 30%, while the dye film covers the entire nanoarray surface together with the inter-particle areas. In consequence
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Published 13 Nov 2014

High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

  • Jorge Trasobares,
  • François Vaurette,
  • Marc François,
  • Hans Romijn,
  • Jean-Louis Codron,
  • Dominique Vuillaume,
  • Didier Théron and
  • Nicolas Clément

Beilstein J. Nanotechnol. 2014, 5, 1918–1925, doi:10.3762/bjnano.5.202

Graphical Abstract
  • . By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray. Keywords: gold nanodot; gold nanoparticle
  • ; high-speed e-beam lithography; molecular electronics; nanoarray; self-assembled monolayers; XPS; Introduction Well-ordered arrays of nanoparticles are already showing exciting applications in nanotechnology, including materials science [1][2][3][4][5], electronics [6][7][8][9][10], biology [11][12][13
  • , fabrication of 1 cm2 nanoarray of 10 nm gold NPs with 100 nm pitch requires 4 days of e-beam writing [1]. To overcome this problem, several alternative techniques are proposed [2][16][17][18]. The diblock-copolymer approach that consists of two chemically different polymer chains (or blocks) joined by a
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Published 30 Oct 2014

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

  • Adrian Iovan,
  • Marco Fischer,
  • Roberto Lo Conte and
  • Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

Graphical Abstract
  • circuit device produced by using a colloidal nanoarray mask and three steps of photo-lithography for the bottom electrode, top electrode, and the resonator. Top panel shows the layout of the device, with the top electrode formed in the shape of a photon resonator for IR–terahertz, 10–50 µm diameters
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Published 19 Dec 2012
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