Porous polymer coatings as substrates for the formation of high-fidelity micropatterns by quill-like pens

• Michael Hirtz,
• Marcus Lyon,
• Wenqian Feng,
• Andrea E. Holmes,
• Harald Fuchs and
• Pavel A. Levkin

Beilstein J. Nanotechnol. 2013, 4, 377–384, doi:10.3762/bjnano.4.44

• with SPT pens (SPT-S-C10S, Bioforce Nanosciences). The SPTs were freshly plasma cleaned by oxygen plasma (10 sccm O2, 100 mTorr, 30 W for 2 min) prior to use. The SPT was mounted onto the tip holder by double-sided sticky tape, and the pen reservoir was filled with 1 µL of dye solution. The spotting

Polynomial force approximations and multifrequency atomic force microscopy

• Daniel Platz,
• Daniel Forchheimer,
• Erik A. Tholén and
• David B. Haviland

Beilstein J. Nanotechnol. 2013, 4, 352–360, doi:10.3762/bjnano.4.41

• polynomial force reconstruction will be a useful method for many scientists and that new data-representation schemes will inspire innovative analysis methods. Experimental The silicon oxide sample was cleaned in an oxygen plasma before measurements were perfomed in a Bruker Dimension 3100 AFM system. The

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• to cleaning ITO-coated PET foils were cut into proper pieces. Both types of substrates (SiO2 and ITO) were cleaned in oxygen plasma at p(O2) = 0.4 mbar, f = 40 kHz, and P = 100 W, first for 2 min and then for 4 min. In the case of Si/SiO2 substrates the initial SiO2 thickness was measured by

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• and the transport properties. Let us focus now on the electrical properties. Kim et al. [98] carried out mild oxygen plasma treatment on SWCNTs aligned between two electrodes. They found that the structural defect density on the sample surface increased linearly with the plasma treatment time. In

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

• Adrian Iovan,
• Marco Fischer,
• Roberto Lo Conte and
• Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

• monolayer is formed (Figure 2a), reactive oxygen plasma is used to reduce the size of the particles (Figure 2b). When the desired particle diameter is reached, a reinforcing layer of aluminium is deposited, as shown in Figure 2c, which in the later process stages acts as a hard mask. A lift-off of the

• nanoparticles by making the substrate hydrophilic with the help of RIE plasma oxygen. The equipment specifics are Oxford Plasmalab 100, with the capability for gases O2, Ar, CF4, CHF3, SF6, Cl2. Colloidal mask transfer: Oxygen plasma was tested for removal of the particles, without success. Chemical removal of

• hexagonal lattice. Illustration of the four steps in down-scaling of the particles of a polystyrene monolayer to the 10-nm range, which is to later serve as a nano-array mask. (a) Forming a self-assembled hexagonal-close-packed monolayer. (b) Reactive oxygen plasma with ICP is used to reduce the size of the

Tuning the properties of magnetic thin films by interaction with periodic nanostructures

• Ulf Wiedwald,
• Felix Haering,
• Stefan Nau,
• Carsten Schulze,
• Herbert Schletter,
• Denys Makarov,
• Alfred Plettl,
• Karsten Kuepper,
• Manfred Albrecht,
• Johannes Boneberg and
• Paul Ziemann

Beilstein J. Nanotechnol. 2012, 3, 831–842, doi:10.3762/bjnano.3.93

• below it turned out experimentally that a homogeneous monolayer free of large spare, double or multilayer subregions (a prerequisite for integral magnetic characterization) can be achieved best by dip coating. For this purpose, Si substrates were used after hydrophilization in oxygen plasma, resulting

• propagation are related to the nanostructure size and distance and in the simplest approximation not to the degree of hexagonal order. The homogeneous size reduction of close-packed monolayers was performed by isotropic oxygen plasma etching at a constant pressure of about 7 Pa and ambient temperature

• . Schematics of the sample preparation. Self-assembled, close-packed monolayers of PS spheres are deposited on a substrate. Isotropic oxygen-plasma etching results in the homogeneous size reduction of PS particles. Finally, a magnetic film is deposited onto the substrates and capped by a thin Pt layer for

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• removed after the adsorption step in order to permit the undisturbed growth of silicon NWs. Depending on the nature of the stabilizer as well as the monolayer, positive results have been reported by simple thermolysis [26] or treatment of the substrates with either hydrogen or oxygen plasma [27]. An

The morphology of silver nanoparticles prepared by enzyme-induced reduction

• Henrik Schneidewind,
• Thomas Schüler,
• Katharina K. Strelau,
• Karina Weber,
• Dana Cialla,
• Marco Diegel,
• Roland Mattheis,
• Andreas Berger,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2012, 3, 404–414, doi:10.3762/bjnano.3.47

• 10 min each) followed by drying under nitrogen. Next, the surface was activated in an oxygen plasma etching step. In order to bind linker molecules (amino modified DNA) onto the surface, the substrates were chemically modified with 10 mM (3-glycidyloxypropyl)trimethoxysilane (GOPS) in dried toluene

Analysis of fluid flow around a beating artificial cilium

• Mojca Vilfan,
• Gašper Kokot,
• Andrej Vilfan,
• Natan Osterman,
• Blaž Kavčič,
• Igor Poberaj and
• Dušan Babič

Beilstein J. Nanotechnol. 2012, 3, 163–171, doi:10.3762/bjnano.3.16

• deflectors (A.A. Opto-electronic, DTSXY-400-405) and a beam-steering controller (Aresis, d.o.o., BSC-160). After the photoresist was developed, the sample was ashed in post-glow oxygen plasma for 60 s and hard baked at 200 °C, leaving an SU-8 dot-array structure on nickel-covered glass. The slide was dipped

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• unprotected gold layer was removed by Argon ion beam etching. Finally, the entire process was completed with oxygen plasma cleaning. The fabrication process was described in detail previously [21][22][23][34]. Based on the concept of the crossed exposure of two gratings of lines in the resist layer, regularly

• patterned gold surfaces were produced. The gold surfaces were characterized by means of SEM and optical far-field transmission measurements (Lambda-950 Perkin Elmer). Sample preparation (DNA immobilization). The regularly patterned gold nanorhomb arrays were treated with oxygen plasma under gentle

Nanoscaled alloy formation from self-assembled elemental Co nanoparticles on top of Pt films

• Luyang Han,
• Ulf Wiedwald,
• Johannes Biskupek,
• Kai Fauth,
• Ute Kaiser and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 473–485, doi:10.3762/bjnano.2.51

• next step, the organic constituents are completely removed by exposure to oxygen plasma, while simultaneously the precursor material is nucleated into a metal or metal oxide NP, without losing the original hexagonal ordering. In case of oxide NPs, an additional treatment in hydrogen plasma finally

Platinum nanoparticles from size adjusted functional colloidal particles generated by a seeded emulsion polymerization process

• Nicolas Vogel,
• Ulrich Ziener,
• Achim Manzke,
• Alfred Plettl,
• Paul Ziemann,
• Johannes Biskupek,
• Clemens K. Weiss and
• Katharina Landfester

Beilstein J. Nanotechnol. 2011, 2, 459–472, doi:10.3762/bjnano.2.50

• -assembled monolayer of functional colloids is prepared on a solid substrate and subsequently treated by oxygen plasma processing in order to remove the organic constituents. This step, however, leads to a saturated state of a residual mix of materials. In order to determine parameters influencing this

• reduced by exposure to an isotropic oxygen plasma (see Experimental section). In this way, one arrives at a continuous and laterally homogeneous reduction of the particle diameters while the original particle positions are strictly preserved. The reduction rate of this etching process, imposed by the

• Experimental section) and cooling down in nitrogen gas-flow is needed to finally obtain well-defined crystalline Pt NPs. 2.1 Oxygen plasma exposure: Dependency of the saturation state on different parameters The plasma procedure was optimized and then performed by default according to the recipe described in

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

• Samer Darwich,
• Karine Mougin,
• Akshata Rao,
• Enrico Gnecco,
• Shrisudersan Jayaraman and
• Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

• being dip-coated, the polymer was removed by oxygen plasma treatment (see Figure 6). Self-assembled monolayer coated silicon wafer The molecular surfaces were prepared by self-assembling organosilane molecules onto silicon wafers Si(111) with a native thin oxide (SiO2) layer of ~1.5 nm. The organosilane

Preparation and characterization of supported magnetic nanoparticles prepared by reverse micelles

• Ulf Wiedwald,
• Luyang Han,
• Johannes Biskupek,
• Ute Kaiser and
• Paul Ziemann

Beilstein J. Nanotechnol. 2010, 1, 24–47, doi:10.3762/bjnano.1.5

• the substrates by exposure to oxygen plasma which etches the polymers and simultaneously forms metal-oxide NPs [39]. On subsequent hydrogen plasma treatment the formed NPs can be converted into their metallic state. This approach succeeded in the preparation of monatomic Au [40], Pt [41], Fe, Co NPs

• when the AFM tip points upwards during the dip-coating process. In order to enhance the material contrast in SEM investigations, oxygen plasma is used for particle nucleation and for the removal of the polymers. This procedure is discussed below in greater detail. 1.4 Plasma-assisted particle

• 250 °C or 300 °C for small or large micelles, respectively. This heating proved advantageous for the nucleation and growth process of the desired NPs. After an exposure time of typically 30 min, the oxygen plasma and heat treatment were stopped and the plasma chamber pumped down to its base pressure