Mechanical properties of sol–gel derived SiO₂ nanotubes

• Boris Polyakov,
• Mikk Antsov,
• Sergei Vlassov,
• Leonid M Dorogin,
• Mikk Vahtrus,
• Roberts Zabels,
• Sven Lange and
• Rünno Lõhmus

Beilstein J. Nanotechnol. 2014, 5, 1808–1814, doi:10.3762/bjnano.5.191

• structural peculiarities of the material itself. Silicon dioxide in the form of quartz as well as amorphous silica, is a compound with covalent bonds, which at room temperature is rather brittle and does not allow plastic deformation. In studies dedicated to the mechanical characterization of SiO2 NTs and

Biocompatibility of cerium dioxide and silicon dioxide nanoparticles with endothelial cells

• Claudia Strobel,
• Martin Förster and
• Ingrid Hilger

Beilstein J. Nanotechnol. 2014, 5, 1795–1807, doi:10.3762/bjnano.5.190

• Medicine and Allergy/Immunology, Jena University Hospital – Friedrich Schiller University Jena, Erlanger Allee 101, 07747 Jena, Germany 10.3762/bjnano.5.190 Abstract Cerium dioxide (CeO2) and silicon dioxide (SiO2) nanoparticles are of widespread use in modern life. This means that human beings are

• nanoparticles: 100 µg/mL; SiO2 nanoparticles: 10 µg/mL). Keywords: cerium dioxide; endothelial cells; nanoparticle; nanotoxicology; silicon dioxide; Introduction Nowadays, a large variety of nanoparticles are being produced for different applications. These include the industrially and environmentally highly

• relevant cerium dioxide (CeO2) and silicon dioxide (SiO2) nanoparticles. CeO2, a rare-earth lanthanide element oxide, is mainly used in slurries for silicon wafer planarization [1][2], as automotive fuel additives to improve the efficiency of combustion [3][4], and as automobile catalytic converters [5

The surface properties of nanoparticles determine the agglomeration state and the size of the particles under physiological conditions

• Christoph Bantz,
• Olga Koshkina,
• Thomas Lang,
• Hans-Joachim Galla,
• C. James Kirkpatrick,
• Roland H. Stauber and
• Michael Maskos

Beilstein J. Nanotechnol. 2014, 5, 1774–1786, doi:10.3762/bjnano.5.188

• scattering, MALLS), dynamic light scattering [48][49], or mass spectrometry (inductively coupled plasma mass spectrometry, ICP-MS) [50] can be applied. Silica and poly(organosiloxane) nanoparticles Although both silica and poly(organosiloxane) (POS) nanoparticles are based on silicon dioxide (SiO2) as

Review of nanostructured devices for thermoelectric applications

• Giovanni Pennelli

Beilstein J. Nanotechnol. 2014, 5, 1268–1284, doi:10.3762/bjnano.5.141

• type (n or p) and as doping concentration, by exploiting standard silicon doping processes. A 50–80 nm thick silicon dioxide (SiO2) top layer, to be used as a mask for the silicon etching, is grown by dry thermal oxidation. This top SiO2 layer is patterned by means of electron beam lithography through

• nm wide, is embedded in silicon dioxide. A calibrated BHF etching, which can be performed at the end of the oxidation process, allows for the tailoring of the silicon dioxide thickness around the nanowire silicon core. This top-down technique is very flexible and it can be used for the fabrication of

DNA origami deposition on native and passivated molybdenum disulfide substrates

• Xiaoning Zhang,
• Masudur Rahman,
• David Neff and
• Michael L. Norton

Beilstein J. Nanotechnol. 2014, 5, 501–506, doi:10.3762/bjnano.5.58

• the graphene flakes [11]. In contrast, several materials have been found that enable the deposition of DNA origami structures while maintaining their structural integrity. These materials include mica [12], silicon dioxide [13], gold [14], and graphene oxide [2]. The ideal substrate surface must be

Oriented attachment explains cobalt ferrite nanoparticle growth in bioinspired syntheses

• Annalena Wolff,
• Walid Hetaba,
• Marco Wißbrock,
• Stefan Löffler,
• Nadine Mill,
• Katrin Eckstädt,
• Axel Dreyer,
• Inga Ennen,
• Norbert Sewald,
• Peter Schattschneider and
• Andreas Hütten

Beilstein J. Nanotechnol. 2014, 5, 210–218, doi:10.3762/bjnano.5.23

• detail in our previous work [20]. The particles obtained between 1 minute and 20 minutes as well as between 1 day and 28 days were studied. 2 μL particle suspension was dropcast onto a silicon-dioxide-coated copper TEM-grid from Plano GmbH. Excess solution was removed with filter paper. The sample was

Preparation of electrochemically active silicon nanotubes in highly ordered arrays

• Tobias Grünzel,
• Young Joo Lee,
• Karsten Kuepper and
• Julien Bachmann

Beilstein J. Nanotechnol. 2013, 4, 655–664, doi:10.3762/bjnano.4.73

• electrochemical cycling. A Si electrode displaying a controlled porosity could circumvent the difficulty. In this perspective, we present a preparative method that yields ordered arrays of electrochemically competent silicon nanotubes. The method is based on the atomic layer deposition of silicon dioxide onto the

• thermal reduction of silicon dioxide to silicon by lithium vapor. The lithium oxide byproduct is removed subsequently. The reduction, performed under argon at 670 °C, is quantitative, homogeneous and well-behaved, in that the product contains neither remnants of silicon oxide nor any lithium silicide, as

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• = 3.8650 and k = 0.0200 for Si and n = 1.4650 and k = 0.0000 for silicon dioxide and the organic layer [25][26]. AFM measurements AFM measurements were conducted with a Digital Instruments NanoScope IIIa by using super sharp tips SSS-NCH-50 from Nanosensors with small tip diameters of approximately 2 nm

Grating-assisted coupling to nanophotonic circuits in microcrystalline diamond thin films

• Patrik Rath,
• Svetlana Khasminskaya,
• Christoph Nebel,
• Christoph Wild and
• Wolfram H.P. Pernice

Beilstein J. Nanotechnol. 2013, 4, 300–305, doi:10.3762/bjnano.4.33

• Materials, Tullastr. 72, 79108 Freiburg, Germany 10.3762/bjnano.4.33 Abstract Synthetic diamond films can be prepared on a waferscale by using chemical vapour deposition (CVD) on suitable substrates such as silicon or silicon dioxide. While such films find a wealth of applications in thermal management, in

• ) substrates we employ silicon dioxide as the lower buffer layer and air as the top cladding, to realize diamond-on-insulator (DOI) substrates [17][19]. Commercial, high-purity silicon wafers with atomically flat surfaces are thermally oxidized to a thickness of 2 μm. The resulting amorphous silica provides

Micro- and nanoscale electrical characterization of large-area graphene transferred to functional substrates

• Gabriele Fisichella,
• Salvatore Di Franco,
• Patrick Fiorenza,
• Raffaella Lo Nigro,
• Fabrizio Roccaforte,
• Cristina Tudisco,
• Guido G. Condorelli,
• Nicolò Piluso,
• Noemi Spartà,
• Stella Lo Verso,
• Corrado Accardi,
• Cristina Tringali,
• Sebastiano Ravesi and
• Filippo Giannazzo

Beilstein J. Nanotechnol. 2013, 4, 234–242, doi:10.3762/bjnano.4.24

• following. Graphene transfer onto silicon dioxide The graphene membrane was transferred from the Cu foil onto a Si wafer coated by 300 nm thick thermally grown SiO2. This oxide thickness was properly selected because it ensures the best optical contrast between bare SiO2 regions and regions coated by the

Controlled deposition and combing of DNA across lithographically defined patterns on silicon

• Zeinab Esmail Nazari and
• Leonid Gurevich

Beilstein J. Nanotechnol. 2013, 4, 72–76, doi:10.3762/bjnano.4.8

• this study, we combined gas-phase deposition and lithographic methods with a new variation of the combing technique in order to achieve high-quality alignments of DNA both on a flat silicon dioxide surface and across nanoelectrodes. The gas-phase deposition procedure together with choice of the buffer

Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications

• Yaron Paz

Beilstein J. Nanotechnol. 2011, 2, 845–861, doi:10.3762/bjnano.2.94

• groups/nm2 for H3Si(CH2)8SiH3. Unlike organosilane SAMs, whose tendency to form on TiO2 and SiO2 is quite similar, SAMs having phosphonic acid as their connecting head group are not formed on silicon dioxide but are formed easily from aqueous solutions on TiO2, Al2O3, Ta2O5 and Nb2O5 [27]. FTIR

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• further requirement which has to be fulfilled is the realization of large-scale production capacity for applications in (bio)analytics. One of the most common type of periodically patterned plasmonic arrays is based on the formation of a polystyrene or silicon dioxide bead mask during the production

• process, such as in nanosphere lithography (NSL) [15][16], film over nanospheres (FON) [17][18], and sculpted SERS substrates [19]. Here, the arrays are tunable by varying the size of the monodisperse polystyrene or silicon dioxide beads. Unfortunately, frequently occurring constructional defects within