Investigating organic multilayers by spectroscopic ellipsometry: specific and non-specific interactions of polyhistidine with NTA self-assembled monolayers

• Ilaria Solano,
• Pietro Parisse,
• Ornella Cavalleri,
• Federico Gramazio,
• Loredana Casalis and
• Maurizio Canepa

Beilstein J. Nanotechnol. 2016, 7, 544–553, doi:10.3762/bjnano.7.48

• .7.48 Abstract Background: A versatile strategy for protein–surface coupling in biochips exploits the affinity for polyhistidine of the nitrilotriacetic acid (NTA) group loaded with Ni(II). Methods based on optical reflectivity measurements such as spectroscopic ellipsometry (SE) allow for label-free

• properties, ellipsometry methods can be employed on a variety of reflecting solid surfaces. Spectroscopic ellipsometry (SE) can detect molecular adsorption on the receptor layer through the observation of thickness variations and, more specifically, through the spectroscopic characterization of UV–vis

• spectroscopic ellipsometry to investigate the interaction of His6 with gold surfaces functionalized with a thiolate, OEG SAM bearing the NTA end-group, a system which is of recognized relevance for the design of a whole class of bio-sensing devices. Indeed, ellipsometry was already employed to study related

Characterisation of thin films of graphene–surfactant composites produced through a novel semi-automated method

• Nik J. Walch,
• Alexei Nabok,
• Frank Davis and
• Séamus P. J. Higson

Beilstein J. Nanotechnol. 2016, 7, 209–219, doi:10.3762/bjnano.7.19

• LbL deposition of graphene(−)SDS alternated with polyethyleneimine (PEI). The optical study of graphene thin films deposited on different substrates was carried out using UV–vis absorption spectroscopy and spectroscopic ellipsometry. A particular focus was on studying graphene layers deposited on gold

• -by-layer (LbL) deposition. Films composed of these new graphene composite materials were then characterised using SEM, AFM, and spectroscopic ellipsometry. The study of SPR in gold films coated with graphene using total internal reflection ellipsometry was carried out for the first time. Experimental

• the above materials in deionised water. The mutlilayered films obtained were then characterised with scanning SEM combined with EDX (energy dispersing X-ray) elemental analysis (SEM NOVA) and AFM. Optical characterisation of thin graphene-surfactant films Spectroscopic ellipsometry study UV–vis

Combination of surface- and interference-enhanced Raman scattering by CuS nanocrystals on nanopatterned Au structures

• Alexander G. Milekhin,
• Nikolay A. Yeryukov,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Victor A. Gridchin,
• Evgeniya S. Sheremet and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 749–754, doi:10.3762/bjnano.6.77

• ][20]. Since these two parameters are crucial for the enhancement of the Raman scattering by the absorbing NC layer, we used spectroscopic ellipsometry to determine the precise value of the SiO2 layer thickness that gives the maximal IERS signal. The data on optical properties of CuS NC layer are also

• 0 to 570 nm) was prepared on a Si substrate in a wet chemical process by controlled dipping of a Si substrate covered by a homogeneous 600 nm thick SiO2 layer into HF solution in H2O (with bulk ratio 2:5) and served as IERS substrate. The thickness of the SiO2 layer was determined from spectroscopic

• ellipsometry measurements averaging over an area of about 1 mm. Periodic Au nanocluster arrays with a size of 10 × 10 µm2 were fabricated as reported previously [13] on Si and 75 nm thick SiO2 layers by direct electron beam writing (Raith-150, Germany) of a 130 nm spin-coated resist film (polymethyl

Self-assembled anchor layers/polysaccharide coatings on titanium surfaces: a study of functionalization and stability

• Ognen Pop-Georgievski,
• Dana Kubies,
• Josef Zemek,
• Neda Neykova,
• Roman Demianchuk,
• Eliška Mázl Chánová,
• Miroslav Šlouf,
• Milan Houska and
• František Rypáček

Beilstein J. Nanotechnol. 2015, 6, 617–631, doi:10.3762/bjnano.6.63

• immobilization, as well as the stability upon immersion under physiological-like conditions, are demonstrated by different surface sensitive techniques such as spectroscopic ellipsometry, infrared reflection–absorption spectroscopy and X-ray photoelectron spectroscopy. The changes in morphology and the

• ; neridronate; poly(dopamine); spectroscopic ellipsometry; surface characterization; surface modification; titanium; XPS; Introduction Titanium and titanium alloys are widely used in medicine and dentistry to replace and support hard tissues [1]. The absence of toxic alloying metals [1], extraordinary specific

• photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE) and infrared reflection–absorption spectroscopy (IRRAS). The changes in topography and the established continuity of the layers were revealed by scanning electron microscopy (SEM), stylus profilometry (SP) and atomic force microscopy (AFM). The

Entropy effects in the collective dynamic behavior of alkyl monolayers tethered to Si(111)

• Christian Godet

Beilstein J. Nanotechnol. 2015, 6, 583–594, doi:10.3762/bjnano.6.60

• thickness (spectroscopic ellipsometry, SE), molecular packing density and possible interface oxidation of the Si substrate (X-ray photoelectron spectroscopy). The surface density of acid groups (0.4 × 1014 cm−2) and the total organic layer (acid + alkyl) coverage (2.6 × 1014 cm−2) were obtained by XPS using

Synergic combination of the sol–gel method with dip coating for plasmonic devices

• Cristiana Figus,
• Maddalena Patrini,
• Francesco Floris,
• Lucia Fornasari,
• Paola Pellacani,
• Gerardo Marchesini,
• Andrea Valsesia,
• Flavia Artizzu,
• Daniela Marongiu,
• Michele Saba,
• Franco Marabelli,
• Andrea Mura,
• Giovanni Bongiovanni and
• Francesco Quochi

Beilstein J. Nanotechnol. 2015, 6, 500–507, doi:10.3762/bjnano.6.52

• fine-tuning of the silica layer thickness on the plasmonic structure were studied. Control of the silica coating thickness was achieved through a combined approach involving sol–gel and dip-coating techniques. The silica films were characterized using spectroscopic ellipsometry, contact angle

• uniformity were evaluated and spectroscopic ellipsometry (SE) was employed as the main characterization technique to evaluate the film thickness. The film thickness was monitored as a function of different processing parameters, namely, pH, aging time, EtOH dilution, and withdrawal speed. The sol–gel process

• substrate as a function of ethanol dilution of the initial sol (right). Refractive index, n, at 750 nm, evaluated by spectroscopic ellipsometry of silica layers deposited onto a glass substrate at a fixed withdrawal speed (50 mm/min) for different EtOH dilution (v/v = 1:0, 1:2, 1:4, 1:6). Tunable-thickness

Optical properties and electrical transport of thin films of terbium(III) bis(phthalocyanine) on cobalt

• Peter Robaschik,
• Pablo F. Siles,
• Daniel Bülz,
• Peter Richter,
• Manuel Monecke,
• Michael Fronk,
• Svetlana Klyatskaya,
• Daniel Grimm,
• Oliver G. Schmidt,
• Mario Ruben,
• Dietrich R. T. Zahn and
• Georgeta Salvan

Beilstein J. Nanotechnol. 2014, 5, 2070–2078, doi:10.3762/bjnano.5.215

• substrates were studied using variable angle spectroscopic ellipsometry (VASE) and current sensing atomic force microscopy (cs-AFM). Thin films of TbPc2 with a thickness between 18 nm and 87 nm were prepared by organic molecular beam deposition onto a cobalt layer grown by electron beam evaporation. The

• molecular orientation of the molecules on the metallic film was estimated from the analysis of the spectroscopic ellipsometry data. A detailed analysis of the AFM topography shows that the TbPc2 films consist of islands which increase in size with the thickness of the organic film. Furthermore, the cs-AFM

• molecular tilt angle and grain size distribution of the samples using spectroscopic ellipsometry, AC atomic force microscopy, and current sensing atomic force microscopy. Topographic and electrical AFM techniques provide a reliable method to investigate and correlate the structural and local electrical

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films

• Jörg Haeberle,
• Karsten Henkel,
• Hassan Gargouri,
• Franziska Naumann,
• Bernd Gruska,
• Michael Arens,
• Massimo Tallarida and
• Dieter Schmeißer

Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

• deposited at 200 °C, for the PE-ALD films we varied the substrate temperature range between room temperature (rt) and 200 °C. We show data from spectroscopic ellipsometry (thickness, refractive index, growth rate) over 4” wafers and correlate them to X-ray photoelectron spectroscopy (XPS) results. The 200

• index of the deposited layers were determined using a SENTECH SE 800 spectroscopic ellipsometry instrument (for details see experimental section). Figure 1 depicts the thickness distributions of the PE-ALD layers prepared at 200 °C, 80 °C and rt; for comparison a film produced at typical T-ALD

• influenced by charged species within the films. Carbon contamination (EDX, XPS, ellipsometry) In order to discuss the integration of carbon atoms into the films we conducted energy dispersive X-ray spectroscopy (EDX), XPS C1s core level spectroscopy, and spectroscopic ellipsometry. The chemical composition

Preparation of electrochemically active silicon nanotubes in highly ordered arrays

• Tobias Grünzel,
• Young Joo Lee,
• Karsten Kuepper and
• Julien Bachmann

Beilstein J. Nanotechnol. 2013, 4, 655–664, doi:10.3762/bjnano.4.73

• spectroscopic ellipsometry for thin silica films, and by nuclear magnetic resonance and X-ray photoelectron spectroscopy for nanoporous samples. After removal of the lithium oxide byproduct, the silicon nanotubes can be contacted electrically. In a lithium ion electrolyte, they then display the electrochemical

• qualitative observations can be complemented by quantitative data recorded by spectroscopic ellipsometry. This method analyzes light reflected at the various interfaces present in a thin film sample and enables the experimentalist to determine the layer thicknesses, based on a structural model of the system

• 181 °C should be an additional advantage, since it will likely provide faster vaporization kinetics. In fact, we observe that when the reaction of a SiO2 film is carried out at 670 °C with lithium instead of magnesium, the reduction is complete, as found by spectroscopic ellipsometry (Figure 4): over

Variations in the structure and reactivity of thioester functionalized self-assembled monolayers and their use for controlled surface modification

• Inbal Aped,
• Yacov Mazuz and
• Chaim N. Sukenik

Beilstein J. Nanotechnol. 2012, 3, 213–220, doi:10.3762/bjnano.3.24

• unless otherwise indicated. Contact angle goniometry, spectroscopic ellipsometry, XPS, ATR–FTIR, were all carried out as previously described [11][12]. Syntheses ω-Undecenylbromide was prepared as follows: In a round-bottom flask (500 mL) equipped with a magnetic stirring bar were placed CH2Cl2 (100 mL