Supporting Information
Additional details on the preparation of lamella for STEM and SAED experiments (Supporting Information File 1, Figure S1). The particle size analysis by Feret diameter method (Supporting Information File 1, Figure S2). The comparison of particle numbers versus particle diameters with respect to the different beam currents (Supporting Information File 1, Figure S3). The line profiles of AFM image (Supporting Information File 1, Figure S4). The AES results on Si(111) substrate before and after surface treatment by Ar+ sputtering (Supporting Information File 1, Figure S5). The Cartesian coordinates (Å) of optimized geometries and their respective Gibbs free energy (Eh) calculated at the PBE0/def2-TZVP level of theory (Supporting Information File 1, Table S1). Full table of calculated threshold values for potential reaction pathways leading to the observed cations and anions due to DI and DEA processes at the PBE0/def2-TZVP, DLPNO-CCSD(T)-SVP, and DLPNO-CCSD(T)-TZVP levels of theory (Supporting Information File 1, Table S2).
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