Correction: Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

  1. Aleksandra Szkudlarek1,2,
  2. Alfredo Rodrigues Vaz1,3,
  3. Yucheng Zhang4,
  4. Andrzej Rudkowski5,
  5. Czesław Kapusta5,
  6. Rolf Erni4,
  7. Stanislav Moshkalev3 and
  8. Ivo Utke1

1Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
2AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland
3Center for Semiconductor Components, State University of Campinas, 13083-870, Campinas, SP, Brazil

4Empa, Swiss Federal Laboratories for Materials Science and Technology, Electron Microscopy Center, Überlandstrasse 129, 8600 Dübendorf, Switzerland
5AGH University of Science and Technology, Faculty of Physics and Applied Computer Science, Department of Solid State Physics, al. A. Mickiewicza 30, 30-059 Krakow, Poland

  1. Corresponding author email

This article is part of the Thematic Series "Focused electron beam induced processing".

Guest Editor: M. Huth
Beilstein J. Nanotechnol. 2015, 6, 1935–1936. https://doi.org/10.3762/bjnano.6.196
Received 25 Aug 2015, Accepted 04 Sep 2015, Published 21 Sep 2015

Keywords: Cu(hfac)2; Cu nanocrystals; focused electron beam induced deposition (FEBID); post-growth annealing of Cu–C material

In Figure 8 of the original article, the scale of the ordinate was wrong. The correct figure looks as follows:

[2190-4286-6-196-1]

Figure 1: Figure 8 in the original article: Calculated resistivity from the resistance measurement of a Cu–C line during in situ post-growth heating with a hot plate (red dots) and cooling down (blue dots) inside the SEM chamber. The resistance did not change when opening the chamber. The top SEM images show the morphology changes of an adjacent FEBID line which was observed simultaneously during the in situ resistance measurement.

Article is part of the thematic issue

Michael Huth and Armin Gölzhäuser

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© 2015 Szkudlarek et al; licensee Beilstein-Institut.
This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (http://www.beilstein-journals.org/bjnano)

 
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