A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• hexafluoroacetylacetonate (hfac, C5H1F6O2) bound to the copper atom [9][10]. With these precursors, both planar structures and nanopillars were realized. These precursors led to metal contents between 11 atom % [9] and 25 atom % [10] for the as-deposited material. The deposited material from Cu(hfac)2 showed an insulating

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• medical applications because copper exhibits antibacterial and antifungal properties [28]. In FEBID experiments, the deposited Cu–C lines and squares, obtained from the fluorinated copper(II) β-diketonate [Cu(hfac)2], had an atomic ratio of approximately Cu/C/O/F = 10:64:25:1. In materials obtained using

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• -pixel distance. Dicobalt octacarbonyl [Co2(CO)8], bis(hexafluoroacetylacetonato)copper(II) [Cu(hfac)2, Cu(HC5O2F6)2] and dimethyl(acetylacetonato)gold(III) [Me2Au(acac), (CH3)2Au(C5H7O2)] were employed as precursors, with average fluxes of 4.1 × 1018, 2.9 × 1017 and 3.6 × 1017 molecules·s−1·cm−2

• . Values of about 1, 10, and 10 electrons per impinging precursor molecule, respectively, for Co2(CO)8, Cu(hfac)2 and Me2Au(acac), were inferred from the calculated electronic flux, which we supposed to be close to the electron-limited regime. The chamber pressure during FEBID experiments was maintained at

• percolated metallic film with much lower resistance. Conclusion We have used a vacuum-based post-growth annealing protocol for tuning the crystalline properties of FEBID materials produced under a low electron-beam density from non-noble metal, Co2(CO)8 and Cu(hfac)2, as well as noble metal, Me2Au(acac

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• %) with no deposit damage or void formation. In a Cu example, Miyazoe et al. [27] investigated H2–Ar microplasma effects on FEBID deposits created from Cu(hfac)2. Postgrowth purification resulted in an increase in Cu content from ≈12% to 27%, coupled with a volume decrease and an increase in surface

Correction: Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1935–1936, doi:10.3762/bjnano.6.196

• Technology, Electron Microscopy Center, Überlandstrasse 129, 8600 Dübendorf, Switzerland AGH University of Science and Technology, Faculty of Physics and Applied Computer Science, Department of Solid State Physics, al. A. Mickiewicza 30, 30-059 Krakow, Poland 10.3762/bjnano.6.196 Keywords: Cu(hfac)2; Cu

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• such as Pt(PF3)4 [13][14], MeCpPtMe3 [15], W(CO)6 [16][17], Cu(hfac)2 and Pd(hfac)2 [18], Co(CO)3NO [10] and Fe(CO)5 [19]. These processes, which are comprised of DEA, DI, ND, and dipolar dissociation (DD), cannot be distinguished in FEBID or surface experiments with high-energy PE beams, where the

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• electron microscope favored the formation of Cu nanocrystals within the carbonaceous matrix of freestanding rods and suppressed the formation on their surface. Electrical four-point measurements on FEBID lines from Cu(hfac)2 showed five orders of magnitude improvement in conductivity when being annealed

• conventionally and by laser-induced heating in the scanning electron microscope chamber. Keywords: Cu(hfac)2; Cu nanocrystals; focused electron beam induced deposition (FEBID); post-growth annealing of Cu–C material; Introduction Focused electron beam induced deposition (FEBID) is a direct maskless

• to obtain pure metal CVD films with the same resistivity as in a bulk material at deposition temperatures below 300 °C [35][36][37]. Recently, it was shown for condensed monolayers of Cu(hfac)2 (also Pt(hfac)2 and Pd(hfac)2) that electron-beam irradiation results in about 80 atom % of carbon content

UHV deposition and characterization of a mononuclear iron(III) β-diketonate complex on Au(111)

• Irene Cimatti,
• Silviya Ninova,
• Valeria Lanzilotto,
• Luigi Malavolti,
• Luca Rigamonti,
• Brunetto Cortigiani,
• Matteo Mannini,
• Elena Magnano,
• Federica Bondino,
• Federico Totti,
• Andrea Cornia and
• Roberta Sessoli

Beilstein J. Nanotechnol. 2014, 5, 2139–2148, doi:10.3762/bjnano.5.223

• for Cu(hfac)2, adsorbed onto the TiO2(110) substrate [17], while multilayers of Pd(hfac)2 can be obtained by cooling Cu surfaces at 120 K [18]. As shown in Figure 2 (top panel), the spectrum corresponding to the saturation coverage (t7) still displays some features related to the gold substrate; in

• contrary, Cu(hfac)2 adsorbs on SiO2 without fragmentation, thus making reduction to Cu metal less favoured [27]. In the case of Cr(dbm)3, dbm− = dibenzoylmethanide, the STM investigation revealed bi-lobed features associated with free dbm–, suggesting that the molecule dissociatively interacts with the Cu