Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• [1][2][3]. However, they also play an important role in nanotechnology. In fact, a number of organometallic complexes, originally designed for chemical vapor deposition (CVD) purposes, have also been recognized as promising precursors for focused electron beam induced deposition (FEBID), a process to

Vapor-based polymers: from films to nanostructures

• Meike Koenig and
• Joerg Lahann

Beilstein J. Nanotechnol. 2017, 8, 2219–2220, doi:10.3762/bjnano.8.221

• using techniques such as plasma-, initiated-, or oxidative chemical vapor deposition polymerization [4][5]. The reason for the ongoing interest in this research field is that, analogue to the deposition of inorganic coatings by chemical vapor deposition, the deposition of polymer coatings from the vapor

• chemical vapor deposition [13]. A variation of the process parameters influences the quality of the deposited film as the oligomer content or the oxidation state. Another example of polymers with low solubility are fluoropolymers. Christian and Coclite investigated the deposition of fluoroacrylate polymer

• thin films via initiated chemical vapor deposition and the impact of crosslinking on the mechanical and chemical stability [14]. Vapor-based techniques can also be used to create chemically or topographically structured coatings on various substrates, which is of interest for example in the development

A systematic study of the controlled generation of crystalline iron oxide nanoparticles on graphene using a chemical etching process

• Peter Krauß,
• Jörg Engstler and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 2017–2025, doi:10.3762/bjnano.8.202

• Peter Krauss Jorg Engstler Jorg J. Schneider Fachbereich Chemie, Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss Str. 12, 64287 Darmstadt, Germany 10.3762/bjnano.8.202 Abstract Chemical vapor deposition (CVD) of carbon precursors

• on graphene are active in the catalytic growth of carbon nanotubes when employing a water-assisted CVD process. Keywords: carbon nanotubes; chemical vapor deposition; graphene; iron oxide; nanoparticles; Introduction Graphene was first described by Boehm and coworkers in the early 1960s [1][2][3][4

• -down and bottom-up approaches to synthesize and isolate graphene, each having their own advantages and disadvantages [5][6][7][8][9][10][11][12]. The most common route to synthesize continuous, large-area graphene is chemical vapor deposition (CVD) using a carbon precursor on a planar metal catalyst

Bi-layer sandwich film for antibacterial catheters

• Gerhard Franz,
• Florian Schamberger,
• Hamideh Heidari Zare,
• Sara Felicitas Bröskamp and
• Dieter Jocham

Beilstein J. Nanotechnol. 2017, 8, 1982–2001, doi:10.3762/bjnano.8.199

• electrolessly deposited applying Tollens’ reagens, the cap layer is deposited by using chemical vapor deposition. Conclusion: The three main problems of this process, electroless deposition of a fragmented silver film on the surface of an electrically insulating organic polymer, irreproducible evaporation

• , irrespective of whether the catheter is utilized as urethral balloon catheter or as ureteral stent. Due to the high aspect ratio of the catheters (20 to 30 cm in length at with a small lumen of maximal 1 or 3 mm), the only technique to achieve a double-sided coating is chemical vapor deposition (CVD). A

• coating, because it forms the very stable complex [Ag(NH3)2]+, which dissolves a possible precipitate of AgCl [19]. 3. Among the various deposition techniques, chemical vapor deposition (CVD) is known for its outstanding conformal coatings, in particular on three-dimensional substrates. Because the

Growth and characterization of textured well-faceted ZnO on planar Si(100), planar Si(111), and textured Si(100) substrates for solar cell applications

• Chin-Yi Tsai,
• Jyong-Di Lai,
• Shih-Wei Feng,
• Chien-Jung Huang,
• Chien-Hsun Chen,
• Fann-Wei Yang,
• Hsiang-Chen Wang and
• Li-Wei Tu

Beilstein J. Nanotechnol. 2017, 8, 1939–1945, doi:10.3762/bjnano.8.194

• and Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C 10.3762/bjnano.8.194 Abstract In this work, textured, well-faceted ZnO materials grown on planar Si(100), planar Si(111), and textured Si(100) substrates by low-pressure chemical vapor deposition

• replacement for the metal contact in semiconductor devices. When applied to solar cells, it can eliminate the optical shading effect induced by the conventional metal contact thereby effectively increasing solar cell photocurrent and efficiency. Granular ZnO thin films grown by low pressure chemical vapor

• deposition (LPCVD) can act as good TCOs for thin film silicon solar cells [1][2][3][4][5][6][7][8][9][10]. This is mainly due to its high transparency over the visible and near-infrared (NIR) wavelength range, lower electrical resistivity (down to 1 × 10−3 Ω·cm), and the light-trapping capability due to its

Fabrication of carbon nanospheres by the pyrolysis of polyacrylonitrile–poly(methyl methacrylate) core–shell composite nanoparticles

• Dafu Wei,
• Youwei Zhang and
• Jinping Fu

Beilstein J. Nanotechnol. 2017, 8, 1897–1908, doi:10.3762/bjnano.8.190

• batteries [3][4][5], fuel cells [6][7], supercapacitors [8][9], catalysis carriers [10][11], drug delivery [12][13] and adsorption [14][15]. Various techniques, including arc discharge [16], laser ablation [17], chemical vapor deposition [18], and solvothermal method [19], have been developed for the

Fluorination of vertically aligned carbon nanotubes: from CF₄ plasma chemistry to surface functionalization

• Claudia Struzzi,
• Mattia Scardamaglia,
• Jean-François Colomer,
• Alberto Verdini,
• Luca Floreano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2017, 8, 1723–1733, doi:10.3762/bjnano.8.173

• vapor deposition (CCVD) at atmospheric pressure. The catalysts are prepared by magnetron sputtering: a 30 nm Al2O3 buffer layer is deposited on Si wafers with native SiO2 and a 6 nm Fe layer is then deposited to form nanoparticles which catalyse the vCNT growth. Then, the substrate is placed inside the

• function of the fluorine content and ageing effects are evaluated after storing the samples for two weeks under ambient conditions: a limited loss of fluorine functionalities is observed for most of the samples. Experimental Vertically aligned carbon nanotubes (vCNT) are produced by catalytic chemical

Effect of the fluorination technique on the surface-fluorination patterning of double-walled carbon nanotubes

• Lyubov G. Bulusheva,
• Yuliya V. Fedoseeva,
• Emmanuel Flahaut,
• Jérémy Rio,
• Christopher P. Ewels,
• Victor O. Koroteev,
• Gregory Van Lier,
• Denis V. Vyalikh and
• Alexander V. Okotrub

Beilstein J. Nanotechnol. 2017, 8, 1688–1698, doi:10.3762/bjnano.8.169

• by catalytic chemical vapor deposition (CCVD) using CH4 (18 mol %) in H2 at 1000 °C and an Mg1−xCoxO solid solution as catalyst [23]. High-resolution transmission electron microscopy (HRTEM) showed that a typical sample consists of ca. 80% DWCNTs, 20% SWCNTs, and a few triple-walled nanotubes. The

Process-specific mechanisms of vertically oriented graphene growth in plasmas

• Subrata Ghosh,
• Shyamal R. Polaki,
• Niranjan Kumar,
• Sankarakumar Amirthapandian,
• Mohamed Kamruddin and
• Kostya (Ken) Ostrikov

Beilstein J. Nanotechnol. 2017, 8, 1658–1670, doi:10.3762/bjnano.8.166

• growth. Plasma-enhanced chemical vapor deposition (PECVD) is one of the most suitable techniques for the transfer-free and catalyst-free growth of VGNs at low temperature [15][16][17][18][19][20]. Various research groups reported the growth mechanism of VGNs during PECVD [21][22][23][24]. In brief, the

• improved the crystallinity and resulted in lower resistivity. Conclusion In summary, plasma-enhanced chemical vapor deposition (PECVD) was employed to conduct a series of controlled growth experiments. The experimental results specify the effects of the growth temperature, plasma power and distance from

Surface functionalization of 3D-printed plastics via initiated chemical vapor deposition

• Christine Cheng and
• Malancha Gupta

Beilstein J. Nanotechnol. 2017, 8, 1629–1636, doi:10.3762/bjnano.8.162

• studied the ability of the initiated chemical vapor deposition (iCVD) process to coat 3D-printed shapes composed of poly(lactic acid) and acrylonitrile butadiene styrene. The thermally insulating properties of 3D-printed plastics pose a challenge to the iCVD process due to large thermal gradients along

• microfluidics. Keywords: 3D printing; chemical vapor deposition; coatings; functional polymers; surface modification; Introduction Three-dimensional printing (3DP) is a useful fabrication technique that offers rapid and low-cost prototyping, high levels of design complexity, and resolution on the micron scale

• SLA-printed objects and wastes unused initiator embedded within the bulk structure. The breadth of materials and feature sizes of 3D-printed objects presents a challenge to finding a universal method for surface functionalization. Initiated chemical vapor deposition (iCVD) is a technique that can be

Parylene C as a versatile dielectric material for organic field-effect transistors

• Tomasz Marszalek,
• Maciej Gazicki-Lipman and
• Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

• under the commercial name of parylenes, is unique in many ways. It is a synthetic path for polymer formation, at the same time it belongs to the category of chemical vapor deposition (CVD) and, as such, it yields products in a form of conformal solid films depositing at any surface exposed. As a CVD

Adsorption and electronic properties of pentacene on thin dielectric decoupling layers

• Sebastian Koslowski,
• Daniel Rosenblatt,
• Alexander Kabakchiev,
• Klaus Kuhnke,
• Klaus Kern and
• Uta Schlickum

Beilstein J. Nanotechnol. 2017, 8, 1388–1395, doi:10.3762/bjnano.8.140

• at 1073 K for 5 min. A h-BN layer was grown by chemical vapor deposition (CVD) by heating the Rh(111) sample to 1073 K and exposing it to 110 L of borazine ((HBNH)3) gas. h-BN grows in a self-terminating growth process [22] on the (111) surface of the crystal. The KCl layers on various metal surfaces

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• technologies for vapor-based coatings largely depend on adaptation from these lithographical approaches (Figure 1). A DNA array was fabricated in a photolithographical liftoff process on a vapor-deposited (chemical vapor deposition, CVD) poly-p-xylylene surface, and the resulting array surface showed excellent

Oxidative chemical vapor deposition of polyaniline thin films

• Yuriy Y. Smolin,
• Masoud Soroush and
• Kenneth K. S. Lau

Beilstein J. Nanotechnol. 2017, 8, 1266–1276, doi:10.3762/bjnano.8.128

• Yuriy Y. Smolin Masoud Soroush Kenneth K. S. Lau Department of Chemical and Biological Engineering, Drexel University, Philadelphia, PA 19104, USA 10.3762/bjnano.8.128 Abstract Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony

• can be used for depositing PANI and for effectively controlling the chemical state of PANI. Keywords: conducting polymers; emeraldine oxidation state; oxidative chemical vapor deposition; polyaniline; thin film processing; Introduction Conducting polymers (CPs) have attracted considerable attention

• solvent-based methods becomes considerably more challenging due to the lack of solubility in common commercial solvents, which limits processability and leads to poor wettability. These challenges can be overcome with oxidative chemical vapor deposition (oCVD). oCVD is a single step, solvent-free

Nanotopographical control of surfaces using chemical vapor deposition processes

• Meike Koenig and
• Joerg Lahann

Beilstein J. Nanotechnol. 2017, 8, 1250–1256, doi:10.3762/bjnano.8.126

• deposition of poly(p-xylylenes) (PPX), as well as plasma-enhanced chemical vapor deposition polymerization, both of which offer many advantages over solution-based deposition methods [4]. Since no solvents are involved, no wetting problems or problems with solvent residues arise, which can potentially

• feed. Trujillo et al. produced polymeric nanostructures using colloidal lithography [12]. In this technique, two-dimensional self-assembled monolayer (SAM) arrays of colloidal nanoparticles serve as lithographic templates for “nanobowl” patterns in an initiated chemical vapor deposition (iCVD) process

Preparation of thick silica coatings on carbon fibers with fine-structured silica nanotubes induced by a self-assembly process

• Benjamin Baumgärtner,
• Hendrik Möller,
• Thomas Neumann and
• Dirk Volkmer

Beilstein J. Nanotechnol. 2017, 8, 1145–1155, doi:10.3762/bjnano.8.116

• study is the deposition of nanostructured silica onto the surface of carbon fibers. Among other techniques of covering the carbon fiber surface with a silicon dioxide layer (or other ceramic coatings), the most common ones are chemical vapor deposition (CVD) [4], liquid phase impregnation [5] and sol

• deposition of thick silica coatings onto carbon fibers in the micrometer range. In addition, the silica shell exhibits a fine-structure in the nanometer regime. Both features are not feasible by means of conventional coating procedures such as chemical vapor deposition. The hierarchically and nanostructured

The integration of graphene into microelectronic devices

• Guenther Ruhl,
• Sebastian Wittmann,
• Matthias Koenig and
• Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

• , epitaxy on silicon carbide or chemical vapor deposition (CVD) on catalytic metals [5]. Besides meeting the requirements of film quality and cost, the scalability to 200 or 300 mm wafer sizes is crucial for being suitable for industrial production. Currently, the highest-quality graphene synthesis method

Needs and challenges for assessing the environmental impacts of engineered nanomaterials (ENMs)

• Michelle Romero-Franco,
• Hilary A. Godwin,
• Muhammad Bilal and
• Yoram Cohen

Beilstein J. Nanotechnol. 2017, 8, 989–1014, doi:10.3762/bjnano.8.101

• assessment of carbon nanotubes (CNTs) reported by Eckelman et al. [38]. This latter study compared the environmental impacts (in freshwater) of chemical releases resulting from the manufacture (e.g., arc ablation, chemical vapor deposition (CVD), and high-pressure carbon monoxide (HiPco)) for a hypothetical

Vapor-phase-synthesized fluoroacrylate polymer thin films: thermal stability and structural properties

• Paul Christian and
• Anna Maria Coclite

Beilstein J. Nanotechnol. 2017, 8, 933–942, doi:10.3762/bjnano.8.95

• chemical vapor deposition (iCVD) were investigated. PFDA polymers are known for their interesting crystalline aggregation into a lamellar structure that induces super-hydrophobicity and oleophobicity. Nevertheless, when considering applications which involve chemical, mechanical and thermal stresses, it is

• surfaces based on perfluoroacrylates were previously prepared by initiated chemical vapor deposition (iCVD) [8]. The iCVD technique allows polymerization of the fluorinated monomers, while the chemical structure of the precursor(s) remains intact. Therefore, ultrathin (<100 nm) perfluoropolymers can be

• used without further purification. p-PFDA films with different degrees of cross-linking were prepared by initiated chemical vapor deposition (iCVD). The average thickness of the as-deposited polymer films was 350 ± 50 nm. Detailed information on the actual processing conditions are provided in

High photocatalytic activity of Fe₂O₃/TiO₂ nanocomposites prepared by photodeposition for degradation of 2,4-dichlorophenoxyacetic acid

• Shu Chin Lee,
• Hendrik O. Lintang and
• Leny Yuliati

Beilstein J. Nanotechnol. 2017, 8, 915–926, doi:10.3762/bjnano.8.93

• ], plasma enhanced-chemical vapor deposition (PE-CVD) and radio frequency (RF) sputtering approach [12], and plasma enhanced-chemical vapor deposition and atomic layer deposition (ALD) followed by thermal treatment [13]. Among these preparation methods, impregnation is a commonly used approach for the

Synthesis of coaxial nanotubes of polyaniline and poly(hydroxyethyl methacrylate) by oxidative/initiated chemical vapor deposition

• Alper Balkan,
• Efe Armagan and
• Gozde Ozaydin Ince

Beilstein J. Nanotechnol. 2017, 8, 872–882, doi:10.3762/bjnano.8.89

• .8.89 Abstract Vapor-phase synthesis techniques of polymeric nanostructures offer unique advantages over conventional, solution-based techniques because of their solventless nature. In this work, we report the fabrication of coaxial polymer nanotubes using two different chemical vapor deposition methods

• . The fabrication process involves the deposition of an outer layer of the conductive polyaniline (PANI) by oxidative chemical vapor deposition, followed by the deposition of the inner layer of poly(2-hydroxyethyl methacrylate) (pHEMA) hydrogel by initiated chemical vapor deposition. The vapor-phase

• continuously increase with relative humidity. Keywords: coaxial nanotubes; humidity sensors; initiated chemical vapor deposition; oxidative chemical vapor deposition; polyaniline; Introduction In recent years, with the advances in nanotechnology, the use of nanostructured materials has become widespread in

Relationships between chemical structure, mechanical properties and materials processing in nanopatterned organosilicate fins

• Gheorghe Stan,
• Richard S. Gates,
• Qichi Hu,
• Kevin Kjoller,
• Craig Prater,
• Kanwal Jit Singh,
• Ebony Mays and
• Sean W. King

Beilstein J. Nanotechnol. 2017, 8, 863–871, doi:10.3762/bjnano.8.88

• science [9][10][11][12]. Experimental Fabrication of nanoporous fins The nanoporous organosilicate fin structures examined in this study were fabricated using a previously described subtractive pitch quartering process [34][35]. Briefly, plasma-enhanced chemical vapor deposition (PECVD) was used to

Investigation of growth dynamics of carbon nanotubes

• Marianna V. Kharlamova

Beilstein J. Nanotechnol. 2017, 8, 826–856, doi:10.3762/bjnano.8.85

• developing the methods of their efficient synthesis. During last years, significant progress was made in this field. The arc-discharge, laser ablation and chemical vapor deposition (CVD) methods were optimized for the synthesis of SWCNTs in a high yield [5][6]. Synthesis parameters can be varied in a broad

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• sufficient to initiate carbon removal without inducing significant thermal drift and/or laser chemical vapor deposition (CVD). Laser pulses are delivered to the sample with an optical working distance of 9 mm using a multi-mode 100 µm diameter fiber optic cable housed within a stainless steel shaft with

• situation at elevated temperatures. MeCpPt(IV)Me3 was originally developed for use as a thermal chemical vapor deposition (CVD) precursor [75]; the thermal decomposition temperature on the order of 120 °C in the presence of H2 results in pure Pt films. Thus, with LAEBID we leverage the pulsed thermal energy

Vapor deposition routes to conformal polymer thin films

• Priya Moni,
• Ahmed Al-Obeidi and
• Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

• , USA 10.3762/bjnano.8.76 Abstract Vapor phase syntheses, including parylene chemical vapor deposition (CVD) and initiated CVD, enable the deposition of conformal polymer thin films to benefit a diverse array of applications. This short review for nanotechnologists, including those new to vapor

• coats the substrate geometry (Figure 1c) [1]. Several chemical vapor deposition (CVD) techniques result in highly conformal polymer films. For instance, emerging techniques such as molecular layer deposition (MLD) and oxidative CVD (oCVD) form conformal metalucone and step-growth polymer films [10][11