On the pathway of cellular uptake: new insight into the interaction between the cell membrane and very small nanoparticles

• Claudia Messerschmidt,
• Daniel Hofmann,
• Anja Kroeger,
• Katharina Landfester,
• Volker Mailänder and
• Ingo Lieberwirth

Beilstein J. Nanotechnol. 2016, 7, 1296–1311, doi:10.3762/bjnano.7.121

• content of approximately 0.1% and subsequently applied to a carbon coated TEM grid. Excess solution was blotted off and the sample was dried at ambient conditions. For automated analysis the TEM micrographs were processed using Gaussian blur filtering with 2 pixels radius, background subtraction

Photocurrent generation in carbon nanotube/cubic-phase HfO₂ nanoparticle hybrid nanocomposites

• Protima Rauwel,
• Augustinas Galeckas,
• Martin Salumaa,
• Frédérique Ducroquet and
• Erwan Rauwel

Beilstein J. Nanotechnol. 2016, 7, 1075–1085, doi:10.3762/bjnano.7.101

• Figure 2. The fine structure of the absorption spectrum in the UV–vis region revealed upon background subtraction and ×100-fold magnification is represented by the grey curve in Figure 2a. One can observe an apparent double feature in the absorption spectrum in the photon energy region 1.5–3.5 eV, where

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

• Kai Rückriem,
• Sarah Grotheer,
• Henning Vieker,
• Paul Penner,
• André Beyer,
• Armin Gölzhäuser and
• Petra Swiderek

Beilstein J. Nanotechnol. 2016, 7, 852–861, doi:10.3762/bjnano.7.77

• . Peak positions were calibrated using the Au 4f7/2 peak at 84.0 eV. CasaXPS was utilized to analyze the spectra, and a Shirley background subtraction procedure was employed. Electron irradiation Between the acquisitions of spectra the samples investigated by RAIRS were introduced in a dedicated UHV

Orientation of FePt nanoparticles on top of a-SiO₂/Si(001), MgO(001) and sapphire(0001): effect of thermal treatments and influence of substrate and particle size

• Martin Schilling,
• Paul Ziemann,
• Zaoli Zhang,
• Johannes Biskupek,
• Ute Kaiser and
• Ulf Wiedwald

Beilstein J. Nanotechnol. 2016, 7, 591–604, doi:10.3762/bjnano.7.52

• background subtraction using a reference pattern taken with a blanked electron beam, so that only features caused by the light emitted from the filament of the electron gun are visible on the RHEED fluorescent screen. Following the in situ investigations, ex situ atomic force microscopy (AFM) in tapping mode

Surface-enhanced Raman scattering by colloidal CdSe nanocrystal submonolayers fabricated by the Langmuir–Blodgett technique

• Alexander G. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Volodymyr M. Dzhagan,
• Ovidiu D. Gordan,
• Sergey L. Veber,
• Cameliu Himcinschi,
• Alexander V. Latyshev and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 2388–2395, doi:10.3762/bjnano.6.245

• background between 170 and 260 cm−1 and a weaker feature due to 2LO scattering near 414 cm−1. The intensity of the LO mode decreases by a factor of 20 in the orthogonal geometry (calculated after background subtraction). The background was fit by two Lorentzian curves centered at about 190 and 230 cm−1. The

Self-organization of gold nanoparticles on silanated surfaces

• Htet H. Kyaw,
• Salim H. Al-Harthi,
• Azzouz Sellai and
• Joydeep Dutta

Beilstein J. Nanotechnol. 2015, 6, 2345–2353, doi:10.3762/bjnano.6.242

• feature at 284.6 eV. XPS spectra were de-convoluted to individual components using Gaussian–Lorentzian function after background subtraction with Shirley function in Casa XPS software. The band structures of the samples (glass substrates, APTES-functionalized glass substrates and AuNPs deposited on APTES

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• Cu K edge (928 eV) and a signal energy window of 40 eV (920–960 eV) after background subtraction were used to map the composition distribution of Cu, see Figure S1 in Supporting Information File 1. The changes of resistance during the annealing were monitored by four-point probe measurements using an

Self-assembled anchor layers/polysaccharide coatings on titanium surfaces: a study of functionalization and stability

• Ognen Pop-Georgievski,
• Dana Kubies,
• Josef Zemek,
• Neda Neykova,
• Roman Demianchuk,
• Eliška Mázl Chánová,
• Miroslav Šlouf,
• Milan Houska and
• František Rypáček

Beilstein J. Nanotechnol. 2015, 6, 617–631, doi:10.3762/bjnano.6.63

• inelastic background subtraction. Assuming a simple model of a semi-infinite solid of homogeneous composition, the peak areas were corrected for the photoelectric cross-sections [63], the inelastic mean free paths of the electrons in question [64], and the transmission function of the spectrometer [65]. The

• experimental uncertainties in the quantitative analysis of XPS were assessed in separate experiments with several standard materials and were estimated to be below 7%. This value encompasses the overall uncertainties of the method that are typically introduced by the background subtraction. High resolution Ti

X-ray photoelectron spectroscopy of graphitic carbon nanomaterials doped with heteroatoms

• Toma Susi,
• Thomas Pichler and
• Paola Ayala

Beilstein J. Nanotechnol. 2015, 6, 177–192, doi:10.3762/bjnano.6.17

• nanomaterials (apart from thick multiwalled carbon nanotubes) XPS is in effect a bulk-probing technique. A careful subtraction of the secondary background is vital for a correct analysis of the primary spectrum. Although a number of different background models are in widespread use, a linear background

• subtraction and the formulations by Shirley [58] and Tougaard [59] are often used. For evaluating the concentration and the bonding of the dopants, the first sensible step is to focus on the carbon 1s response to evaluate contributions to the spectrum from synthesis byproducts or carbonaceous contaminants

Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions

• Yit Lung Khung,
• Siti Hawa Ngalim,
• Andrea Scaccabarozzi and
• Dario Narducci

Beilstein J. Nanotechnol. 2015, 6, 19–26, doi:10.3762/bjnano.6.3

• reactivity of the surface, an OH-terminated alkyne might react from both ends to the surface. Furthermore, by measuring the area under the peaks after a Shirley background subtraction and an automatically assigned Gaussian–Lorentzian fit with the XPS peaks software for both Si–O–C and the Si–C peaks, we

Nanocavity crossbar arrays for parallel electrochemical sensing on a chip

• Enno Kätelhön,
• Dirk Mayer,
• Marko Banzet,
• Andreas Offenhäusser and
• Bernhard Wolfrum

Beilstein J. Nanotechnol. 2014, 5, 1137–1143, doi:10.3762/bjnano.5.124

• next to each other (the yield of functional sensors is approximately 40%) are chosen and a potassium hexacyanoferrate crystal is added to the solution. The so obtained electrochemical image of its dissolution after background subtraction can be seen in Figure 4. The parallel readout of the crossbar

Uncertainties in forces extracted from non-contact atomic force microscopy measurements by fitting of long-range background forces

• Adam Sweetman and
• Andrew Stannard

Beilstein J. Nanotechnol. 2014, 5, 386–393, doi:10.3762/bjnano.5.45

• extrapolation method. Keywords: background subtraction; DFM; F(z); force; atomic resolution; NC-AFM; Si(111); STM; van der Waals; Introduction Non-contact atomic force microscopy (NC-AFM) is now the tool of choice for surface scientists wishing to investigate interatomic and intermolecular forces on surfaces

• ) measurements and no averaging of curves has been performed to improve the signal-to-noise ratio. In general, in order to perform long-range background subtraction, short-range curves are acquired and then aligned with a separate long-range curve before fitting, which can introduce additional uncertainties. In

Near-infrared dye loaded polymeric nanoparticles for cancer imaging and therapy and cellular response after laser-induced heating

• Tingjun Lei,
• Alicia Fernandez-Fernandez,
• Romila Manchanda,
• Yen-Chih Huang and
• Anthony J. McGoron

Beilstein J. Nanotechnol. 2014, 5, 313–322, doi:10.3762/bjnano.5.35

• after background subtraction). The ratio R was then determined by normalizing the total pixel intensity of this region of interest to its total area. HT treatment Two different heating modes, namely (1) an incubator and (2) a laser/NP HT delivery system, were used for in vitro studies. Detailed

Photoelectrochemical and Raman characterization of In₂O₃ mesoporous films sensitized by CdS nanoparticles

• Mikalai V. Malashchonak,
• Sergey K. Poznyak,
• Eugene A. Streltsov,
• Anatoly I. Kulak,
• Olga V. Korolik and
• Alexander V. Mazanik

Beilstein J. Nanotechnol. 2013, 4, 255–261, doi:10.3762/bjnano.4.27

• using 40 SILAR cycles of CdS deposition after background subtraction (circles) and its fitting by the superposition of five Lorentz lines. Dependence of the CdS LO phonon peak position (1) and FWHM (2) on the number of SILAR cycles. Photocurrent versus electrode-potential curves recorded under UV

Large-scale analysis of high-speed atomic force microscopy data sets using adaptive image processing

• Blake W. Erickson,
• Séverine Coquoz,
• Jonathan D. Adams,
• Daniel J. Burns and
• Georg E. Fantner

Beilstein J. Nanotechnol. 2012, 3, 747–758, doi:10.3762/bjnano.3.84

• order as the 2-D distortions. While 2-D operations are less prone to induce artifacts, performing a global 2-D polynomial fit and background subtraction leaves significant residual distortions (Figure 2G). These distortions can be avoided by using a thresholded flattening, instead of a global flattening

• vertical median correction on the masked data after the final background subtraction in Section 1.3 and before the final offset. This vertical median correction is exactly the same as Equation 9, but it runs in the perpendicular direction. This correction is only applicable to HS-AFM data that exhibits

• step, except the initial background subtraction, an improvement check on the masked region verifies that the step improved the image. The final offsets are determined and passed through to the next section. The vertical scale of all images and horizontal scales of all histograms are in nanometers. This

Modeling noncontact atomic force microscopy resolution on corrugated surfaces

• Kristen M. Burson,
• Mahito Yamamoto and
• William G. Cullen

Beilstein J. Nanotechnol. 2012, 3, 230–237, doi:10.3762/bjnano.3.26

• images are presented in raw form, with only a plane-fit background subtraction. Commercial software (SPIP) was used for the presentation of image data. AFM resolution examples: (a) high resolution UHV NC-AFM image of SiO2 displaying features with radius of curvature ~2.3 nm (Rtip nominally 2 nm, ∆f = −20

Extended X-ray absorption fine structure of bimetallic nanoparticles

• Carolin Antoniak

Beilstein J. Nanotechnol. 2011, 2, 237–251, doi:10.3762/bjnano.2.28

• method is described in more detail as well as wavelet transforms as a useful tool, which is rarely used for this application. Both methods first require a background subtraction from the experimental data, as already mentioned above (Equation 5). This is usually performed by using the AUTOBK algorithm