Level set simulation of focused ion beam sputtering of a multilayer substrate

• Alexander V. Rumyantsev,
• Nikolai I. Borgardt,
• Roman L. Volkov and
• Yuri A. Chaplygin

Beilstein J. Nanotechnol. 2024, 15, 733–742, doi:10.3762/bjnano.15.61

• multilayer films [8], the patterning of 2D materials [9], or the direct introduction of dopants into a solid-state host through recoil implantation [10]. Examples that rely on ion milling include patterning of magnetic multilayers [11], fabrication of optical metamaterials [12], and modification of

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• -mat are presented. Keywords: automated patterning; focused He ion beam; graphene; magnetic multilayers; mechanical resonator; pattern generation; plasmonic antennas; two-dimensional materials; Introduction Future breakthroughs in nanotechnology will rely on the ability to fabricate materials and

• selected to demonstrate the different capabilities of FIB-o-mat. These include high-level patterning with automation of magnetic multilayers, low-level patterning with automation of suspended graphene and low-level patterning and beam path optimization for gold on glass. Patterns for all three test cases