Search results
Search for "magnetron" in Full Text gives 135 result(s) in Beilstein Journal of Nanotechnology.
Chemical bath deposition of textured and compact zinc oxide thin films on vinyl-terminated polystyrene brushes
Beilstein J. Nanotechnol. 2016, 7, 102–110, doi:10.3762/bjnano.7.12
- emitting diodes, as surface acoustic wave generators or for field effect transistors [1][2][3][4][5][6][7][8]. Up to now, the fabrication of nanosized devices requires complex techniques like magnetron sputtering or pulsed laser deposition. Therefore, it is of high interest to develop easy-to-handle
Plasma fluorination of vertically aligned carbon nanotubes: functionalization and thermal stability
Beilstein J. Nanotechnol. 2015, 6, 2263–2271, doi:10.3762/bjnano.6.232
- performed using plasma treatment in a magnetron sputtering chamber with fluorine diluted in an argon atmosphere with an Ar/F2 ratio of 95:5. The effect of heavily diluted fluorine in the precursor gas mixture is investigated by evaluating the modifications in the nanotube structure and the electronic
- a fine selection of grafted species and tuning of electronic properties. Experimental vCNTs were produced by catalytic chemical vapor deposition (CCVD) at atmospheric pressure. The catalysts were prepared by magnetron sputtering; first, a 30 nm Al2O3 buffer layer was deposited on Si wafers with
- additional flow of hydrogen (120 sccm) was introduced. After 5 min, Ar was replaced by ethylene (C2H4) flow (50 sccm) for 20 min. After the growth, the oven atmosphere was again filled with Ar. Fluorination was performed by exposing the vCNTs samples to fluorine chemical species generated in a magnetron
Effect of SiNx diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol–gel dip coating and reactive magnetron sputtering
Beilstein J. Nanotechnol. 2015, 6, 2039–2045, doi:10.3762/bjnano.6.207
- diffraction decreased for the sol–gel coating, whereas it remained unchanged for the film made by the reactive sputtering method. According to Scherrer's equation [15], the crystallite size was estimated for the TiO2 sol–gel (SG-TiO2) coating and the magnetron sputtered TiO2 (MS-TiO2) grown on the glass and
- much thicker SiNx diffusion barrier [6]. This suggests that the crystallite size of the TiO2 films obtained by magnetron sputtering does not depend on the thickness of the SiNx. Furthermore, no difference has been observed between the crystallite size of the MS-TiO2 films grown on SLG or on SiNx/SLG
- from the reactive magnetron sputtering process show a preferential (004) orientation plane. Regardless of the process used to synthesize the TiO2 films, the intercalating SiNx diffusion barrier between the photocatalyst and the soda lime glass showed a beneficial effect on the photocatalytic efficiency
Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
Beilstein J. Nanotechnol. 2015, 6, 1805–1810, doi:10.3762/bjnano.6.184
- film, a gas mixture of Ar and O2 in the volumetric ratio of 80:20 was used. Background pressure was kept at 1.3 Pa during deposition. Radio frequency magnetron power of a sputtering gun was set to 50 W. A two inch-sized YSZ disk pellet with an 8 mol % Y2O3 was used as the target. For deposition of the
Magnetic properties of iron cluster/chromium matrix nanocomposites
Beilstein J. Nanotechnol. 2015, 6, 1158–1163, doi:10.3762/bjnano.6.117
- newly developed UHV cluster ion beam deposition apparatus, which is described elsewhere [2]. Fe clusters are produced in a Haberland-type magnetron sputtering/gas aggregation cluster source. Extracted anions are accelerated by electrostatic lenses and mass-separated in a 90° sector magnet. The mass
Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method
Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101
- were sputtered with a magnetron in vacuum with a 20 nm-thick cobalt film. This resulted in 3D magnetic nanostructures with unusual spin configurations that potentially can be used in magnetic sensing technologies, memory, logic and biomedical applications [20]. Moreover, the single-spot nanolithography
- authors acknowledge the support of the Russian Ministry of Education and Science under the state task 559 and Far Eastern Federal University. A.S. thanks Dr Maksim Stebliy for the magnetron sputtering of the magnetic film over PMMA patterns.
Characterization of nanostructured ZnO thin films deposited through vacuum evaporation
Beilstein J. Nanotechnol. 2015, 6, 971–975, doi:10.3762/bjnano.6.100
- ], and RF magnetron sputtering [10]. However, the vacuum evaporation technique is used to deposit worm-form nanostructured thin films. This technique is different from those reported in the literature such as thermal evaporation assisted by inert gases [11], or e-beam evaporation [12]. So this technique
Nanostructuring of GeTiO amorphous films by pulsed laser irradiation
Beilstein J. Nanotechnol. 2015, 6, 893–900, doi:10.3762/bjnano.6.92
- obtained by RF magnetron sputtering with 50:50 initial atomic ratio of Ge:TiO2. Laser irradiation was performed by using the fourth harmonic (266 nm) of a Nd:YAG laser. The laser-induced nanostructuring results in two effects, the first one is the appearance of a wave-like topography at the film surface
- GeTiO matrix. Experimental Amorphous GeTiO films with a thickness of 330 nm were deposited by RF magnetron sputtering on Si(100) wafer substrates using Ge:TiO2 with 50:50 atomic ratio. Details on the film deposition are found in [23]. These GeTiO amorphous films were irradiated with laser fluences from
- results from the RF magnetron sputtering films preparation. This shows that about 1/3 of the Ge content is lost from the surface layer affected by the laser radiation, and 2/3 of it can be segregated in amorphous Ge nanoparticles. Discussion The nanostructure formed at the GeTiO film surface by pulsed
Manipulation of magnetic vortex parameters in disk-on-disk nanostructures with various geometry
Beilstein J. Nanotechnol. 2015, 6, 697–703, doi:10.3762/bjnano.6.70
- diameters of 600 and 200 nm, respectively, were separated by a 3 nm thick Cu interlayer. The nanostructures were fabricated on naturally oxidized Si(111) substrates by means of electron-beam lithography, magnetron sputtering and standard lift-off process. Geometry and surface roughness were checked with
Influence of size, shape and core–shell interface on surface plasmon resonance in Ag and Ag@MgO nanoparticle films deposited on Si/SiOx
Beilstein J. Nanotechnol. 2015, 6, 404–413, doi:10.3762/bjnano.6.40
- detail [27][28]. The first chamber was equipped with a gas aggregation NP source, composed of a magnetron (NC200U, Oxford Applied Research) and a quadrupole mass filter (QMF). Ag NPs were deposited in vacuum or co-deposited with Mg atoms obtained by thermal evaporation in O2 atmosphere, with a similar
- magnetron discharge power P ≈ 35 W, and Ar flow value between 40 sccm and 60 sccm. In these conditions we could obtain Ag NP with a linear size distribution between 3 and 10 nm, as measured by the QMF and directly verified by the SEM and TEM images. The size distribution of the deposited particles was
Nanoporous Ge thin film production combining Ge sputtering and dopant implantation
Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32
- Discussion 340 nm thick Ge layers were deposited on the native oxide layer of a silicon substrate at room temperature (RT), under high vacuum, by magnetron sputtering. Recrystallization was then performed by rapid thermal annealing at 600 °C under vacuum (P ≈ 3 × 10−5 mbar) and the Ge layer was implanted
- on the native silicon oxide of a (001) silicon wafer by magnetron sputtering in a commercial set up with a deposition chamber exhibiting a base pressure of ≈10−8 mbar. The first thermal annealing executed after Ge deposition was performed in a commercial Jetfirst 600 Rapid Thermal Annealing furnace
Morphology, structural properties and reducibility of size-selected CeO2−x nanoparticle films
Beilstein J. Nanotechnol. 2015, 6, 60–67, doi:10.3762/bjnano.6.7
- , Parco Area delle Scienze 37/A - 43124 Parma, Italy 10.3762/bjnano.6.7 Abstract Non-stoichiometric ceria nanoparticles (NPs) were obtained by a gas aggregation source with a magnetron and were mass-selected with a quadrupole mass filter. By varying magnetron power, Ar gas flow, and the length of the
- : CeO2 ultra-thin films; ceria nanoparticles; magnetron sputtering; reduction and oxidation; size-dependent properties; size-selected nanoparticles; X-ray photoelectron spectroscopy; Introduction The main property of cerium oxide that attracts scientific attention is its ability to store and release
- magnetron sputtering, the technique used in this study. Tschöpe et al. [12] studied ceria NPs realized by magnetron sputtering from pure and mixed metal target and inert gas condensation, observing the high non-stoichiometry of these systems due to the particular synthesis method. The non-stoichiometry is
Si/Ge intermixing during Ge Stranski–Krastanov growth
Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246
- grown (see the sketch of the sample structure in Figure 2). The entire growth was performed without interruption. Sample preparation for APT was performed using a Helios NanoLab DualBeam Ga+ FIB from FEI. A 100 nm thick Ni film was deposited by magnetron sputtering on each sample for protection before
Silicon and germanium nanocrystals: properties and characterization
Beilstein J. Nanotechnol. 2014, 5, 1787–1794, doi:10.3762/bjnano.5.189
- Growth and characterization Much of current research on Si/Ge NCs is focused on the preparation and characterization of NCs embedded in a SiO2 matrix. In this paper, we have restricted our analysis to growth techniques, such as magnetron co-sputtering and ion implantation. With these techniques, it is
- MBE. From the experimental point of view, the synthesis of free-standing NCs will not be covered within this review. However, those issues are visited in Section III of this paper, which deals with the first principles modelling of the NCs. II.1 Magnetron co-sputtering This is basically a technique
- significantly decreases the thermal budget, when compared to other growth techniques. Moreover, it implies that PLD should be considered as an excellent alternative to the widely used magnetron co-sputtering technique for the deposition of complex oxide thin films and NCs. II.2 Ion implantation An ion beam
Formation of CuxAu1−x phases by cold homogenization of Au/Cu nanocrystalline thin films
Beilstein J. Nanotechnol. 2014, 5, 1491–1500, doi:10.3762/bjnano.5.162
- AuxCu1.5x solid solutions. Figure 9 shows bright field (top view) TEM images and selected area electron diffraction patterns of as deposited and heat treated (for 1 h at 160 °C) Au(10nm)/Cu(15nm) bilayers, respectively. For TEM investigations the specimens were prepared by subsequent magnetron sputtering on
- larger in Au (of the order of 10−11 m/s) than in Cu (of the order of 10−13 m/s). Experimental Au/Cu nanocrystalline thin films were prepared by DC magnetron sputtering onto (001)-oriented Si wafers with native SiO2 layer. The following bilayer samples were deposited: Au(25nm)/Cu(50nm), Au(25nm)/Cu(25nm
Microstructural and plasmonic modifications in Ag–TiO2 and Au–TiO2 nanocomposites through ion beam irradiation
Beilstein J. Nanotechnol. 2014, 5, 1419–1431, doi:10.3762/bjnano.5.154
- terms of growth in size of nanoparticles as well structural transformations in the host TiO2 matrix. Experimental Ag–TiO2 and Au–TiO2 nanocomposite thin films were prepared by co-sputtering from two different magnetron sources in a home-made vacuum deposition chamber. The host matrix (TiO2) and metal
- (Ag/Au) targets were co-sputtered by using two different magnetron sources, i.e., RF and DC, respectively, in the chamber. The deposition chamber was evacuated to a base pressure of 10−7 mbar with the help of a rotary pump (for pre-vacuum) followed by turbo molecular pump (for high vacuum). Metal was
- deposited by the DC planar magnetron source ION’X 2UHV (Thin Film Consulting). A similar-type RF magnetron source was used for sputtering the copper-bonded titanium dioxide (Williams Advanced Materials) to prevent charging of the target. The deposition rates from both targets were in situ monitored by two
Enhanced photocatalytic hydrogen evolution by combining water soluble graphene with cobalt salts
Beilstein J. Nanotechnol. 2014, 5, 1167–1174, doi:10.3762/bjnano.5.128
- irradiation. It is worth noting that after irradiation, a black magnetic precipitate was observed and adsorbed on the magnetron in both cases with or without G-SO3. When rinsed with acetone more than three times, the precipitation was visualized by TEM (transmission electron microscopy). As shown in Figure 5
Integration of ZnO and CuO nanowires into a thermoelectric module
Beilstein J. Nanotechnol. 2014, 5, 927–936, doi:10.3762/bjnano.5.106
- dried with synthetic air. Gold nanoparticles have been deposited by RF magnetron sputtering (70 W Ar plasma for 5 s at room temperature, pressure 5 × 10−3 mbar) on the substrate, as they will act as catalyst for the nanowire growth. This technique was very easy and straightforward to use and allowed a
- alumina substrates [24]. Samples have been first cleaned in acetone using ultrasonic bath for 10 min and then dried with synthetic air. Then, a thin layer of metallic Cu has been deposited on samples by RF magnetron sputtering (50 W Ar plasma at room temperature, pressure 5 × 10−3 mbar, thickness 1 μm
- , with an argon flow of 10 sccm (30 min deposition). Afterwards, copper oxide nanowires were synthesized by thermal oxidation. Copper metallic film was deposited via RF magnetron sputtering, as described before, using a 50 W argon plasma at room temperature (thickness 2 µm, 5 × 10−3 mbar pressure
Gas sensing with gold-decorated vertically aligned carbon nanotubes
Beilstein J. Nanotechnol. 2014, 5, 910–918, doi:10.3762/bjnano.5.104
- )-functionalized multi-walled nanotubes randomly arranged was significantly improved for NO2 gas detection [15]. Later, VA-CNTs produced by PECVD were functionalized with nominally 5 nm-thick metal nanoparticles by magnetron sputtering, providing a higher sensitivity to NO2 [16]. Based on these reported results
- layers were deposited under 2 mTorr and 20 mTorr pressures using radio frequency (RF) and direct current (DC) magnetron sputtering, respectively. For the CNT growth, the reactor was heated to 750 °C at atmospheric pressure under Ar flow (120 sccm). The catalyst was placed inside the reactor and the H2
- gas phase by DC magnetron sputtering (with a power of 75 W) from a gold target under Ar atmosphere (180 mTorr). It allows the production of well-dispersed nanoparticles in the gas phase with a narrow size distribution, production independent of the target substrate. The gold nanoparticles synthesized
Plasma-assisted synthesis and high-resolution characterization of anisotropic elemental and bimetallic core–shell magnetic nanoparticles
Beilstein J. Nanotechnol. 2014, 5, 466–475, doi:10.3762/bjnano.5.54
- heterostructured NP in gas condensation processes are discussed. Keywords: bimetallic magnetic nanoparticle; core–shell; magnetron sputtering; plasma gas condensation; Introduction Due to their size, novel physical properties and the possibility of contactless manipulation, magnetic nanoparticles can be employed
- over their chemical counterparts: the high purity of the resulting samples, high throughput in continuous operating mode, and easy integration into other UHV manufacturing/analysis steps. Although early experiments used inert gas condensation in combination with thermal evaporation [7], magnetron
- ) and capacitance manometers (MKS Baratron 122A and 220BHS) when working in the mbar regime. Metal vapors are generated with the help of two 2-inch DC magnetron sputtering guns (AJA A-320) that can be operated up to pressures as high as 2 mbar. Both magnetron guns have additionally been equipped with a
Preparation of electrochemically active silicon nanotubes in highly ordered arrays
Beilstein J. Nanotechnol. 2013, 4, 655–664, doi:10.3762/bjnano.4.73
- byproduct removal (f,g) are new. In the final step, which again is a standard one, an electrical contact of metallic gold is created on the other side of the membrane by magnetron sputtering (h). Investigation of the SiO2 reduction on flat samples A native SiO2 oxide layer of 200 nm thickness on a
Deformation-induced grain growth and twinning in nanocrystalline palladium thin films
Beilstein J. Nanotechnol. 2013, 4, 554–566, doi:10.3762/bjnano.4.64
- Karlsruhe, Germany 10.3762/bjnano.4.64 Abstract The microstructure and mechanical properties of nanocrystalline Pd films prepared by magnetron sputtering have been investigated as a function of strain. The films were deposited onto polyimide substrates and tested in tensile mode. In order to follow the
- difficult to determine and compare the inherent properties. As an alternative approach to prepare dense and very pure nc metals, we employed interrupted magnetron sputtering of thin metallic films [3][18][19]. The drawback of this approach is that mechanical testing and handling of the films is difficult
- active in ncPd films deposited by magnetron sputtering onto compliant substrates. The microstructural analysis is mainly performed by quantitative automated crystal orientation mapping TEM (ACOM-TEM) [23][24] and supplemented with grain size measurement using dark-field TEM (DF-TEM) and conventional X
3D nano-structures for laser nano-manipulation
Beilstein J. Nanotechnol. 2013, 4, 534–541, doi:10.3762/bjnano.4.62
- . Patterns on a sacrificial 300-nm thick PMMA mask were defined by electron beam lithography (EBL; Raith 150TWO). The mask was spin coated on a cover glass which was magnetron sputter-coated (AXXIS, JKLesker) with a 100 nm thick gold film. Figure 1a and Figure 1b show a sketch of the sample structure before
Nanoglasses: a new kind of noncrystalline materials
Beilstein J. Nanotechnol. 2013, 4, 517–533, doi:10.3762/bjnano.4.61
- , nanoglasses have been synthesized by inert gas condensation from a variety of alloys: Au–Si, Au–La, Cu–Sc, Fe–Sc, Fe–Si, La–Si, Pd–Si, Ni–Ti, Ni–Zr, Ti–P. Magnetron sputtering This method (Figure 5) has been applied so far to Au-based metallic glasses [7][8]. The nanoglass obtained consisted of glassy regions
- with an average size of about 30 nm. Recent studies of the structure and the properties of nanoglasses produced by magnetron sputtering [7][8] suggest that their structure and properties are comparable to the ones of nanoglasses produced by inert gas condensation. Severe plastic deformation Due to the
- microstructure of nanoglasses on the bioactivity, hierarchically structured layers of Ti34Zr14Cu22Pd30 metallic nanoglass were created by magnetron sputtering. The cell proliferation on the surfaces of these materials was studied by seeding ten thousand osteoblasts on the free surface of the Ti34Zr14Cu22Pd30
Ferromagnetic behaviour of Fe-doped ZnO nanograined films
Beilstein J. Nanotechnol. 2013, 4, 361–369, doi:10.3762/bjnano.4.42
- ][51][52][53][54][55][56][57][58][59][60][61][62][63][64][65][66]. The results are summarized in Figure 4 in a T–sGB plot (here T represents the annealing or synthesis temperature). They can be divided into three groups, depending on the sGB value. First, the samples obtained by the magnetron and ion
- structure deposited by magnetron sputtering (Figure 5, filled triangles) [38][39][40][63] and in samples synthesized by the conventional solid-state reaction having rather large (>10 μm) equiaxial grains [59]. If the ZnO films are deposited by magnetron sputtering, their Js decreases above 5–8 atom % Fe
- be connected with each other in a different way. For example, the ZnO samples synthesized by the liquid ceramics method possess the uniform, equiaxial grains without visible pores inside [6][17][18][72][73][74]. The films deposited by the magnetron sputtering are also poreless and have columnar
Other Beilstein-Institut Open Science Activities
