Nanoporous Ge thin film production combining Ge sputtering and dopant implantation

• Jacques Perrin Toinin,
• Alain Portavoce,
• Khalid Hoummada,
• Michaël Texier,
• Maxime Bertoglio,
• Sandrine Bernardini,
• Marco Abbarchi and
• Lee Chow

Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32

• Discussion 340 nm thick Ge layers were deposited on the native oxide layer of a silicon substrate at room temperature (RT), under high vacuum, by magnetron sputtering. Recrystallization was then performed by rapid thermal annealing at 600 °C under vacuum (P ≈ 3 × 10−5 mbar) and the Ge layer was implanted

• on the native silicon oxide of a (001) silicon wafer by magnetron sputtering in a commercial set up with a deposition chamber exhibiting a base pressure of ≈10−8 mbar. The first thermal annealing executed after Ge deposition was performed in a commercial Jetfirst 600 Rapid Thermal Annealing furnace

Morphology, structural properties and reducibility of size-selected CeO_2−x nanoparticle films

• Maria Chiara Spadaro,
• Sergio D’Addato,
• Gabriele Gasperi,
• Francesco Benedetti,
• Paola Luches,
• Vincenzo Grillo,
• Giovanni Bertoni and
• Sergio Valeri

Beilstein J. Nanotechnol. 2015, 6, 60–67, doi:10.3762/bjnano.6.7

• : CeO2 ultra-thin films; ceria nanoparticles; magnetron sputtering; reduction and oxidation; size-dependent properties; size-selected nanoparticles; X-ray photoelectron spectroscopy; Introduction The main property of cerium oxide that attracts scientific attention is its ability to store and release

• magnetron sputtering, the technique used in this study. Tschöpe et al. [12] studied ceria NPs realized by magnetron sputtering from pure and mixed metal target and inert gas condensation, observing the high non-stoichiometry of these systems due to the particular synthesis method. The non-stoichiometry is

• the increase of electron density in delocalized mixed cerium and oxygen orbitals, rather than on localized surface reduction of Ce4+ to Ce3+ ionic species [15]. In this work we present the results of the study of CeO2−x NPs produced by combining magnetron sputtering with a gas aggregation source. We

Si/Ge intermixing during Ge Stranski–Krastanov growth

• Alain Portavoce,
• Khalid Hoummada,
• Antoine Ronda,
• Dominique Mangelinck and
• Isabelle Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246

• grown (see the sketch of the sample structure in Figure 2). The entire growth was performed without interruption. Sample preparation for APT was performed using a Helios NanoLab DualBeam Ga+ FIB from FEI. A 100 nm thick Ni film was deposited by magnetron sputtering on each sample for protection before

Formation of Cu_xAu_1−x phases by cold homogenization of Au/Cu nanocrystalline thin films

• Alona Tynkova,
• Gabor L. Katona,
• Gabor A. Langer,
• Sergey I. Sidorenko,
• Svetlana M. Voloshko and
• Dezso L. Beke

Beilstein J. Nanotechnol. 2014, 5, 1491–1500, doi:10.3762/bjnano.5.162

• AuxCu1.5x solid solutions. Figure 9 shows bright field (top view) TEM images and selected area electron diffraction patterns of as deposited and heat treated (for 1 h at 160 °C) Au(10nm)/Cu(15nm) bilayers, respectively. For TEM investigations the specimens were prepared by subsequent magnetron sputtering on

• larger in Au (of the order of 10−11 m/s) than in Cu (of the order of 10−13 m/s). Experimental Au/Cu nanocrystalline thin films were prepared by DC magnetron sputtering onto (001)-oriented Si wafers with native SiO2 layer. The following bilayer samples were deposited: Au(25nm)/Cu(50nm), Au(25nm)/Cu(25nm

Integration of ZnO and CuO nanowires into a thermoelectric module

• Dario Zappa,
• Simone Dalola,
• Guido Faglia,
• Elisabetta Comini,
• Matteo Ferroni,
• Caterina Soldano,
• Vittorio Ferrari and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2014, 5, 927–936, doi:10.3762/bjnano.5.106

• dried with synthetic air. Gold nanoparticles have been deposited by RF magnetron sputtering (70 W Ar plasma for 5 s at room temperature, pressure 5 × 10−3 mbar) on the substrate, as they will act as catalyst for the nanowire growth. This technique was very easy and straightforward to use and allowed a

• alumina substrates [24]. Samples have been first cleaned in acetone using ultrasonic bath for 10 min and then dried with synthetic air. Then, a thin layer of metallic Cu has been deposited on samples by RF magnetron sputtering (50 W Ar plasma at room temperature, pressure 5 × 10−3 mbar, thickness 1 μm

• , with an argon flow of 10 sccm (30 min deposition). Afterwards, copper oxide nanowires were synthesized by thermal oxidation. Copper metallic film was deposited via RF magnetron sputtering, as described before, using a 50 W argon plasma at room temperature (thickness 2 µm, 5 × 10−3 mbar pressure

Gas sensing with gold-decorated vertically aligned carbon nanotubes

• Prasantha R. Mudimela,
• Mattia Scardamaglia,
• Oriol González-León,
• Nicolas Reckinger,
• Rony Snyders,
• Eduard Llobet,
• Carla Bittencourt and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2014, 5, 910–918, doi:10.3762/bjnano.5.104

• )-functionalized multi-walled nanotubes randomly arranged was significantly improved for NO2 gas detection [15]. Later, VA-CNTs produced by PECVD were functionalized with nominally 5 nm-thick metal nanoparticles by magnetron sputtering, providing a higher sensitivity to NO2 [16]. Based on these reported results

• layers were deposited under 2 mTorr and 20 mTorr pressures using radio frequency (RF) and direct current (DC) magnetron sputtering, respectively. For the CNT growth, the reactor was heated to 750 °C at atmospheric pressure under Ar flow (120 sccm). The catalyst was placed inside the reactor and the H2

• gas phase by DC magnetron sputtering (with a power of 75 W) from a gold target under Ar atmosphere (180 mTorr). It allows the production of well-dispersed nanoparticles in the gas phase with a narrow size distribution, production independent of the target substrate. The gold nanoparticles synthesized

Plasma-assisted synthesis and high-resolution characterization of anisotropic elemental and bimetallic core–shell magnetic nanoparticles

• M. Hennes,
• A. Lotnyk and
• S. G. Mayr

Beilstein J. Nanotechnol. 2014, 5, 466–475, doi:10.3762/bjnano.5.54

• heterostructured NP in gas condensation processes are discussed. Keywords: bimetallic magnetic nanoparticle; core–shell; magnetron sputtering; plasma gas condensation; Introduction Due to their size, novel physical properties and the possibility of contactless manipulation, magnetic nanoparticles can be employed

• ) and capacitance manometers (MKS Baratron 122A and 220BHS) when working in the mbar regime. Metal vapors are generated with the help of two 2-inch DC magnetron sputtering guns (AJA A-320) that can be operated up to pressures as high as 2 mbar. Both magnetron guns have additionally been equipped with a

• the target holder at elevated pressures in chamber A. Target morphology and intermittent mode Inhomogeneous depletion of the sputtered material in magnetron sputtering sources is known to result in pronounced circular trenches in the target (racetracks), as depicted in Figure 4b. In the present study

Preparation of electrochemically active silicon nanotubes in highly ordered arrays

• Tobias Grünzel,
• Young Joo Lee,
• Karsten Kuepper and
• Julien Bachmann

Beilstein J. Nanotechnol. 2013, 4, 655–664, doi:10.3762/bjnano.4.73

• byproduct removal (f,g) are new. In the final step, which again is a standard one, an electrical contact of metallic gold is created on the other side of the membrane by magnetron sputtering (h). Investigation of the SiO2 reduction on flat samples A native SiO2 oxide layer of 200 nm thickness on a

Deformation-induced grain growth and twinning in nanocrystalline palladium thin films

• Aaron Kobler,
• Jochen Lohmiller,
• Jonathan Schäfer,
• Michael Kerber,
• Anna Castrup,
• Ankush Kashiwar,
• Patric A. Gruber,
• Karsten Albe,
• Horst Hahn and
• Christian Kübel

Beilstein J. Nanotechnol. 2013, 4, 554–566, doi:10.3762/bjnano.4.64

• Karlsruhe, Germany 10.3762/bjnano.4.64 Abstract The microstructure and mechanical properties of nanocrystalline Pd films prepared by magnetron sputtering have been investigated as a function of strain. The films were deposited onto polyimide substrates and tested in tensile mode. In order to follow the

• difficult to determine and compare the inherent properties. As an alternative approach to prepare dense and very pure nc metals, we employed interrupted magnetron sputtering of thin metallic films [3][18][19]. The drawback of this approach is that mechanical testing and handling of the films is difficult

• active in ncPd films deposited by magnetron sputtering onto compliant substrates. The microstructural analysis is mainly performed by quantitative automated crystal orientation mapping TEM (ACOM-TEM) [23][24] and supplemented with grain size measurement using dark-field TEM (DF-TEM) and conventional X

Nanoglasses: a new kind of noncrystalline materials

• Herbert Gleiter

Beilstein J. Nanotechnol. 2013, 4, 517–533, doi:10.3762/bjnano.4.61

• , nanoglasses have been synthesized by inert gas condensation from a variety of alloys: Au–Si, Au–La, Cu–Sc, Fe–Sc, Fe–Si, La–Si, Pd–Si, Ni–Ti, Ni–Zr, Ti–P. Magnetron sputtering This method (Figure 5) has been applied so far to Au-based metallic glasses [7][8]. The nanoglass obtained consisted of glassy regions

• with an average size of about 30 nm. Recent studies of the structure and the properties of nanoglasses produced by magnetron sputtering [7][8] suggest that their structure and properties are comparable to the ones of nanoglasses produced by inert gas condensation. Severe plastic deformation Due to the

• microstructure of nanoglasses on the bioactivity, hierarchically structured layers of Ti34Zr14Cu22Pd30 metallic nanoglass were created by magnetron sputtering. The cell proliferation on the surfaces of these materials was studied by seeding ten thousand osteoblasts on the free surface of the Ti34Zr14Cu22Pd30

Ferromagnetic behaviour of Fe-doped ZnO nanograined films

• Boris B. Straumal,
• Svetlana G. Protasova,
• Andrei A. Mazilkin,
• Thomas Tietze,
• Eberhard Goering,
• Gisela Schütz,
• Petr B. Straumal and
• Brigitte Baretzky

Beilstein J. Nanotechnol. 2013, 4, 361–369, doi:10.3762/bjnano.4.42

• structure deposited by magnetron sputtering (Figure 5, filled triangles) [38][39][40][63] and in samples synthesized by the conventional solid-state reaction having rather large (>10 μm) equiaxial grains [59]. If the ZnO films are deposited by magnetron sputtering, their Js decreases above 5–8 atom % Fe

• be connected with each other in a different way. For example, the ZnO samples synthesized by the liquid ceramics method possess the uniform, equiaxial grains without visible pores inside [6][17][18][72][73][74]. The films deposited by the magnetron sputtering are also poreless and have columnar

• 0.09 emu/g (0.022 μB/f.u.ZnO) at 40 atom % Fe. In other published papers similar nonmonotonous dependences were observed in nanostructured films with elongated grains deposited by magnetron sputtering. These differences can be explained by the changes in the structure and contiguity of a ferromagnetic

A highly pH-sensitive nanowire field-effect transistor based on silicon on insulator

• Denis E. Presnov,
• Sergey V. Amitonov,
• Pavel A. Krutitskii,
• Valentina V. Kolybasova,
• Igor A. Devyatov,
• Vladimir A. Krupenin and
• Igor I. Soloviev

Beilstein J. Nanotechnol. 2013, 4, 330–335, doi:10.3762/bjnano.4.38

• and contact pads. Aluminium mask e-beam vapour deposition. Anisotropic reactive ion etching of the device layer through the Al mask and mask removal. Magnetron sputtering of titanium electrodes and their isolation with silica to allow measurements in liquids. Both optical and electron-beam lithography

Hydrogen-plasma-induced magnetocrystalline anisotropy ordering in self-assembled magnetic nanoparticle monolayers

• Alexander Weddemann,
• Judith Meyer,
• Anna Regtmeier,
• Irina Janzen,
• Dieter Akemeier and
• Andreas Hütten

Beilstein J. Nanotechnol. 2013, 4, 164–172, doi:10.3762/bjnano.4.16

• gradient magnetometer (AGM) measurements were performed before and after plasma treatment. Since a significant degree of oxidation can occur on very short time scales [15][16], the samples were covered in situ with a thin protective layer. These layers were deposited employing magnetron sputtering. For

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

• Adrian Iovan,
• Marco Fischer,
• Roberto Lo Conte and
• Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

• SiO2, we etch two times longer (2 min) in order to form a good undercut in SiO2, which is important for the following deposition steps. Magnetron sputtering was used for deposition of the active point-contact region. The material combination was selected to represent the spin-injection laser device [15

Highly ordered ultralong magnetic nanowires wrapped in stacked graphene layers

• Abdel-Aziz El Mel,
• Jean-Luc Duvail,
• Eric Gautron,
• Wei Xu,
• Chang-Hwan Choi,
• Benoit Angleraud,
• Agnès Granier and
• Pierre-Yves Tessier

Beilstein J. Nanotechnol. 2012, 3, 846–851, doi:10.3762/bjnano.3.95

• (also known as metal-filled carbon nanotubes). Carbon-containing nickel nanowires are first grown on a nanograted surface by magnetron sputtering. Then, a post-annealing treatment favors the metal-catalyzed crystallization of carbon into stacked graphene layers rolled around the nickel cores. The

Functionalised zinc oxide nanowire gas sensors: Enhanced NO₂ gas sensor response by chemical modification of nanowire surfaces

• Eric R. Waclawik,
• Jin Chang,
• Andrea Ponzoni,
• Isabella Concina,
• Dario Zappa,
• Elisabetta Comini,
• Nunzio Motta,
• Guido Faglia and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2012, 3, 368–377, doi:10.3762/bjnano.3.43

• interacted with residual oxygen to give ZnO nanowires [13]. The stabilised samples were then provided by interdigitated Pt electrodes deposited by RF magnetron sputtering, while on the back side a Pt meander was deposited to act as heater (by Joule effect) and temperature sensor. Ex situ functionalisation of

Junction formation of Cu₃BiS₃ investigated by Kelvin probe force microscopy and surface photovoltage measurements

• Fredy Mesa,
• William Chamorro,
• William Vallejo,
• Robert Baier,
• Thomas Dittrich,
• Alexander Grimm,
• Martha C. Lux-Steiner and
• Sascha Sadewasser

Beilstein J. Nanotechnol. 2012, 3, 277–284, doi:10.3762/bjnano.3.31

• with Al, deposited by dc magnetron sputtering [21]. For analysis by Kelvin probe force microscopy (KPFM) [7], surface photovoltage (SPV), and X-ray photoemission spectroscopy (XPS), sample contact was established at the Al back contact. CdS thin films were deposited onto the Cu3BiS3 layers from a

Extended X-ray absorption fine structure of bimetallic nanoparticles

• Carolin Antoniak

Beilstein J. Nanotechnol. 2011, 2, 237–251, doi:10.3762/bjnano.2.28

• annealing of the nanoparticles or in-flight annealing of FePt nanoparticles synthesised by condensation from the gas phase before landing onto a substrate as described below. Gas phase synthesis FePt nanoparticles can be prepared by an inert gas condensation method based on a DC magnetron sputtering process