Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar⁺ ion beam: a comparative study

• Indra Sulania,
• Harpreet Sondhi,
• Tanuj Kumar,
• Sunil Ojha,
• G R Umapathy,
• Ambuj Mishra,
• Ambuj Tripathi,
• Richa Krishna,
• Devesh Kumar Avasthi and
• Yogendra Kumar Mishra

Beilstein J. Nanotechnol. 2024, 15, 367–375, doi:10.3762/bjnano.15.33

• experimental results [11][12]. Thanks to these efforts, desired nanopattern features with a large degree of control may be achieved, according to specific applications, on a wide variety of targets. Facsko et al. [13] have shown controlled growth of nanodots on GaSb, and their probable use was demonstrated via

Atomic force acoustic microscopy reveals the influence of substrate stiffness and topography on cell behavior

• Yan Liu,
• Li Li,
• Xing Chen,
• Ying Wang,
• Meng-Nan Liu,
• Jin Yan,
• Liang Cao,
• Lu Wang and
• Zuo-Bin Wang

Beilstein J. Nanotechnol. 2019, 10, 2329–2337, doi:10.3762/bjnano.10.223

• for the tissue regeneration therapy in biomedicine. Keywords: atomic force acoustic microscopy (AFAM); cell growth; nanopattern; stiffness; SU-8 photoresist; topography; Introduction The interactions of cells with extracellular matrices (ECMs) play important roles in regenerative medicine and tissue

• SU-8 photoresist films as the substrate and generated local changes in the stiffness and the nanopattern topography on the surface. The SU-8 photoresist has been used as the material for biosensors in living tissues [24] and cell culture molds in vitro due to its excellent biocompatibility [16] and

• (Supporting Information File 1, Figure S1), as measured by SEM (FEI Quanta 250 FEG, USA). The SU-8 films were then patterned by EBL using a nanopattern generation system (NPGS, V9.1, from JC Nabity Lithography Systems). The SU-8 films were exposed to the 30 kV electron beam at a beam current of 63 pA and a

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• thick walls on planar substrates is presented. The method consists of three sequential, standard microelectronic processes: 1) lithographic patterning of an organic polymer resist film; 2) deposition of a thin film of metal on all surfaces of the nanopattern resist; and 3) removal of the polymer resist

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• electron decreases. In Figure 9 the effect of the acceleration voltage on a nanopattern is represented. As seen in Figure 9a–c for a Si substrate, an increase in the acceleration voltage from 10 to 20 kV does not significantly change the resolution of the polygon. However, for the Au-coated substrate a

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• highly localized shadow. The removal of the gold mask reveals the SAM nanopattern. Keywords: colloid lithography; contact lithography; near-field; photochemistry; self-assembled silane monolayers; Introduction Chemical nanopatterns consist of spatially separated areas providing different chemically

• binding of the fluorescein tags to the amino groups of the APTES SAM. A fluorescence image of the 1.2 µm nanopattern was found (Figure 3b). Clearly the hexagonally aligned triangular fluorescence pattern is observed. Additional experiments included the labeling of the fabricated chemical nanopatterns with

• nanoparticles, which was performed to increase the topographical contrast for detection by means of AFM. By binding 1.4 nm negatively charged gold nanoparticles to the positively charged APTES SAM nanopattern it could be demonstrated that the pattern transfer was successful even for 0.22 µm masks (Figure 3c

Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

• Jun Zhao,
• Bettina Frank,
• Frank Neubrech,
• Chunjie Zhang,
• Paul V. Braun and
• Harald Giessen

Beilstein J. Nanotechnol. 2014, 5, 577–586, doi:10.3762/bjnano.5.68

• as possible without touching the neighboring structures. Therefore, a high concentration of PS spheres of about 0.02 wt % and a PDDA concentration of 0.2 wt % is required. A typical example of such a prepared hole-mask is shown in Figure 3d. Due to the electrostatic repulsion, a certain nanopattern

Surface assembly and nanofabrication of 1,1,1-tris(mercaptomethyl)heptadecane on Au(111) studied with time-lapse atomic force microscopy

• Tian Tian,
• Burapol Singhana,
• Lauren E. Englade-Franklin,
• Xianglin Zhai,
• T. Randall Lee and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2014, 5, 26–35, doi:10.3762/bjnano.5.3

• left and right sides of the nanopattern, indicated by the bright edges. However, most of the molecules dissolved in the liquid media or are swept away by the scanning action of the AFM tip. A possible concern when increasing the force to the AFM tip is that the probe might become dull or break. However

• more densely packed after 30 h immersion in TMMH (see Figure 4). The thickness of the SAM is 1.0 ± 0.2 nm measured at the right edge of the nanopattern. The baseline within the nanoshaved area has a slope due to the nature of the substrate. The left side has a hill of adsorbates from the material

• inscribed by multiple sweeps across the same selected region, which produced a double-layer thickness for the circles and letter shapes. It has previously been reported that multiple sweeps during nanografting of carboxylic acid-terminated SAMs produced bilayer nanopatterns [36]. The square nanopattern of

Digging gold: keV He⁺ ion interaction with Au

• Vasilisa Veligura,
• Gregor Hlawacek,
• Robin P. Berkelaar,
• Raoul van Gastel,
• Harold J. W. Zandvliet and
• Bene Poelsema

Beilstein J. Nanotechnol. 2013, 4, 453–460, doi:10.3762/bjnano.4.53

• significant sample modifications. We have characterized the changes caused by a focused He+ ion beam at normal incidence to the Au{111} surface as a function of ion fluence and energy. Under the influence of the beam a periodic surface nanopattern develops. The periodicity of the pattern shows a power-law

• same area. Figure 2 shows several images of the gold surface after exposure to identical ion fluences, but with different primary energies. Under the influence of the 15 keV beam a regular nanopattern develops. The topographic contrast increases and the surface pattern becomes more pronounced with each

• of 4.8 × 1017 cm−2 a blister forms, which is shown in Figure 2e. For larger fluences pores start to appear on the surface of the blister (see Figure 2f). A beam with a primary energy of 35 keV initially induces a comparable nanopattern formation (Figure 2g). Higher fluences result in blister

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

• Jonathan Berson,
• Assaf Zeira,
• Rivka Maoz and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2012, 3, 134–143, doi:10.3762/bjnano.3.14

• metal-ion-binding functions (e.g., –COOH, –S–S–, –SH) [31]. Results and Discussion As shown below in Figure 1, Figure 2 and Figure 3, all OTSeo features of a serially inscribed OTSeo@OTS/Si nanopattern can be simultaneously metallized in a parallel CET operation performed with an unpatterned, thin

• silver-film stamp (Ag/OTS/Si), whereas precise delivery of metal to selected surface sites within selected OTSeo features of such a monolayer nanopattern can be realized in a serial mode, by moving a positively biased silver-coated SFM tip along a planned trajectory across the patterned area of the

• , to the target monolayer (cathode), where effective nucleation and growth of stable metal grains (following the reduction of Ag+ ions to neutral atoms) can occur only at those surface sites that bind the ions, which correspond to the carboxylic acid terminated OTSeo lines of the template nanopattern

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

• ChaMarra K. Saner,
• Kathie L. Lusker,
• Zorabel M. LeJeune,
• Wilson K. Serem and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12

• reaction. By controlling the drying parameters of the latex masks, different nanopattern geometries are produced [30][38]. Nanostructures produced by particle lithography using vapor deposition of OTS By combining particle lithography with vapor deposition of OTS, arrays of ring-shaped nanostructures were

Surface induced self-organization of comb-like macromolecules

• Konstantin I. Popov,
• Vladimir V. Palyulin,
• Martin Möller,
• Alexei R. Khokhlov and
• Igor I. Potemkin

Beilstein J. Nanotechnol. 2011, 2, 569–584, doi:10.3762/bjnano.2.61

• properties include an increase in stiffness upon increasing side-chain length, the spontaneous curvature of adsorbed combs, rod–globule transition, and specific intramolecular self-assembly. We also propose a theory of chemically heterogeneous surface nanopattern formation in ultrathin films of comblike

• nanopattern formation [135]. A theoretical study of ultrathin films of diblock copolymers with varying stickiness of one of the blocks shows that surface nanopatterns with disc-, stripe- and holelike structures can be obtained. If both blocks can be partially desorbed and one of them can spread atop the other