Zinc oxide nanostructures for fluorescence and Raman signal enhancement: a review

• Ioana Marica,
• Fran Nekvapil,
• Maria Ștefan,
• Cosmin Farcău and
• Alexandra Falamaș

Beilstein J. Nanotechnol. 2022, 13, 472–490, doi:10.3762/bjnano.13.40

• metallic layer [32], chemical synthesis [33], or nanosphere lithography. Usually, ZnO nanostructures are fabricated first, followed by the decoration with metallic nanostructures or a metallic layer, which is added by physical vapour deposition, including sputtering processes [6][34], ion sputtering, which

• needed to develop efficient SERS substrates. The combination of several methods including nanosphere lithography, atomic layer deposition, electrodeposition, and electron-beam evaporation resulted in Au-covered hollow urchin-like ZnO structures (Figure 2e–k) [16]. The ZnO layer was deposited on a

Materials nanoarchitectonics at two-dimensional liquid interfaces

• Katsuhiko Ariga,
• Michio Matsumoto,
• Taizo Mori and
• Lok Kumar Shrestha

Beilstein J. Nanotechnol. 2019, 10, 1559–1587, doi:10.3762/bjnano.10.153

• and co-workers demonstrated two-dimensional co-patterned structures of carbazole-based conductive polymers and gold by nanosphere lithography [217]. Huang and co-workers proposed a high-yield LB method for nanoparticle films through electrospray techniques to significantly reduce the spreading of

Revisiting semicontinuous silver films as surface-enhanced Raman spectroscopy substrates

• Malwina Liszewska,
• Bogusław Budner,
• Małgorzata Norek,
• Bartłomiej J. Jankiewicz and
• Piotr Nyga

Beilstein J. Nanotechnol. 2019, 10, 1048–1055, doi:10.3762/bjnano.10.105

• via various structuring methods. Electron beam lithography allows fabrication of planar [21] and 3D metallic structures [22]. Nanosphere lithography can be used to obtain nanotriangles [23] and nanocones [24]. Much attention has been also given to the deposition of metal onto nano- and micro

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• obtain porous silver nanostructures [12]. Other routes include the use of gold or silver nanoparticles of different shapes in solution and their assembly on a solid substrate [6][13][14][15][16][17], nanosphere lithography [18][19][20][21][22][23][24][25] as well as nanolithography and nanoimprinting [26

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

• Gitanjali Kolhatkar,
• Alexandre Merlen,
• Jiawei Zhang,
• Chahinez Dab,
• Gregory Q. Wallace,
• François Lagugné-Labarthet and
• Andreas Ruediger

Beilstein J. Nanotechnol. 2018, 9, 1536–1543, doi:10.3762/bjnano.9.144

• Department and Centre for Materials and Biomaterials, 1151 Richmond Street, London, ON, N6A5B7, Canada 10.3762/bjnano.9.144 Abstract We introduce a simple, fast, efficient and non-destructive method to study the optical near-field properties of plasmonic nanotriangles prepared by nanosphere lithography

• : apertureless scanning near-field optical microscopy; diffuse signal; nanosphere lithography; photomultiplier tube; plasmonic nanostructures; Introduction SNOM (scanning near-field optical microscopy) is an imaging technique based on an optical near-field probe for high spatial resolution [1][2]. A version of

• contribution, we use the Fourier transformation of the diffuse signal and filtering. This method is applied to plasmonic gold nanotriangles [19] inscribed on a glass substrate, that were prepared by nanosphere lithography [20][21][22]. Those nanostructures, that most commonly consist of arrays of metallic

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• provides a way to produce millions of nanostructures with reproducible shapes, sizes and arrangements with organic thin films [25][26]. Particle lithography is also commonly referred to as nanosphere lithography (NSL) [27] and has been used to generate patterns of organic polymers [25][28][29][30][31

Fabrication of gold-coated PDMS surfaces with arrayed triangular micro/nanopyramids for use as SERS substrates

• Jingran Zhang,
• Yongda Yan,
• Peng Miao and
• Jianxiong Cai

Beilstein J. Nanotechnol. 2017, 8, 2271–2282, doi:10.3762/bjnano.8.227

• ], such as electron-beam lithography (EBL) [11][12], soft interference lithography (SIL) [13][14], and nanosphere lithography (NSL) [15][16]. To improve the reproducibility and production quantity of SERS substrates, researchers have focused on replicating molded micro/nanostructures as SERS substrates

Near-field surface plasmon field enhancement induced by rippled surfaces

• Mario D’Acunto,
• Francesco Fuso,
• Ruggero Micheletto,
• Makoto Naruse,
• Francesco Tantussi and
• Maria Allegrini

Beilstein J. Nanotechnol. 2017, 8, 956–967, doi:10.3762/bjnano.8.97

• -down lithographic techniques such as electron beam lithography and nanosphere lithography [22][23][24]. In this paper, we simulate the conditions of SPP field enhancement and the formation of dark and hot, or bright spots, for a wide variety of patterned surfaces. The patterned surfaces are numerically

Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples

• Christa Genslein,
• Peter Hausler,
• Eva-Maria Kirchner,
• Rudolf Bierl,
• Antje J. Baeumner and
• Thomas Hirsch

Beilstein J. Nanotechnol. 2016, 7, 1564–1573, doi:10.3762/bjnano.7.150

• fabrication and low manufacturing cost that can also easily be done in low-class clean room areas, techniques such as polymer blend lithography or a modified nanosphere lithography (NSL) technique were recently developed [31][32]. Using colloidal lithography disordered nanoholes can be obtained. A combination

• of NSL with electrochemical deposition, ion-polishing, plasma treatment and glancing-angle deposition produces ordered nanohole arrays. Therefore, NSL is a promising tool to produce nanostructured substrates. Here, nanohole arrays were prepared by a modified nanosphere lithography (Figure 1). The

• and reproducible substrates. These requirements are easily met in nanosphere lithography as sphere size and monolayer formation allow for facile nanohole array design and systematic variation of its properties. Results and Discussion A nanohole array modified SPR chip was fabricated according to the

Magnetic switching of nanoscale antidot lattices

• Ulf Wiedwald,
• Joachim Gräfe,
• Kristof M. Lebecki,
• Maxim Skripnik,
• Felix Haering,
• Gisela Schütz,
• Paul Ziemann,
• Eberhard Goering and
• Ulrich Nowak

Beilstein J. Nanotechnol. 2016, 7, 733–750, doi:10.3762/bjnano.7.65

• Republic 10.3762/bjnano.7.65 Abstract We investigate the rich magnetic switching properties of nanoscale antidot lattices in the 200 nm regime. In-plane magnetized Fe, Co, and Permalloy (Py) as well as out-of-plane magnetized GdFe antidot films are prepared by a modified nanosphere lithography allowing

• -up techniques based on the self-assembly of nanoscale spheres [2][11][12] allow precise control over diameter and distance of the antidots. In the present work, we make use of bottom-up nanosphere lithography in combination with reactive ion etching resulting in hexagonally arranged, non-close packed

• other end of the tuneable antidot diameters producible by nanosphere lithography, small antidot dimensions with d < 0.1a were suggested for applications in magnonics, where spin waves are used to transmit and process information [18]. Using the periodicity of the antidot lattice, the spin wave

Surface-enhanced Raman scattering by colloidal CdSe nanocrystal submonolayers fabricated by the Langmuir–Blodgett technique

• Alexander G. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Volodymyr M. Dzhagan,
• Ovidiu D. Gordan,
• Sergey L. Veber,
• Cameliu Himcinschi,
• Alexander V. Latyshev and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 2388–2395, doi:10.3762/bjnano.6.245

• can be fabricated by means of electron-beam lithography [34][35], nanoimprint lithography [36][37], or nanosphere lithography [38][39], the deposition of homogeneous films of CdSe NCs is possible by using Langmuir–Blodgett (LB) technology [40][41][42][43]. In this paper we report on the study of

Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch²

• Cheng Huang,
• Alexander Förste,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2015, 6, 1205–1211, doi:10.3762/bjnano.6.123

• metal or semiconductor nanopatterns, such as electron beam lithography [7][8][9], nanosphere lithography [10][11][12][13], laser interference lithography [14][15], AFM-based dip-pen lithography [16], and more. Masuda and his colleagues used anodic porous alumina as lithographic mask for the fabrication

Review of nanostructured devices for thermoelectric applications

• Giovanni Pennelli

Beilstein J. Nanotechnol. 2014, 5, 1268–1284, doi:10.3762/bjnano.5.141

• arrays can also be produced by the simpler and cheaper innovative pattering technique nanosphere lithography [120][121]; The evaporation of Ag or Au through porous aluminum oxide membranes[122][123][124] gives a periodic and almost regular pattern for vertically etched nanowire arrays. A thin evaporation

Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

• Jun Zhao,
• Bettina Frank,
• Frank Neubrech,
• Chunjie Zhang,
• Paul V. Braun and
• Harald Giessen

Beilstein J. Nanotechnol. 2014, 5, 577–586, doi:10.3762/bjnano.5.68

• method is still quite costly. Interference lithography is large-area and low-cost, but only a limited range of well-ordered simple periodic structures are available [19]. Nanosphere lithography is large-area, low-cost, and simple, however, suffers from the drawback of clogging during evaporation [20][21

Mapping of plasmonic resonances in nanotriangles

• Simon Dickreuter,
• Julia Gleixner,
• Andreas Kolloch,
• Johannes Boneberg,
• Elke Scheer and
• Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

• of gold nano-triangles with differently shaped edges have been used: For one type the edges were slightly curved inwards to mimic the shape of triangles prepared by nanosphere lithography, while for the second type the edges were straight, like the triangles simulated in early DDA calculations [21

Near-field effects and energy transfer in hybrid metal-oxide nanostructures

• Ulrich Herr,
• Balati Kuerbanjiang,
• Cahit Benel,
• Giorgos Papageorgiou,
• Manuel Goncalves,
• Johannes Boneberg,
• Paul Leiderer,
• Paul Ziemann,
• Peter Marek and
• Horst Hahn

Beilstein J. Nanotechnol. 2013, 4, 306–317, doi:10.3762/bjnano.4.34

• that quenching of the Eu fluorescence can be suppressed by covering the nanoantennas with a 10 nm thick SiOx layer. Keywords: confocal microscopy; energy transfer; field enhancement; light harvesting; luminescence; nano-antennas; nanosphere lithography; nanostructures; plasmonics; simulation; TiO2

• the CVR process. Future work will therefore aim at an integration of the ALD process into the CVR technique. B. Systems with Ag nanoantennas from NSL Nanosphere lithography (NSL) is a well-established technique for the generation of periodic structures on the submicron scale [17]. Colloid spheres

• periodic arrays of triangular Ag nano-antennas, which have been produced by nanosphere lithography. The optical properties of the Ag nano-antennas have been investigated by numerical simulations based on solutions of Maxwell’s equations. We find large resonant enhancements of the electrical field in the

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• process, such as in nanosphere lithography (NSL) [15][16], film over nanospheres (FON) [17][18], and sculpted SERS substrates [19]. Here, the arrays are tunable by varying the size of the monodisperse polystyrene or silicon dioxide beads. Unfortunately, frequently occurring constructional defects within

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• 10.3762/bjnano.2.49 Abstract We present two routes for the fabrication of plasmonic structures based on nanosphere lithography templates. One route makes use of soft-lithography to obtain arrays of epoxy resin hemispheres, which, in a second step, can be coated by metal films. The second uses the

• can be utilized in experiments requiring light confinement. Keywords: nanosphere-lithography; near-field enhancement; plasma etching; soft-lithography; surface plasmons; Introduction Classical electromagnetic theories describing optical transmission through small apertures [1][2] do not take into

• linked with the optical function of the structures. Current techniques for the fabrication of plasmonic cavities include electrochemical growth combined with nanosphere lithography [25][35], electron-beam lithography [36], etching techniques [37][38][39][40] and focused ion beam milling [41][42][43]. The