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Search for "silicon surface" in Full Text gives 63 result(s) in Beilstein Journal of Nanotechnology.
Mapping of plasmonic resonances in nanotriangles
Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66
- height of the triangle (40 nm)). In Figure 6b the energy, which is dissipated inside the triangle, is shown. For this graph the results of two simulations were combined: The values gathered from a simulation describing a single triangle on a silicon surface were divided by the values of a simulation with
Functionalization of vertically aligned carbon nanotubes
Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14
Controlled deposition and combing of DNA across lithographically defined patterns on silicon
Beilstein J. Nanotechnol. 2013, 4, 72–76, doi:10.3762/bjnano.4.8
- -octyldimethylchlorosilane coated silicon surface. At pH 5.1 and ionic strength of 100 mM, DNA is adsorbed to the surface by the ends. By using a plastic pipette tip, the droplet is gently dragged out of the surface. The movement of the air–water interface results in the stretching of DNA molecules, which are fixed to the
Highly ordered ultralong magnetic nanowires wrapped in stacked graphene layers
Beilstein J. Nanotechnol. 2012, 3, 846–851, doi:10.3762/bjnano.3.95
- while retaining an excellent alignment. Additionally, in some cases the metal is found to be discontinuous inside the tubes [20]. In a previous study, we demonstrated the possibility to synthesize an array of aligned Ni nanowires on a patterned silicon surface [25]. In this letter we present a simple
Pinch-off mechanism in double-lateral-gate junctionless transistors fabricated by scanning probe microscope based lithography
Beilstein J. Nanotechnol. 2012, 3, 817–823, doi:10.3762/bjnano.3.91
- to determine the size of the oxide patterns. Figure 1a and Figure 1b show that oxide protrusions were produced on the hydrogen passivated silicon surface with various voltages from 6 to 9 V at a constant writing speed of 1 µm/s, at 65% RH, and in contact mode. The effect of different writing speeds
- concentration, temperature, and angle between the silicon surface and the mask [21] are likely to be created. However, in all simulation steps the ideal initial cubic shape is considered, for simplicity. We believe that, according to the device dimensions in the simulation study, considering the exact shape of
Effect of spherical Au nanoparticles on nanofriction and wear reduction in dry and liquid environments
Beilstein J. Nanotechnol. 2012, 3, 759–772, doi:10.3762/bjnano.3.85
- force (C–D) is used to quantify the friction force between the nanoparticle and silicon surface as sliding is initiated. For submerged-in-water conditions as shown in Figure 7, a 10 µm × 10 µm area is imaged at a normal load of 1 nN. This allows for multiple manipulations within a single topography scan
- completely remove the Au 30 nanoparticles from the surface. It is also expected, since the softer Au nanoparticles remain in the wear area after 1 cycle for Au 90 and 10 cycles for Au 30, that the damage to the silicon surface should be less than that of an initially uncoated substrate, since the glass
Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers
Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71
- platform for constructive lithography [1], cell adhesion studies, or the study of other template-induced phenomena. The FDTS-SAM could be replaced by other silanes, such as octadecyltrichlorosilane (OTS) or polyethylene glycol (PEG) silane, for desired applications [63][64]. The bare silicon surface at the
- mask can be alternatively dissolved in THF, following the protocol described above for acetic acid. For the three-phase template the (3-aminopropyl)triethoxysilane (APTES, Aldrich) SAM was deposited onto the silicon surface inside the holes of the lithographic mask in the gas phase, shown in Figure 5a
- and Figure 5b. The PMMA was removed by acetic acid, and the freed silicon surface was covered then by a different silane molecule, FDTS with the same deposition method as APTES. The PS islands were removed by snow-jet treatment as well. Instead of by using a snow jet, the polymer mask can also be
Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst
Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62
- about 1 µm. Using these surfaces without further treatment, no NW growth was observed below 650 °C. At this temperature, NWs with a diameter of less than 100 nm and a length of up to 10 µm formed on the silicon surface (Figure 9, left). We assumed that at this temperature, the organic stabilizers
Mapping mechanical properties of organic thin films by force-modulation microscopy in aqueous media
Beilstein J. Nanotechnol. 2012, 3, 464–474, doi:10.3762/bjnano.3.53
- the cantilever. Sample Preparation Gold deposition Silicon wafers (Virginia semiconductor, Part 325S119656) were washed in acetone, ethanol and DI water, and completely dried before use. A 45 nm gold layer with a 5 nm chromium adhesion layer was deposited on the silicon surface by using an e-beam
Repulsive bimodal atomic force microscopy on polymers
Beilstein J. Nanotechnol. 2012, 3, 456–463, doi:10.3762/bjnano.3.52
- bimodal mode [8][14][19]. In the following, we refer to the ratio A01/A02 of the free oscillation amplitudes of the cantilever. The amplitudes were calibrated by advancing the vibrating cantilever toward a silicon surface and recording the amplitude signal (in volts) versus the tip–sample separation (in
Forming nanoparticles of water-soluble ionic molecules and embedding them into polymer and glass substrates
Beilstein J. Nanotechnol. 2012, 3, 267–276, doi:10.3762/bjnano.3.30
- due to a directional growth of the KI on the silicon surface. An additional proof of nanoparticle formation in the sonochemical reaction, based on sonication of the saturated solution of NaCl (CuSO4, KI), was the formation of sediment that was not immobilized on the glass slide but instead
Direct-write polymer nanolithography in ultra-high vacuum
Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6
- also interesting because it becomes highly ordered, forming self-assembled layers on a silicon surface [14], when it is properly annealed. This ordering increases its ability to conduct current after electron beam exposure [15]. The probe temperature was controlled by applying current through the probe
- is a convolution of the topographic height and electronic properties of the polymer film, complicating the comparison. However, the polymer’s lying flat strongly suggests that alkyl side chains must interact more favorably with the silicon surface than with the oxide surface and so has a significant
- )] shows that the polymer thickness is 0.4 nm, indicating that the polymer molecules are lying flat. (d) A second image of polymer deposited on a UHV-prepared clean silicon surface with diagonal monatomic steps that go from the upper left to the lower right. (e) Cross section from (d) that again gives a
Sensing surface PEGylation with microcantilevers
Beilstein J. Nanotechnol. 2010, 1, 3–13, doi:10.3762/bjnano.1.2
- ][26], DNA [27] or lipid bilayers [28]. Recently, Bumbu et al. [29] applied the static mode technique to study the behavior of poly(methyl methacrylate) brushes that had been polymerized from the silicon surface of a microcantilever sensor, i.e., using a “grafting from” approach. While this allowed the
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