Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• photolithography for master mold preparation and soft lithography and solvent casting for PU film patterning. Challenges in the use of photoresist master molds for PDMS replica molding and microgroove formation were addressed using “reinforcement” strategies. Differentiation of PC12 cells on the PU substrates

Silver-based SERS substrates fabricated using a 3D printed microfluidic device

• Phommachith Sonexai,
• Minh Van Nguyen,
• Bui The Huy and
• Yong-Ill Lee

Beilstein J. Nanotechnol. 2023, 14, 793–803, doi:10.3762/bjnano.14.65

• separate microreactor [12][22]. A traditional approach to producing microfluidic devices involves a three-step microfabrication process of (i) creating a channel mold using photolithography, (ii) fabricating the channels by casting the mold through soft lithography, and (iii) bonding the channel device to

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

• Chang-Ming Wang,
• Hong-Sheng Chan,
• Chia-Li Liao,
• Che-Wei Chang and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

• lithography operations and could severely limit the obtainable feature resolution if neglected. Chemical lift-off lithography (CLL) is a rapidly emerging subtractive lithographic technique that aims to overcome the lateral diffusion and gas phase transfer obstacles present in conventional soft lithography [17

• nanoscale surface patterns, whereas conventional photolithography methods are limited by diffraction during the illumination step and under/overetching during the development process [17]. In soft lithography, the deformation and collapsing of rubber stamp structures occur due to the adhesion between the

• nanometer level can be obtained via the use of microscale features generated from conventional lithography. Nevertheless, the integration of interface structure gap formation and soft lithography, unfortunately, is still challenging since the molecular lateral diffusion problem remains to restrict pattern

Roll-to-roll fabrication of superhydrophobic pads covered with nanofur for the efficient clean-up of oil spills

• Patrick Weiser,
• Robin Kietz,
• Marc Schneider,
• Matthias Worgull and
• Hendrik Hölscher

Beilstein J. Nanotechnol. 2022, 13, 1228–1239, doi:10.3762/bjnano.13.102

• millimeters [8][9]. Various (soft) lithography techniques have been employed to create superhydrophobic surfaces; however, these generally rely on copying surface information from a master (e.g., a lotus leaf) [9][10] and are therefore often limited in size. Superhydrophobic surfaces could also be prepared

Engineered titania nanomaterials in advanced clinical applications

• Padmavati Sahare,
• Paulina Govea Alvarez,
• Juan Manual Sanchez Yanez,
• Gabriel Luna-Bárcenas,
• Samik Chakraborty,
• Sujay Paul and
• Miriam Estevez

Beilstein J. Nanotechnol. 2022, 13, 201–218, doi:10.3762/bjnano.13.15

• /titanium dioxide nanocomposites against biofilm-forming and methicillin-resistant strains of Staphylococcus aureus and Pseudomonas aeruginosa [95]. In another novel approach, dip pen nanolithography and soft lithography were used to form a micropattern of a silica sol modified with TiO2 (5% and 10

Electrokinetic characterization of synthetic protein nanoparticles

• Daniel F. Quevedo,
• Cody J. Lentz,
• Adriana Coll de Peña,
• Yazmin Hernandez,
• Nahal Habibi,
• Rikako Miki,
• Joerg Lahann and
• Blanca H. Lapizco-Encinas

Beilstein J. Nanotechnol. 2020, 11, 1556–1567, doi:10.3762/bjnano.11.138

• and −17.4 ± 0.6 mV SPNP-BSA-555. The EK devices to study these particles were made using microdevice manufacturing techniques as previously described. Standard soft lithography techniques were used to cast polydimethylsiloxane (PDMS) onto molds, and the resulting microdevices were sealed with PDMS

• posts (Figure 2b and Figure S1, Supporting Information File 1) were made from PDMS employing standard soft lithography techniques. To create a device, PDMS (Dow Corning, Midland, MI) was cast onto a negative replica mold made with a silicon wafer (Silicon Inc., Boise, ID) and an SU-8 3050 photoresist

Droplet-based synthesis of homogeneous magnetic iron oxide nanoparticles

• Christian D. Ahrberg,
• Ji Wook Choi and
• Bong Geun Chung

Beilstein J. Nanotechnol. 2018, 9, 2413–2420, doi:10.3762/bjnano.9.226

• have been synthesized in pinched flow microfluidic geometries, such as fluorescent silica particles [13], or titanium dioxide particles [27]. For these applications, the microfluidic devices were made from poly(dimethylsiloxane) (PDMS) following a soft-lithography fabrication method [28][29], or made

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure. Keywords: chemical patterning; hybrid material; monolayer; soft lithography; two-dimensional material; Introduction Chemical lift

Refractive index sensing and surface-enhanced Raman spectroscopy using silver–gold layered bimetallic plasmonic crystals

• Somi Kang,
• Sean E. Lehman,
• Matthew V. Schulmerich,
• An-Phong Le,
• Tae-woo Lee,
• Stephen K. Gray,
• Rohit Bhargava and
• Ralph G. Nuzzo

Beilstein J. Nanotechnol. 2017, 8, 2492–2503, doi:10.3762/bjnano.8.249

• useful new platform for chemical/spectroscopic sensing. Keywords: finite-difference time-domain; nanoimprint soft lithography; plasmonics; surface plasmon resonance; Introduction Studies of surface plasmons have attracted significant attention due to the diverse range of applications and processes in

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• are only a limited number of studies of the use of DNA nanostructures as master templates for soft lithography. Soft lithography relies on elastomeric stamps or molds bearing fine features of relief on their surfaces to transfer patterns [39]. The spatial resolution and diverse features of the relief

• structures on the stamps intrinsically limit the application of soft lithography. Thus, the preparation of master templates, where the stamps are derived, has become an important research area. State-of-the-art technologies for fabrication of the master templates are deep ultraviolet lithography (DUL) and

• inorganic oxide film by ALD and demonstrated its usefulness in soft lithography patterning of polymer films. DNA nanotubes and origami triangles with Al2O3 films of ca. 2 nm, ca. 5 nm or ca. 20 nm thickness have been tested as the master templates to imprint their nanoscale features to PLLA films. As the

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• applied for surface modification regardless of the substrate material and geometry. Here, various ways to structure these vapor-deposited polymer thin films are described. Well-established and available photolithography and soft lithography techniques are widely performed for the creation of surface

• ]. Also, printing methods with elastomeric stamps or replica structures to transfer a material from a solution onto a surface, which are collectively related to imprinting lithography [15][16] or soft lithography [17][18], were developed. Thus, the early developments of the patterning and structuring

• materials (with the exception for the case of selective deposition on transition metals and charged surfaces). Because of the well-established and available photolithography and soft lithography techniques, promising patterned surface structures have been created. Attempts were conducted to produce

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

• Alexandra M. Greiner,
• Adria Sales,
• Hao Chen,
• Sarah A. Biela,
• Dieter Kaufmann and
• Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

• form the topography of the features in the plastic. Similar to replica molding in soft lithography, features down to around 10 nm can be replicated. Like soft lithography hot embossing is a cheap method suitable for large-scale manufacturing of substrates [50]. In principle, it can be used with many

• cell adaptation to dynamic changes of the substrate topography [51][52]. Replica molding is a soft lithography technique that uses an elastomeric soft material to replicate patterns (Figure 4B) [53][54]. With that method mainly micrometer-sized topographies are produced in the elastomer. Structures

• with high aspect ratios (height/lateral distance) are not easy to replicate with this method. Due to the relative simple procedure, soft lithography and related methods have been widely used in cell biology studies and are widely established as a standard tool [53][59][60][61]. The soft material is

Controlled deposition and combing of DNA across lithographically defined patterns on silicon

• Zeinab Esmail Nazari and
• Leonid Gurevich

Beilstein J. Nanotechnol. 2013, 4, 72–76, doi:10.3762/bjnano.4.8

• introduced that involved a combination of molecular combing with other techniques such as lithographic patterning [7]. For instance, Guan et al. used a combination of molecular combing with contact printing and soft lithography. With this method, it was possible to generate complex patterns of DNA on the

Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications

• Yaron Paz

Beilstein J. Nanotechnol. 2011, 2, 845–861, doi:10.3762/bjnano.2.94

• SAMs are transferred from stamps of a polymer (for example poly(dimethylsiloxane) (PDMS)) onto oxide substrates upon contact between the stamps and the substrate. Other so-called “soft-lithography” methods (replica molding, microtransfer molding, micromolding in capillaries, and solvent-assisted

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• 10.3762/bjnano.2.49 Abstract We present two routes for the fabrication of plasmonic structures based on nanosphere lithography templates. One route makes use of soft-lithography to obtain arrays of epoxy resin hemispheres, which, in a second step, can be coated by metal films. The second uses the

• can be utilized in experiments requiring light confinement. Keywords: nanosphere-lithography; near-field enhancement; plasma etching; soft-lithography; surface plasmons; Introduction Classical electromagnetic theories describing optical transmission through small apertures [1][2] do not take into

• , plasmonic structures fabricated by nanosphere lithography can also be used for other purposes. Soft lithography [54] is an alternative technique for nano- and micro-fabrication involving the inverse replication of a mold with the aid of elastomeric polymers. It can be reliably scaled down to sizes of ~100

Hierarchically structured superhydrophobic flowers with low hysteresis of the wild pansy (Viola tricolor) – new design principles for biomimetic materials

• Anna J. Schulte,
• Damian M. Droste,
• Kerstin Koch and
• Wilhelm Barthlott

Beilstein J. Nanotechnol. 2011, 2, 228–236, doi:10.3762/bjnano.2.27

• µl) water droplets, which cannot provide self-cleaning properties. One simple and precise method to transfer petal surface structures into an artificial material is a soft lithography technique called replica moulding [26]. Specifically, for the replication of biological surfaces Koch et al. [27][28

Biomimetics inspired surfaces for drag reduction and oleophobicity/philicity

• Bharat Bhushan

Beilstein J. Nanotechnol. 2011, 2, 66–84, doi:10.3762/bjnano.2.9

• fabricated using a two step molding process (soft lithography). A microstructured Si surface with pillars of 14 μm diameter and 30 μm height with 23 μm pitch fabricated by photolithography was used as a master template. A negative replica of the template was generated by applying a polyvinylsiloxane dental

• ). Hierarchical structures were fabricated using a two step fabrication process, including the production of microstructured surfaces by soft lithography and the subsequent development of nanostructures on top by self assembly of n-hexatriacontane with the amounts of 0.2 μg/mm2 deposited by thermal evaporation