Role of titanium and organic precursors in molecular layer deposition of “titanicone” hybrid materials

• Arbresha Muriqi and
• Michael Nolan

Beilstein J. Nanotechnol. 2022, 13, 1240–1255, doi:10.3762/bjnano.13.103

• initial MLD reactions in titanicone film growth using three different surface models: anatase TiO2, rutile TiO2 and Al2O3. Calculated energetics show that while TiCl4 is reactive towards the anatase and rutile TiO2 surfaces, it is not reactive towards the Al2O3 surface. Ti(DMA)4 is reactive towards all

• the origin of the different thicknesses of EG–titanicone and GL–titanicone films observed in experimental work. We find that EG and GL coupled with TiCl4 can orient in a flat lying configuration on anatase while on rutile, the preferred orientation is upright. When combined with Ti(DMA)4, EG and GL

• prefer the flat lying configuration on all surfaces. This work shows that the choice of the surface and the metallic precursor has a major impact on the behaviour of organic species. DFT findings provide motivation to develop a low temperature rutile TiO2/titanicone film suggesting that the desired film

On the transformation of “zincone”-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition

• Alberto Perrotta,
• Julian Pilz,
• Stefan Pachmajer,
• Antonella Milella and
• Anna Maria Coclite

Beilstein J. Nanotechnol. 2019, 10, 746–759, doi:10.3762/bjnano.10.74

• , previously reported for pyrolyzed titanicone layers [11], can be excluded, considering that annealing was performed in an oxidative environment (air). The absence of oxidized carbon confirms the successful calcination and the removal of the residual organic ligands in the layers. In Figure 2e, the O 1s HR

• different methods in the annealing temperature range of 350–450 °C [62][68][69][70][71][72][73]. For the pyrolysis of titanicone, a shift towards higher crystallization temperatures for TiO2 was reported by Abdulagatov et al. [11] due to hindrance of crystallization by organic ligands constraining amorphous

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• heat capacity was about 2.5 J/(cm3·K) [101]. Ethylene glycol has also been used with TiCl4 to deposit titanicone films [53][104][105]. Deposition temperatures for the TiCl4+EG films varied from 90 to 135 °C. The GPC first decreased gradually from 4.6 Å per cycle at 90 °C to 4.1 Å per cycle at 125 °C

• Å per cycle. The films were stable in ambient air: A decrease in thickness of only ca. 3% was observed after exposure in ambient air for one month [54]. Titanicone films have been also made by using propane-1,2,3-triol (glycerol, GL) together with TiCl4. The deposition temperature regime used for