Roll-to-roll fabrication of superhydrophobic pads covered with nanofur for the efficient clean-up of oil spills

• Patrick Weiser,
• Robin Kietz,
• Marc Schneider,
• Matthias Worgull and
• Hendrik Hölscher

Beilstein J. Nanotechnol. 2022, 13, 1228–1239, doi:10.3762/bjnano.13.102

• , too [7]. Multiple techniques exist to prepare self-cleaning surfaces. Direct laser writing and electron beam lithography have been employed successfully to create superhydrophobic surfaces. However, due to low writing speeds these approaches are not viable for surface areas larger than a few square

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• plasmonics, due to their ability to absorb or emit light at frequencies which depend on their size and shape. It was recently shown that irradiation by a focused electron beam can promote the growth of nanostructures on metal surfaces and the height of these structures depends on the duration of the

• irradiation and the material of the surface. However, the effects on growth dynamics of numerous irradiation parameters, such as beam current or angle of incidence, have not yet been studied in detail. We explore the effects of focusing, angle of incidence, and current of the electron beam on the size and

• surfaces undergoing irradiation by a focused electron beam. Keywords: atomic force microscopy; electron beam; lithography; nanostructure; silver; sputtering; surface; Introduction Metallic nanostructures have various uses, including in nano-electro-mechanical systems [1], plasmonic biosensors [2], and

DNA aptamer selection and construction of an aptasensor based on graphene FETs for Zika virus NS1 protein detection

• Nathalie B. F. Almeida,
• Thiago A. S. L. Sousa,
• Viviane C. F. Santos,
• Camila M. S. Lacerda,
• Thais G. Silva,
• Rafaella F. Q. Grenfell,
• Flavio Plentz and
• Antero S. R. Andrade

Beilstein J. Nanotechnol. 2022, 13, 873–881, doi:10.3762/bjnano.13.78

• previously described by our group elsewhere [24]. The dimensions of the sensing region (100 μm × 100 μm) were defined by O2 plasma etching. The source and drain electrodes were fabricated by electron-beam evaporation of 2 nm/100 nm of Ti/Au, and we covered the metal contacts with a 10 μm thick passivation

Temperature and chemical effects on the interfacial energy between a Ga–In–Sn eutectic liquid alloy and nanoscopic asperities

• Yujin Han,
• Pierre-Marie Thebault,
• Corentin Audes,
• Xuelin Wang,
• Haiwoong Park,
• Jian-Zhong Jiang and
• Arnaud Caron

Beilstein J. Nanotechnol. 2022, 13, 817–827, doi:10.3762/bjnano.13.72

• have been characterized by TEM and XPS [25]. The authors reported on the effect of electron beam exposition time on the growth of a ZnGa2O4 layer. After 35 min irradiation, the oxide layer had grown from 2 nm to less than 5 nm. Besides this moderate growth, the authors observed the partial

• crystallization of the oxide layer during electron beam exposition. We measured the temperature dependence of the interfacial energy between Ga–In–Sn eutectic liquid and AFM tips by dipping the AFM tips inside a Ga–In–Sn liquid drop. The penetration depth of the tips was in the order of several hundreds of

Hierachical epicuticular wax coverage on leaves of Deschampsia antarctica as a possible adaptation to severe environmental conditions

• Elena V. Gorb,
• Iryna A. Kozeretska and
• Stanislav N. Gorb

Beilstein J. Nanotechnol. 2022, 13, 807–816, doi:10.3762/bjnano.13.71

• magnifications (probably due to damage by the electron beam), the platelets often looked like being interconnected (Figure 2b). These microscopic, very thin flat projections (length: 0.75 ± 0.08 μm; thickness: 38 ± 6 nm) oriented almost perpendicularly to the epidermal surfaces have no specific arrangement. On

Reliable fabrication of transparent conducting films by cascade centrifugation and Langmuir–Blodgett deposition of electrochemically exfoliated graphene

• Teodora Vićentić,
• Stevan Andrić,
• Vladimir Rajić and
• Marko Spasenović

Beilstein J. Nanotechnol. 2022, 13, 666–674, doi:10.3762/bjnano.13.58

• 10× (Olympus BX53M). Scanning electron microscopy (SEM) was performed with a FESEM (FEI Scios 2, Thermo Fisher Scientific, Waltham, MA, USA) at a chamber pressure of 1 × 10−4 Pa with electron beam voltages set between 1 and 30 kV, depending on the film. Films that are shown in optical dark-field

Zinc oxide nanostructures for fluorescence and Raman signal enhancement: a review

• Ioana Marica,
• Fran Nekvapil,
• Maria Ștefan,
• Cosmin Farcău and
• Alexandra Falamaș

Beilstein J. Nanotechnol. 2022, 13, 472–490, doi:10.3762/bjnano.13.40

• ordered hybrid nanostructured substrates, ranging from more expensive and laborious ones, such as pulsed laser deposition or hydrothermal growth, followed by sputtering processes [31] or electron beam lithography to more cost-efficient and simple ones, such as photochemical deposition of metallic NPs or a

• allowed for the decoration of vertically aligned cone-shaped ZnO nanorods with Ag NPs on their sides and their top ends [35], and magnetron sputtering [7][36]. Electron beam evaporation of, for example, a 30 nm Au layer on ZnO nanopillars arrays [37] or of ZnO-elevated Au dimer nanostructures (Figure 2a,b

• needed to develop efficient SERS substrates. The combination of several methods including nanosphere lithography, atomic layer deposition, electrodeposition, and electron-beam evaporation resulted in Au-covered hollow urchin-like ZnO structures (Figure 2e–k) [16]. The ZnO layer was deposited on a

Investigation of electron-induced cross-linking of self-assembled monolayers by scanning tunneling microscopy

• Patrick Stohmann,
• Sascha Koch,
• Yang Yang,
• Christopher David Kaiser,
• Julian Ehrens,
• Jürgen Schnack,
• Niklas Biere,
• Dario Anselmetti,
• Armin Gölzhäuser and
• Xianghui Zhang

Beilstein J. Nanotechnol. 2022, 13, 462–471, doi:10.3762/bjnano.13.39

• role in science and technology. A highly focused electron beam is employed to create nanostructures via electron-beam lithography [1], and has been further developed to produce three-dimensional structures through controlled dissociation of precursor molecules [2]. Electron-induced chemistry has also

• by the rastering electron beam of an SEM, where the kinetic energy of the electrons was set to 1 keV. The SEM used is a modified type of a UHV Zeiss Standard Gemini with a Schottky-type thermal field emission source (ZrO/W). The pressure in the SEM column was ≈10−8 mbar. Prior to each experiment, the

Impact of device design on the electronic and optoelectronic properties of integrated Ru-terpyridine complexes

• Max Mennicken,
• Sophia Katharina Peter,
• Corinna Kaulen,
• Ulrich Simon and
• Silvia Karthäuser

Beilstein J. Nanotechnol. 2022, 13, 219–229, doi:10.3762/bjnano.13.16

• nanoelectrodes separated by gaps of 8 to 20 nm. They are fabricated by electron beam lithography (EBL) in a lift-off process while using a self-aligned Al2O3 hard mask to define the nanogap size [20][21]. The resulting nanoelectrode pairs are used for the on-chip preparation of Ru(TP)2-complex wires according to

• using electron beam lithography and lift-off [21]. These nanoelectrode samples with gap sizes of 8 to 20 nm between the electrodes were used in order to fabricate Ru(TP)2-complex wire devices. According to the Ru-complex wire growth procedure described above, the samples were treated first with MPTP

• wavelength selection with monochromator (MS257 Oriel). The radiant power was 90 nW/cm2 and the optical setup was coupled via a fiber-cable to the optical cryostat. Results and Discussion Ru(TP)2-complex wire growth Ru(TP)2-complex wires were grown between nanoelectrodes fabricated via electron beam

Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)₆)

• Po-Yuan Shih,
• Maicol Cipriani,
• Christian Felix Hermanns,
• Jens Oster,
• Klaus Edinger,
• Armin Gölzhäuser and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2022, 13, 182–191, doi:10.3762/bjnano.13.13

• (CO)6 in comparison to focused electron beam-induced deposition (FEBID) of this precursor. The DEA and DI experiments are compared to previous work, differences are addressed, and the nature of the underlying resonances leading to the observed DEA processes are discussed in relation to an earlier

• ; dissociative ionisation; focused electron beam-induced deposition; molybdenum hexacarbonyl; Introduction Studies on Mo-based semiconductor materials for the application as thin films with wafer-scale thickness homogeneity [1] and for solar hydrogen production [2] have attracted interest in the last years. For

• applications of such types a good and target-oriented fabrication control of molybdenum nanostructures is important. Potentially, this may be achievable by focused electron beam-induced deposition (FEBID). In FEBID of metallic structures, organometallic precursor molecules are generally used as the metal

Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

Chemical vapor deposition of germanium-rich CrGe_x nanowires

• Vladislav Dřínek,
• Stanislav Tiagulskyi,
• Roman Yatskiv,
• Jan Grym,
• Radek Fajgar,
• Věra Jandová,
• Martin Koštejn and
• Jaroslav Kupčík

Beilstein J. Nanotechnol. 2021, 12, 1365–1371, doi:10.3762/bjnano.12.100

• carbon–platinum composite using focused electron beam-induced deposition (FEBID) (Supporting Information File 1, Figure S10). The resistivity of the nanowire–deposit system was estimated to be 2.7 kΩ·cm (Figure 5). This value is significantly higher than the previously reported resistivity for nominally

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• presents a detailed computational protocol for the atomistic simulation of formation and growth of metal-containing nanostructures during focused electron beam-induced deposition (FEBID). The protocol is based upon irradiation-driven molecular dynamics (IDMD), a novel and general methodology for computer

• . The methodology can also be adjusted to simulate the nanostructure formation by other nanofabrication techniques using electron beams, such as direct electron beam lithography. In the present study, the methodology is applied to the IDMD simulation of the FEBID of Pt(PF3)4, a widely studied precursor

• nanostructures. The analysis of the simulation results provides spatially resolved relative metal content, height, and growth rate of the deposits, which represents valuable reference data for the experimental characterization of the nanostructures grown by FEBID. Keywords: focused electron beam-induced

Revealing the formation mechanism and band gap tuning of Sb₂S₃ nanoparticles

• Maximilian Joschko,
• Franck Yvan Fotue Wafo,
• Christina Malsi,
• Danilo Kisić,
• Ivana Validžić and
• Christina Graf

Beilstein J. Nanotechnol. 2021, 12, 1021–1033, doi:10.3762/bjnano.12.76

• nanostructures due to the electron beam could be excluded [32]. The data of the AFM measurements are displayed in Figure 5. On the one hand, one can see single deflection peaks in Figure 5a, which are 1.5 nm and 2.3 nm in width (green and red marks). On the other hand, Figure 5b shows four deflection peaks

• electron beam, which caused the particles to appear larger. Consequently, the stacked deflection peaks (Figure 5b, 14.7 nm, red and green mark) correspond to a nanoparticle cluster similar to those found in Figure 4b. Chemical composition To confirm the XRD results for stibnite and to examine the

Is the Ne operation of the helium ion microscope suitable for electron backscatter diffraction sample preparation?

• Annalena Wolff

Beilstein J. Nanotechnol. 2021, 12, 965–983, doi:10.3762/bjnano.12.73

Uniform arrays of gold nanoelectrodes with tuneable recess depth

• Elena O. Gordeeva,
• Ilya V. Roslyakov,
• Alexey P. Leontiev,
• Alexey A. Klimenko and
• Kirill S. Napolskii

Beilstein J. Nanotechnol. 2021, 12, 957–964, doi:10.3762/bjnano.12.72

• direct-writing using electron beam lithography [11][12] or ion beam milling [13][14]) are limited by the ensemble area and expensive in mass production, but allow one to precisely tune the parameters of an array (a geometry of individual electrodes and the distance between them) over a wide range. An

Fate and transformation of silver nanoparticles in different biological conditions

• Barbara Pem,
• Marija Ćurlin,
• Darija Domazet Jurašin,
• Valerije Vrček,
• Rinea Barbir,
• Vedran Micek,
• Raluca M. Fratila,
• Jesus M. de la Fuente and
• Ivana Vinković Vrček

Beilstein J. Nanotechnol. 2021, 12, 665–679, doi:10.3762/bjnano.12.53

• ) PLL-AgNPs in PBS, (c) electron-beam-induced transformation of cubic nanocrystals formed after incubation of AgNPs in PBS, (d) AgNPs formed after Ag+ incubation in 1% (w/v) of liver homogenate, (e) AgNPs formed after Ag+ incubation in 1% (w/v) of brain homogenate, (f) HAADF images of AgNPs formed after

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• nitrogen, the focused helium ion beam was used to create lattice vacancies at predefined locations (in a similar manner to the related electron beam-based methods). After annealing to allow for diffusion of the vacancies, the presence of nitrogen-vacancy centers was confirmed by photoluminescence

• tone resist) or soluble (positive tone resist) in the subsequent development step. The drive to fabricate devices with ever reducing dimensions has meant that alternatives to diffraction-limited photon-based lithography have evolved, using charged particle beams [103]. Electron beam lithography (EBL

Properties of graphene deposited on GaN nanowires: influence of nanowire roughness, self-induced nanogating and defects

• Jakub Kierdaszuk,
• Piotr Kaźmierczak,
• Justyna Grzonka,
• Aleksandra Krajewska,
• Aleksandra Przewłoka,
• Wawrzyniec Kaszub,
• Zbigniew R. Zytkiewicz,
• Marta Sobanska,
• Maria Kamińska,
• Andrzej Wysmołek and
• Aneta Drabińska

Beilstein J. Nanotechnol. 2021, 12, 566–577, doi:10.3762/bjnano.12.47

• distinct groups of NWs were observed – approx. 80% of them were 1 μm in height while approx. 20% reached 1.5 μm. The samples were studied by scanning electron microscopy (SEM) using a SU8230 Hitachi microscope equipped with an in-lens secondary electron detector at 5 kV electron beam voltage. The Raman

Interface interaction of transition metal phthalocyanines with strontium titanate (100)

• Reimer Karstens,
• Thomas Chassé and
• Heiko Peisert

Beilstein J. Nanotechnol. 2021, 12, 485–496, doi:10.3762/bjnano.12.39

• oxygen atmosphere (p(O2) = 4 × 10−5 mbar) at a substrate temperature of 910 K. The Ti thickness was monitored by the ion flux of the electron beam evaporator (EFM 3s, Focus GmbH) calibrated by a quartz microbalance. The estimation of the TiO2 thickness from the attenuation of the Sr 3d peak intensity

Spontaneous shape transition of Mn_xGe_1−x islands to long nanowires

• S. Javad Rezvani,
• Luc Favre,
• Gabriele Giuli,
• Yiming Wubulikasimu,
• Isabelle Berbezier,
• Augusto Marcelli,
• Luca Boarino and
• Nicola Pinto

Beilstein J. Nanotechnol. 2021, 12, 366–374, doi:10.3762/bjnano.12.30

• electron beam. Results and Discussion High-temperature annealing of the evaporated Mn thin films on Ge(111) results in a significant change of the film morphology with the appearance of nanostructures onto the surface. The features of the structures are related to the Mn layer thickness and the duration of

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• electron beam-induced processing is a versatile method for the fabrication of metallic nanostructures with arbitrary shape, in particular, on top of two-dimensional (2D) organic materials, such as self-assembled monolayers (SAMs). Two methods, namely electron beam-induced deposition (EBID) and electron

• agent need to be considered and further studied. Keywords: 2D materials; carbon nanomembranes (CNMs); focused electron beam-induced processing; metallic nanostructures; self-assembled monolayers; Introduction Focused electron beam-induced processing (FEBIP) is a powerful maskless “direct-write

• ” approach for the fabrication of arbitrarily shaped nanostructures [1][2][3][4][5]. The most prominent method within the FEBIP family is electron beam-induced deposition (EBID). In EBID, a focused electron beam is used to locally dissociate adsorbed precursor molecules. Thus, a localized deposit of the non

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• by measuring the bright optical modes [59]. The target geometry for all fabrication techniques is a particle radius of 45 nm with a gap size of 35 nm. This is the geometry that can reliably fabricated by resist-based electron beam lithography on physically sputtered gold layers (cf. Figure 7a). Later

• large-area removal of the surrounding gold. Figure 7b,c depicts the corresponding scanning electron beam micrographs. The limited image quality of the lithographically defined tetramer is caused by the fact that the isolated structures are located on a glass substrate, leading to severe charging effects

Gold(I) N-heterocyclic carbene precursors for focused electron beam-induced deposition

• Cristiano Glessi,
• Aya Mahgoub,
• Cornelis W. Hagen and
• Mats Tilset

Beilstein J. Nanotechnol. 2021, 12, 257–269, doi:10.3762/bjnano.12.21

• Sciences, Dept. Imaging Physics, Lorentzweg 1, 2628CJ Delft, Netherlands 10.3762/bjnano.12.21 Abstract Seven gold(I) N-heterocyclic carbene (NHC) complexes were synthesized, characterized, and identified as suitable precursors for focused electron beam-induced deposition (FEBID). Several variations on the

• −. Keywords: Au(I) precursors; focused electron beam-induced deposition (FEBID); gold-NHC; gold precursors; nanofabrication; N-heterocyclic carbene; Introduction Focused electron beam-induced deposition (FEBID) is a nanofabrication technique that allows for the growth of three-dimensional free-standing

• properties of a FEBID precursor molecule are crucial for the deposition process. The precursor molecule should be volatile in a suitable range of pressures and temperatures. Under these conditions, it needs to be easily deliverable in the gas phase, adsorb on a substrate, be sensitive to the electron beam

TiO_x/Pt₃Ti(111) surface-directed formation of electronically responsive supramolecular assemblies of tungsten oxide clusters

• Marco Moors,
• Yun An,
• Agnieszka Kuc and
• Kirill Yu. Monakhov

Beilstein J. Nanotechnol. 2021, 12, 203–212, doi:10.3762/bjnano.12.16

• points, identical oxide phases by electron beam evaporation of Ti on Pt(111) at increased oxygen partial pressures. However, the direct oxidation of the Pt3Ti alloy surface has the advantage of an easier reproducibility and an increased long-range order of the individual oxide phases [22]. For this study